Exposure apparatuses are commonly used to transfer images from a reticle onto a semiconductor wafer during semiconductor processing. A typical exposure apparatus includes an illumination source, a reticle stage assembly that retains a reticle, a lens assembly and a wafer stage assembly that retains a semiconductor wafer.
Typically, the wafer stage assembly includes a wafer stage base, a wafer stage that retains the wafer, and a wafer stage mover assembly that precisely positions the wafer stage and the wafer. Somewhat similarly, the reticle stage assembly includes a reticle stage base, a reticle stage that retains the reticle, and a reticle stage mover assembly that precisely positions the reticle stage and the reticle. The size of the images and the features within the images transferred onto the wafer from the reticle are extremely small. Accordingly, the precise relative positioning of the wafer and the reticle is critical to the manufacturing of high density, semiconductor wafers.
Unfortunately, the stage mover assemblies generate heat that can influence the other components of the exposure apparatus. Conventionally, the stage mover assemblies are cooled by forcing a coolant around the movers of the stage mover assembly. However, existing coolant systems are not entirely satisfactory. This reduces the accuracy of positioning of the wafer relative to the reticle, and degrades the accuracy of the exposure apparatus.
The present invention is directed to a stage assembly that moves a device. In one embodiment, the stage assembly includes a stage that retains the device, a base assembly, a stage mover, a temperature controller, and a control system. The stage mover moves the stage. The stage mover includes a magnet array that is secured to one of the stage and the base assembly, and a conductor array that is secured to the other of the stage and the base assembly. In one embodiment, the conductor array includes a first zone having a first heat exchanger and a second zone having a second heat exchanger. Further, the temperature controller includes (i) an inlet valve assembly that is in fluid communication with the first heat exchanger, and the second heat exchanger, and (ii) a first temperature system that is in fluid communication with the inlet valve assembly, the first temperature system simultaneously directing a body circulation fluid at a first temperature, and at a second temperature the inlet valve assembly.
In one embodiment, the control system controls the inlet valve assembly to selectively control (i) the flow rate of the body circulation fluid at the first temperature, and the flow rate of the body circulation fluid at the second temperature that is directed to the first heat exchanger, and (ii) the flow rate of the body circulation fluid at the first temperature, and the flow rate of the body circulation fluid at the second temperature that is directed to the second heat exchanger.
In certain embodiments, the stage(s) for Lithography tools will be accelerated and decelerated using planar motors. These motors typically generate large amounts of heat due to resistive losses in the conductor array of the planar motor. However, an outer surface is required to be at a specified temperature within a tight band in order to avoid uneven heating of air which may cause position measurement errors due to varying refractive index at different locations. The present invention provides an efficient way to achieve the desired temperature control. With this design, the stage assembly can be used in an exposure apparatus to manufacture high density, high quality semiconductor wafers.
In one embodiment, each zone includes one or more feedback elements that provides feedback regarding the temperature of at least a portion of one of the zones, and the feedback is used by a control system to control the temperature controller. Additionally, the control system can utilize feedforward control to reduce overshoot and undershoot.
In another embodiment, the temperature controller includes a phase change material and a housing assembly that retains the phase change material in an enclosed chamber near the conductor array. The housing assembly can form an exposed surface of the conductor array that is adjacent to the magnet array. In another embodiment, the conductor array includes a plurality of conductor units, and the conductor array includes a separate housing assembly positioned near each conductor unit. In this embodiment, each housing assembly encloses a separate, enclosed phase change material.
In one embodiment, the stage mover is a planar motor and the conductor array includes a plurality of conductor units that are arranged in a rectangular shaped grid. Alternatively, the stage mover can be another type of motor, such as a linear motor, a rotary motor, a voice coil motor, or another type of actuator.
The present invention is also directed to an assembly for maintaining an area that retains a component at a substantially constant, predetermined temperature. The assembly can include (i) an enclosed housing that defines a first enclosure that is at the predetermined temperature, and a second enclosure that encircles the first enclosure, the first enclosure defining an area that retains the component; and (ii) a phase change material positioned in the second enclosure.
