Substrate holding rotating mechanism, and substrate processing apparatus

Abstract

A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B are schematic views each showing structures and operations of a conventional substrate holding rotating mechanism;

FIG. 2 is a perspective view showing a substrate holding rotating mechanism incorporated in a substrate cleaning apparatus according to a first embodiment of the present invention;

FIG. 3 is a cross-sectional view taken along line A-A in FIG. 2;

FIG. 4 is a cross-sectional view taken along line B-B in FIG. 2;

FIG. 5 is a view from a direction indicated by arrow C in FIG. 2;

FIG. 6 is a schematic plan view showing a first moving mechanism;

FIG. 7 is a perspective view showing a substrate cleaning mechanism incorporated in the substrate cleaning apparatus according to the first embodiment;

FIG. 8 is a view showing a transfer mechanism incorporated in the substrate cleaning mechanism;

FIGS. 9A through 9C are schematic views each illustrating operations of the substrate holding rotating mechanism;

FIG. 10 is a schematic view showing a substrate holding rotating mechanism according to a second embodiment of the present invention;

FIG. 11 is a schematic view showing a substrate holding rotating mechanism according to a third embodiment of the present invention;

FIG. 12 is a schematic view showing a modified example of the substrate holding rotating mechanism according to the third embodiment of the present invention;

FIG. 13 is a schematic view showing a substrate holding rotating mechanism according to a fourth embodiment of the present invention;

FIG. 14 is a schematic view showing a substrate holding rotating mechanism according to a fifth embodiment of the present invention;

FIG. 15 is a schematic view showing a substrate holding rotating mechanism according to a sixth embodiment of the present invention;

FIG. 16 is a schematic view showing a substrate holding rotating mechanism according to a seventh embodiment of the present invention;

FIG. 17 is an enlarged view showing an example of a linking structure between a coupling member and a base member shown in FIG. 16;

FIG. 18 is a side view showing an end portion of the coupling member;

FIG. 19 is an enlarged view showing another example of a linking structure between the coupling member and the base members shown in FIG. 16;

FIG. 20 is a schematic view showing a substrate holding rotating mechanism according to an eighth embodiment of the present invention;

FIG. 21 is a schematic view showing a substrate holding rotating mechanism according to a ninth embodiment of the present invention;

FIG. 22 is a side view showing a substrate push-out member;

FIG. 23 is a schematic view showing a substrate holding rotating mechanism according to a tenth embodiment of the present invention;

FIG. 24 is a side view schematically showing part of the substrate holding rotating mechanism shown in FIG. 23;

FIG. 25 is a schematic view showing a substrate holding rotating mechanism according to an eleventh embodiment of the present invention;

FIG. 26 is a cross-sectional view schematically showing an example of a linking structure between a base member, a first coupling member, and a second coupling member;

FIG. 27 is a schematic view showing a substrate holding rotating mechanism according to a twelfth embodiment of the present invention; and

FIG. 28 is a schematic view showing a substrate processing apparatus according to a thirteenth embodiment of the present invention.

Claims

1. A substrate holding rotating mechanism, comprising: at least three spindles;clamp rollers mounted respectively on said spindles for holding a periphery of a substrate;a rotating device for rotating at least one of said clamp rollers;at least one base member on which at least one of said spindles is installed; anda rotational mechanism adapted to allow said base member to be rotatable,wherein said base member is free to rotate so as to adjust holding pressures of said clamp rollers applied to the substrate.

2. The substrate holding rotating mechanism according to claim 1, wherein said rotational mechanism is adapted to allow said base member to be rotatable about a shaft member mounted on said base member.

3. The substrate holding rotating mechanism according to claim 1, further comprising: a reciprocating mechanism adapted to move said base member forward and backward in a direction such that said at least one spindle on said base member moves between a substrate clamp position and a waiting position that is away from the substrate clamp position.

4. The substrate holding rotating mechanism according to claim 3, wherein: said at least one base member comprises plural base members; andeach of said plural base members is provided with at least one of said rotational mechanism and said reciprocating mechanism.

5. A substrate holding rotating mechanism, comprising: at least three spindles;clamp rollers mounted respectively on said spindles for holding a periphery of a substrate;a rotating device for rotating at least one of said clamp rollers;at least one base member on which at least one of said spindles is installed; andat least one reciprocating mechanism adapted to move said base member forward and backward in a direction such that said at least one spindle on said base member moves between a substrate clamp position and a waiting position that is away from the substrate clamp position.

6. The substrate holding rotating mechanism according to claim 5, wherein: said at least one base member comprises a pair of base members arranged on both sides of the substrate clamp position;said at least one reciprocating mechanism comprises a pair of reciprocating mechanisms coupled respectively to said pair of base members; andsaid pair of reciprocating mechanisms are operable to move said spindles on said pair of base members forward and backward along a common linear line.

7. The substrate holding rotating mechanism according to claim 6, further comprising: at least one rotational mechanism adapted to allow at least one of said pair of base members to be rotatable,wherein at least one of said pair of base members is free to rotate so as to adjust holding pressures of said clamp rollers applied to the substrate.

8. A substrate holding rotating mechanism, comprising: a pair of first base members rotatable about a pair of first shaft members, respectively;a second base member rotatable about a second shaft member;plural spindles installed on said pair of first base members and said second base member;a single drive mechanism for rotating said pair of first base members about said pair of first shaft members, respectively;plural clamp rollers mounted respectively on said plural spindles for holding a substrate; anda rotating device for rotating at least one of said plural clamp rollers,wherein rotation of said pair of first base members allows at least two of said plural clamp rollers to move in directions toward and away from the substrate.

9. The substrate holding rotating mechanism according to claim 8, further comprising: at least one substrate push-out member provided on at least one of said pair of first base members,wherein when said pair of first base members rotate so as to move said at least two plural clamp rollers in the direction away from the substrate, said substrate push-out member is brought into contact with a periphery of the substrate.

10. The substrate holding rotating mechanism according to claim 8, further comprising: a substrate stopper disposed near a periphery of the substrate held by said plural clamp rollers,wherein said substrate stopper and said second base member are substantially symmetrical about a center of the substrate.

11. The substrate holding rotating mechanism according to claim 8, further comprising: a pair of coupling members for coupling said pair of first base members and said second shaft member,said second shaft member being configured to move in a radial direction of the substrate.

12. A substrate processing apparatus, comprising: a substrate holding rotating mechanism according to claim 1;a processing liquid supply mechanism for supplying a processing liquid to a substrate; anda substrate processing section for processing the substrate.

13. The substrate processing apparatus according to claim 12, further comprising: a pre-treatment unit for performing a pre-treatment on the substrate before said substrate processing section processes the substrate,wherein said substrate processing section performs a post-treatment on the substrate after said pre-treatment unit performs the pre-treatment on the substrate.

14. The substrate processing apparatus according to claim 13, wherein: the pre-treatment in said pre-treatment unit is a polishing process on the substrate; andthe post-treatment in said substrate processing section is a cleaning process on the substrate.

15. A substrate processing apparatus, comprising: a substrate holding rotating mechanism according to claim 5;a processing liquid supply mechanism for supplying a processing liquid to a substrate; anda substrate processing section for processing the substrate.

16. A substrate processing apparatus, comprising: a substrate holding rotating mechanism according to claim 8;a processing liquid supply mechanism for supplying a processing liquid to a substrate; anda substrate processing section for processing the substrate.