BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a block diagram showing a construction of a substrate processing apparatus in accordance with one preferred embodiment of the present invention;
FIG. 2 is a flowchart showing an operation flow for processing of substrates in the substrate processing apparatus;
FIG. 3 is a flowchart showing an operation flow for measurement of concentration where gas inside a processing chamber is used as a sample gas;
FIGS. 4 and 5 are views each illustrating a calculation performed on the basis of measurement results;
FIG. 6 is a flowchart showing an operation flow for measurement of concentration where gas supplied from an IPA gas generation part is used as a sample gas; and
FIG. 7 is a block diagram showing a construction of a substrate processing apparatus in accordance with a variation.