The present invention is also directed to an exposure apparatus, a device manufactured with the exposure apparatus, and/or a wafer on which an image has been formed by the exposure apparatus. Further, the present invention is also directed to a method for making a stage assembly, a method for making an exposure apparatus, a method for making a device, and a method for manufacturing a wafer.
The novel features of this invention, as well as the invention itself, both as to its structure and its operation, will be best understood from the accompanying drawings, taken in conjunction with the accompanying description, in which similar reference characters refer to similar parts, and in which:
Referring initially to
As an overview, in certain embodiments, the stage mover 16 and the temperature controller 20 are uniquely designed and controlled to efficiently maintain a substantially uniform temperature of a portion of the stage mover 16, the temperature adjuster 20, and/or the base assembly 18. This can reduce the amount of heat transferred from the stage mover 16 to the surrounding environment. With this design, the stage mover 16 can be placed closer a measurement system (not shown in
The stage assembly 10 is particularly useful for precisely positioning a device 26 during a manufacturing and/or an inspection process. The type of device 26 positioned and moved by the stage assembly 10 can be varied. For example, the device 26 can be a semiconductor wafer, and the stage assembly 10 can be used as part of an exposure apparatus for precisely positioning the semiconductor wafer during manufacturing of the semiconductor wafer. Alternatively, for example, the device 26 can be a reticle, and the stage assembly 10 can be used for precisely positioning the reticle during manufacturing of a semiconductor wafer. Still alternatively, for example, the stage assembly 10 can be used to move other types of devices during manufacturing and/or inspection, to move a device under an electron microscope (not shown), or to move a device during a precision measurement operation (not shown).
Some of the Figures provided herein include an orientation system that designates an X axis, a Y axis, and a Z axis. It should be understood that the orientation system is merely for reference and can be varied. Moreover, these axes can alternatively be referred to as a first, second, or third axis.
The stage base 12 supports a portion of the stage assembly 10. In
The stage 14 retains the device 26. In
The stage mover 16 controls and adjusts the position of the stage 14 and the device 26 relative to the base assembly 18 and the stage base 12. For example, the stage mover 16 can be a planar motor that moves and positions of the stage 14 with six degrees of freedom (e.g. along the X, Y, and Z axes, and about the X, Y, and Z axes). Alternatively, the stage mover 16 can be designed to move the stage 14 with fewer than six degrees of freedom. For example, the stage 14 can be maintained along the Z axis with a vacuum preload type fluid bearing or another type of bearing and the stage mover 16 can move the stage 14 with three degrees of freedom (e.g. along the X axis, along the Y axis, and about the Z axis). Still alternatively, the stage mover 16 can be a linear actuator, a rotary actuator, or another type of mover.
In one embodiment, the stage mover 16 is an electromagnetic actuator that includes a conductor array 36 (illustrated as a grid of small boxes) and a magnet array 38 (illustrated as a box). One of the arrays 36, 38 is secured to the top of the base assembly 18 and the other array 36, 38 is secured to the bottom of the stage 14. In
In
The magnet array 38 includes a plurality of magnets. The size, shape and number of magnets can be varied to suit the design requirements of the stage mover 16. Each magnet can be made of a permanent magnetic material such as NdFeB.
Electrical current (not shown) is independently supplied to the conductor units 40 by the control system 22. The electrical current in the conductor units 40 interact with the magnetic field(s) of the magnet array 38. This causes a force (Lorentz type force) between the conductor units 40 and the magnet array 38 that can be used to move the stage 14 relative to the stage base 12.
Unfortunately, the electrical current supplied to the conductor array 36 also generates heat, due to resistance in the conductor array 36. Moreover, the resistance of the conductor array 36 increases as temperature increases. This exacerbates the heating problem and reduces the performance and life of the stage mover 16. Heat transferred to the base assembly 18 can cause expansion and distortion. Further, heat transferred to the surrounding environment can adversely influence the measurement system. In certain embodiments, the temperature controller 20 and the conductor array 36 are uniquely designed to efficiently remove the heat and inhibit the transfer of the heat to the base assembly 18 and the surrounding environment.
