K. Sakurai et al., “Fourier Analysis of Interference Structure in X-Ray Specular Reflection from Thin Films,” Jpn. J. Appl. Phys., vol. 31. Part 2, No. 2A, Feb. 1, 1992, pp. L113-L115. |
K.N. Stoev et al., “Review on grazing incidence X-ray spectrometry and reflectometry,”Spectrochimica Acta Part B, vol. 54, 1999, pp. 41-82. |
N. Wainfan et al., “Density Measurements of Some Thin Copper Films,” Journal of Applied Physics, vol. 30, No. 10, Oct. 1959, pp. 1604-1609. |
J.P. Sauro et al., “Some Observations on the Interference Fringes Formed by X Rays Scattered from Thin Films,” Physical Review, vol. 143, No. 1, Mar. 1966, pp. 439-443. |
K. Sakurai et al., “Analysis of thin films by X-ray scattering at grazing incidence,” Spring-8 User Experiment Report No. 2 (1998 A), Mar. 1999, p. 162. |
J.M. Grimal et al., “X-ray reflectivity: a new tool for the study of glass surfaces,” Journal of Non-Crystalline Solids, vol. 196, 1996, pp. 128-133. |
P. Polou{haeck over (c)}ek et al., “X-ray reflectivity analysis of thin complex Langmuir-Blodgett films,” Journal of Physics D: Applied Physics, vol. 34, 2001, pp. 450-458. |
C.E. Bouldin et al., “Thermal expansion of coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity,” Journal of Applied Physics, vol. 88, No. 2, Jul. 15, 2000, pp. 691-695. |
Wen-Li Wu et al., “Study of ultra-thin hydrogen silsesquioxane films using X-ray reflectivity,” Thin Solid Films, vol. 312, 1998, pp. 73-77. |
E.K. Lin et al., “Structure and Property Characterization of Porous Low-k Dielectric Constant Thin Films using X-ray Reflectivity and Small Angle Neutron Scattering,” Mat. Res. Soc. Symp. Proc., vol. 612, 2000[Materials Research Society], pp. D4.1.1-D4.1.8. |
B.J. Bauer et al., “Structure and Property Characterization of Low-k Dielectric Porous Thin Films,” Electronics Materials 30(4), pp. 304-308, 2001. |
P. Boher et al., “Radio frequency sputtering of tungsten/tungsten nitride multilayers of GaAs,” J. Vac. Sci. Technol. A, vol. 8, No. 2, Mar./Apr. 1990, pp. 846-849. |
E. Chason et al., “In situ energy dispersive x-ray reflectivity measurements of H ion bombardment on SiO2/Si and Si,” Appl. Phys. Lett., vol. 60, No. 19, May 11, 1992, pp. 2353-2355. |
N. Awaji et al., “High-Accuracy X-ray Reflectivity Study of Native Oxide Formed in Chemical Treatment,” Jpn. J. Appl. Phys., vol. 34, 1995, pp. L1013-1016. |
W.C. Johnson et al., “Rapid X-Ray reflectometry (XRR) metrology applied to Cu/low-k Damascene process development,” In Process Control and Diagnostics, Proceedings of SPIE, vol. 4182, 2000, pp. 106-114. |
B. Poumellec et al., “A new method to extract the X-ray absorption fine structures from the reflectivity spectra: application to the study of (Ti.Nb)O2 amorphous solid solutions,” Physica B, vol. 158, 1989, pp. 282-283. |