Claims
- 1. A system for sputter coating a film of material onto a substrate, comprising:
a) an array including first and second unbalanced magnetrons having the same north and south magnetic polarities and being arranged in a mirror configuration defining a space for receiving said substrate therebetween such that like poles are opposed, each of said magnetrons including an electrode target formed of said material; and b) an alternating current and voltage power source electrically connected to said first and second electrode targets for alternatingly energizing said targets as cathodes and anodes.
- 2. A system in accordance with claim 1 wherein each of said magnetrons has both north and south pole pieces, and wherein said north pole pieces have a larger magnetic cross-section than said south pole pieces.
- 3. A system in accordance with claim 1 wherein each of said magnetrons has both north and south pole pieces, and wherein said south pole pieces have a larger magnetic cross-section than said north pole pieces.
- 4. A system in accordance with claim 1 wherein the frequency of said alternation is a radio frequency.
- 5. A system in accordance with claim 1 further comprising a reactive gas for reacting with said target material during sputtering thereof to form a compound of said target material and said gas on said substrate.
- 6. A system in accordance with claim 1 wherein said first and second unbalanced magnetrons are planar magnetrons.
- 7. A system in accordance with claim 1 wherein said first and second unbalanced magnetrons are cylindrical magnetrons.
- 8. A system in accordance with claim 1 further comprising third and fourth unbalanced magnetrons like said first and second magnetrons, said four magnetrons being arranged in a square surrounding said space for receiving said substrate, and a second alternating current and voltage power source being electrically connected to said third and fourth electrode targets for alternatingly energizing said targets as cathodes and anodes, said four unbalanced magnetrons cooperating to form a high ion density plasma surrounding said substrate.
RELATIONSHIP TO OTHER APPLICATIONS AND PATENTS
[0001] This application draws priority from U.S. Provisional Application No. 60/287,609, filed Apr. 30, 2001 by Glocker et al.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60287609 |
Apr 2001 |
US |