The base assembly 18 can be any structure, and in certain embodiments, the base assembly 18 receives the reaction forces generated by the stage mover 16. In
In
With the present design, (i) movement of the stage 14 with the stage mover 16 along the X axis, generates an equal and opposite X reaction force that moves the countermass base assembly 18 in the opposite direction along the X axis; (ii) movement of the stage 14 with the stage mover 16 along the Y axis, generates an equal and opposite Y reaction force that moves the countermass reaction assembly 18 in the opposite direction along the Y axis; (iii) movement of the stage 14 with the stage mover 16 about the Z axis generates an equal and opposite theta Z reaction moment (torque) that moves the countermass base assembly 18 about the Z axis, and (iv) movement of the stage 14 with stage mover 16 along the X axis or the Y axis may additionally generate a reaction moment (torque) that moves the countermass base assembly 18 about the Z axis.
In certain embodiments, the ratio of the mass of the countermass reaction assembly 18 to the mass of the stage 14 is relatively high. This will minimize the movement of the countermass base assembly 18 and minimize the required travel of the countermass base assembly 18. A suitable ratio of the mass of the countermass base assembly 18 to the mass of the stage 14 is between approximately 2:1 and 20:1. In one embodiment which is particularly suited to use in a moving magnet configuration, the countermass base assembly 18 comprises components made from a non-electrically conductive, non-magnetic material, such as low electrical conductivity stainless steel or titanium, or non-electrically conductive plastic or ceramic. The use of non-magnetic material in the countermass base assembly 18 reduces undesirable cogging forces acting on the stage 14, and the use of low- or non-electrically conductive material reduces eddy current drag forces on the stage 14.
The temperature controller 20 reduces the influence of the heat from the conductor array 36 from adversely influencing the other components of the stage assembly 10. For example, the temperature controller 20 can efficiently reduce the amount of heat transferred from the conductor array 36 to the surrounding environment. In one embodiment, the temperature controller 20 includes (i) a first temperature system 42A (illustrated as a box) and (ii) a second temperature system 44A (illustrated as a box) that are used to control the temperature of at least a portion of the conductor array 36. It should be noted that the first temperature system 42A can also be referred to as a body temperature system, and the second temperature system 44A can be referred to as a surface temperature system.
In one embodiment, (i) the first temperature system 42A directs a first circulation fluid 42B (illustrated as small triangles) around the conductor array 36 to remove the majority of the heat created by the conductor units 40, and (iii) the second temperature system 44A directs a second circulation fluid 44B to the conductor array 36 to function as an insulator that inhibits the transfer of heat from the conductor array 36 to the surrounding environment. With this design, the temperature of an outer surface 46 of the conductor array 36 is easier to maintain at a predetermined temperature. One or both of the temperature systems 42A, 44A can include one or more pumps, reservoirs, heat exchanges, chillers, pressure controllers, manifolds, and/or valves. In
It should be noted that the first circulation fluid 42B can also be referred to as a body circulation fluid, and the second circulation fluid can also be referred to as a surface circulation fluid. The circulation fluids 42B, 44B also be referred to as a coolant. The type of circulation fluid 42B, 44B can be varied. For example, each circulation fluid 42B, 44B can be water or Fluorinert.
The control system 22 is electrically connected to, directs and controls electrical current to the conductor array 36 of the stage mover 16 to precisely position the device 26. Further, in the embodiment illustrated in
Typically, depending upon the type of movement required for the stage assembly 10, more current is directed to certain conductor units 40 than other conductor units 40 in the conductor array 36. Thus certain conductor units 40 will generate more heat and will require more cooling than other conductor units.
In certain embodiments, the first temperature system 42A and/or the second temperature system 44A are uniquely designed to provide more cooling to certain conductor units 40 or certain portions of certain conductor units 40. More specifically, in certain embodiments, the temperature controller 20 will adjust the rate in which heat is removed or added to certain zones in the conductor array 36 based on how much each conductor unit 40 is or will be utilized. For example, the first temperature system 42A can adjust the rate in which heat is removed or added to a particular zone based on the usage of the one or more conductors in that zone, while the second temperature system 44A directs the surface circulation fluid 44B at the same rate and temperature to each of the conductor units 40 regardless of which conductor units 40 generate more heat. Alternatively, the second temperature system 44A can also be designed to adjust the rate in which heat is removed or added depending upon the usage of the conductors in the respective zone.
In
In
Still alternatively, one or more of the body heat exchangers 254A, 254B, 254C can span multiple conductor units 40. In yet another alternative embodiment, one or more of the body heat exchangers 254A, 254B, 254C can encircle or enclose (i) a portion of, or all of one or more coil sets 248, 250, and/or (ii) a portion of, or all of one or more conductor units 40.
In the non-exclusive embodiment illustrated in
Further, in
In
In one embodiment, the flow channel 254D of each body heat exchanger 254A, 254B, 254C flows back and forth through the respective body heat exchanger 254A, 254B, 254C. Alternatively, one or more of the body heat exchangers 254A, 254B, 254C can include multiple alternative flow channels 254D in which flow is independently controlled. For example, the body heat exchangers 254A, 254B, 254C can each include three different flow channels 254D that define three separate heat exchangers. This design can be used for the independent cooling of each coil. In many instances, a center coil 258 in each three coil set 248, 250 will require the more cooling than the side coils 258.
In one embodiment, each heat exchanger 254A, 254B, 254C, 256A can be made of a low-electrically conductive, non-magnetic material, such as titanium, or non-electrically conductive plastic or ceramic. Further, each heat exchanger 254A, 254B, 254C, 256A can be made by welding or bonding two half plates together. In this example, for each heat exchanger 254A, 254B, 254C, 256A, each half plate can include a portion of the channel etched into the half plate. Subsequently, the half plates can be assembled to create the channels. As a non-exclusive embodiment, each flow channel 254D, 256B can have cross-section dimensions (perpendicular to the fluid flow) of approximately a few microns wide up to a few hundreds of microns in the Z direction and between one and twenty millimeters in the XY plane. Stated in another fashion, each micro channel 254D, 256B can have a cross-section area (perpendicular to the direction of fluid flow) of between approximately 0.01 and 5 square millimeters. Stated in yet another fashion, each micro channel 254D, 256B can have a cross-section area of less than approximately 0.01, 0.05, 0.1, 0.5, 1, 2, 3, 4, or 5 square millimeters
With the present design, in certain embodiments, the second circulation fluid 44B flowing in the surface exchanger assembly 256 removes very little heat, but provides a thermal shield for the outer surface 46. Further, with this design, because the second circulation fluid 44B removes very little heat, the second circulation fluid 44B traveling through the surface exchanger assembly 256 will experience very little temperature increase (delta T). With this design, the temperature of the second circulation fluid 44B at the inlet to the surface exchanger assembly 256 can be controlled to be approximately equal to the predetermined desired temperature. As a non-exclusive example, the change in temperature of the second circulation fluid 44B from flow through the surface exchanger assembly 256 can be less than approximately one degree centigrade. With this small delta T, there is only a very minimal thermal gradient on the outer surface 46, and very minimal thermal distortion.
The design of each coil set 248, 250 and the number of conductors in each coil set 248, 250 can be varied to suit the design requirements of the stage mover 16. In
In one embodiment, (i) the first coil set 248 can also be referred to as a X coil set because current directed to the first coil set 248 is used to generate a force along the X axis; and (ii) the second coil set 250 can also be referred to as a Y coil set because current directed to the second coil set 250 is used to generate a force along the Y axis. Alternatively, conductor units can alternate in a checkerboard pattern between Y conductor units and X conductor units. In this example, (i) for each Y conductor unit, both coil sets would be Y coil sets, and (ii) for each X conductor unit, both coil sets would be X coil sets.
Moving from the bottom to the top in
With this design, (i) current can be directed to the X coil sets 248 (illustrated in
As provided herein, the conductor array 36 can be divided into a plurality of different zones, and the zones can be cooled at different rates. For example, each zone can include (i) a single coil set 248, 250; (ii) multiple coil sets 248, 250 having similar usages; (iii) a single conductor unit 40; (iv) a single coil 258, or (v) multiple conductor units 40 having somewhat similar usages. As provided herein, the first temperature system 42A and/or the second temperature system 44A can individually control the flow rate and temperature of the circulation fluid 42B, 44B directed to each zone.
In certain embodiments, each zone will require separate valves for the temperature control. Generally speaking, as the number of zones is increased, the required number of valves is increased and is more complicated. However, generally, as the number of zones is increased, the overall coolant flow is reduced because of the efficiency of the temperature control.
In one embodiment, the zones could be delineated by calculating the total heat generated by various coil sets 248, 250 during the planned usage for the stage assembly 10.
In this embodiment, the different X zones include (i) a first zone 262A (represented with conductor units labeled “A”); (ii) a second zone 262B (represented with conductor units labeled “B”); (iii) a third zone 262C (represented with conductor units labeled “C”); and (iv) a fourth zone 262D (represented with conductor units labeled “D”). Further, the Y zones include (i) a fifth zone 262E (represented with conductor units labeled “E”); (ii) a sixth zone 262F (represented with conductor units labeled “F”); (iii) a seventh zone 262G (represented with conductor units labeled “G”); and (iv) an eighth zone 262H (represented with conductor units labeled “H”).
In this example, (i) the X coil sets 248 that are part of the first zone 262A are used the most (of the X coil sets 248), require the most cooling, and are grouped together; (ii) the X coil sets 248 that are part of the second zone 262B are used the second most (of the X coil sets 248), require the second most cooling, and are grouped together; (iii) the X coil sets 248 that are part of the third zone 262C are used the third most, require the third most cooling (of the X coil sets 248), and are grouped together; and (iv) the X coil sets 248 that are part of the fourth zone 262D are used the least, require the least cooling (of the X coil sets 248), and are grouped together.
Somewhat similarly, (i) the Y coil sets 250 that are part of the fifth zone 262E are used the most (of the Y coil sets 250), require the most cooling, and are grouped together; (ii) the Y coil sets 250 that are part of the sixth zone 262F are used the second most (of the Y coil sets 250), require the second most cooling, and are grouped together; (iii) the Y coil sets 250 that are part of the seventh zone 262G are used the third most (of the Y coil sets 250), require the third most cooling, and are grouped together; and (iv) the Y coil sets 250 that are part of the eighth zone 262H are used the least (of the Y coil sets 250), require the least cooling, and are grouped together. It should be noted that comparing
In certain embodiments, the body temperature system 42A and/or the surface temperature system 44A can adjust the flow rate and/or the temperature of the coolant 42B, 44B (i) to the zones 262A-262H where more cooling is needed, and (ii) less to the zones 262A-262H where less cooling is needed. Stated in another fashion, in certain embodiments, the temperature controller 20 will adjust the rate in which heat is removed or added to certain zones 262A-262H (e.g. individual coils 258 or individual coil units).
For example, in one embodiment, the body temperature system 42A can adjust the rate in which heat is removed or added to a particular zones 262A-262H based on the usage of the conductors in that zones 262A-262H, while the surface temperature system 44A directs the second circulation fluid 44B at the same rate and temperature to each of the conductor units 40 regardless of which conductor units 40 generate more heat. In this example, (i) the body temperature system 42A directs the circulation fluid 42B to each zone 262A-262H to remove the heat generated within that zone 262A-262H; and (ii) the surface temperature system 44A directs the surface circulation fluid 44B to maintain the upper, outer surface 46 of each conductor unit 40 at the desired temperature. With this design, the flow rate and/or temperature of the first circulation fluid 42B can be individually adjusted to each zone 262A-262H (as needed based on the power consumption) to remove the majority of the heat, and the second circulation fluid 44B is used as a thermal shield to maintain the outer surface 46 to inhibit the transfer of heat from each conductor unit 40.
Alternatively, the surface temperature system 44A can also be designed to adjust the rate in which heat is removed or added depending upon the usage of the conductors in the respective zones 262A-262H. Still alternatively, the conductor units 40 can be grouped into more than eight or fewer than eight zones, and/or the shapes of the zones can be different.
Additionally, each of the zones 262A-262H can include one or more feedback elements 264 (illustrated with an X) that can provide feedback to the control system 22 regarding the respective zone 262A-262H for controlling the temperature adjuster 20. For example, each feedback element 264 can be a temperature sensor (e.g. a thermocouple or thermistor) that provides the temperature of a portion or substantially all of the respective zone 246A-246E. In one embodiment, multiple temperature sensors 264 in a zone can be averaged to determine an average temperature of that zone. Subsequently, this feedback can be provided to the control system 22 so that the control system 22 can precisely control the temperature controller 20. It should be noted that the temperature system 42A, 44A can include separate feedback systems.
It should be noted that the conductor array 36 can be divided into different zones than those illustrated in
In
For this particular planned movement, (i) the conductor units 40 that are part of the first zone 266A are used the most and require the most cooling; (ii) the conductor units 40 that are part of the second zone 266B are used the second most and require the second most cooling; (iii) the conductor units 40 that are part of the third zone 266C are used the third most and require the third most cooling; (iv) the conductor units 40 that are part of the fourth zone 266D are used the fourth most and require the fourth most cooling; and (v) the conductor units 40 that are part of the fifth zone 266E are used the least and require the least cooling. Thus, the conductor units 40 are divided into groups that are high power, medium-high power, medium power, medium-low power, and low power zones.
With this design, the body temperature system 42A and/or the surface temperature system 44A can adjust the temperature and/or flow rate of the coolant 42B, 44B (i) to each of the zones 266A-266E of the conductor array 36 where more cooling is needed, and (ii) less to the zones 266A-266E of the conductor array 36 where less cooling is needed to adjust the rate in which heat is removed or added to certain zones 266A-266E. In one embodiment, the body temperature system 42A can adjust the rate in which heat is removed or added to the zones 266A-266E based on the usage, while the surface temperature system 44A directs the second circulation fluid 44B at the same rate and temperature to each of the conductor units 40 regardless of usage. Additionally, or alternatively, the surface temperature system 44A can independently adjust the pressure and flow rate of the second circulation fluid 44B that is into a number of different zones.
Additionally, in
The design of the body temperature system 342A can vary pursuant to the teachings provided herein. In
In one, non-exclusive embodiment, (i) the first temperature is lower (colder) than the desired temperature setpoint of the zones 362A-362C, (ii) the second temperature is approximately equal to the temperature setpoint of the zones 362A-362C, and (iii) the third temperature is greater (hotter) than the setpoint of zones 362A-362C. For example, the setpoint can be twenty degrees Celsius, the first temperature can be approximately ten degrees Celsius, the second temperature can be approximately twenty degrees Celsius, and the third temperature can be approximately thirty degrees Celsius. Alternatively, the temperatures can be different from these examples. Still alternatively, the body temperature system 342A can be modified to use only two alternative temperature coolants or more than three alternative temperature coolants.
As provided herein, each temperature unit 370A, 372A, 374A can include one or more chiller/heat exchangers 370B, 372B, 374B (illustrated as a box), heat exchanger, pumps, reservoirs, and/or valves. Further, each temperature unit 370A, 372A, 374A can include an inlet 371A and an outlet 371B.
In one embodiment, the first temperature system 342A can include an inlet valve assembly 376 that independently controls the flow rate and temperature of the circulation fluid 342B directed to each of the zones 362A-362C, and an outlet valve assembly 378 that routes the circulation fluid 342B exiting the respective zone 362A, 362B, 362C to the desired temperature unit 370A, 372A, 374A. In one embodiment, the inlet valve assembly 376 includes a separate inlet valve group, and the outlet valve assembly includes a separate outlet valve group for each zone 362A, 362B, 362C.
More specifically, in
Somewhat similarly, the outlet valve assembly 378 includes (i) a first outlet valve group 378A which routes the circulation fluid 342B exiting the first zone 362A to the desired temperature unit 370A, 372A, 374A; (ii) a second outlet valve group 378B which routes the circulation fluid 342B exiting the second zone 362B to the desired temperature unit 370A, 372A, 374A; and (iii) a third outlet valve group 378C which routes the circulation fluid 342B exiting the third zone 362C to the desired temperature unit 370A, 372A, 374A.
With this design, the control system 322 can control the inlet valve assembly 376 so that at any given time, the circulation fluid 342B directed into a zone 362A-362C can be (i) all at the first temperature, (ii) all at the second temperature, (iii) all at the third temperature, or (iv) any mixture/ratio of any two or three temperature fluids. Thus, the temperature control is achieved by actively controlling the flow rate of three alternative temperature coolants 342B through each zone 362A-362C.
As provided herein, each valve group 376A-376C and 378A-378C can include one or more valves. For example, one or more of the valves can be an electronic on/off valve that controls the flow rate by controlling the on time and off time to adjust the flow rate. In another embodiment, one or more of the valves can be a motorized metering valve. It should be noted that the valve groups 376A-378C can be located wherever convenient and should be as close as possible to the respective zones 362A-362C to reduce time delay. For example, the valve groups 376A-378C can be positioned in the base assembly 18 and/or integrated in the conductor array 36.
When multiple different temperature coolants are used, the outlet valve assembly 378 is used in order to run the chiller/heat exchanger 370B, 372B, 374B of each temperature unit 370A, 372A, 374A at high efficiency. In contrast, if the body temperature system 342A is designed without the outlet valve assembly, the circulation fluid 342B exiting the zones 362-362C can be returned to a common reservoir tank (not shown).
In one embodiment, the control system 322 controls the outlet valve assembly 378 to direct the circulation fluid 342B exiting the zones 362A-362C to the appropriate temperature unit 370A, 372A, 374A for efficient usage. For example, the control system 322 controls the outlet valve assembly 378 so that (i) if the outlet temperature is not too different from inlet temperature, then the circulation fluid 342B exiting the zone is send the temperature unit it came from; (ii) if the outlet temperature is significantly colder/hotter than inlet temperature then the circulation fluid 342B exiting the zone is diverted to different temperature unit depending on the temperature (to prevent mixing of hot and cold coolant).
As detailed above, in one example, the hot is thirty degrees Celsius, the medium is twenty degrees Celsius, and the cold is ten degrees Celsius. In this example, if the cold coolant is sent to a zone and the outlet temperature of circulation fluid 342B from the zone is at approximately twenty degrees Celsius, then the exiting circulation fluid 342B is directed to the medium temperature unit 372A. Alternatively, if the medium coolant is sent to a zone, and the outlet temperature of circulation fluid 342B from the zone is at approximately twenty degrees Celsius, then the exiting circulation fluid 342B is again directed to the medium temperature unit 372A. At the same time, the control system 322 can control the outlet valve assembly 378 so that not too much or too little circulation fluid 342B is directed to each of the temperature units 370A, 372A, 374A.
As non-exclusive examples, the control system 322 can direct the following valve actuation sequences: (i) when the hot inlet is open, the corresponding hot outlet is also open (similarly for medium and cold coolants), ensuring that the amount of fluid drawn from each temperature unit outlet 371B is returned to the corresponding inlet 371A; or (ii) the inlet and outlet valves are not synchronized together, so that circulation fluid from each temperature unit 370A, 372A, 374A may be returned to a different temperature unit 370A, 372A, 374A. In the second sequence, the inlet valve assembly 376 can open based on the expected or measured temperature of the respective zone 362A-362C, and the outlet valve assembly 378 may open based on the expected or measured exit temperature of fluid 342B. However in this case, steps must be taken to make sure that each temperature unit is supplied with an appropriate amount of circulation fluid 342B, and none of the temperature units are allowed to overflow or underfill.
Additionally, in certain embodiments, (i) the first temperature unit 370A can include a first active bypass valve 370C that can be controlled to selectively direct the flow of the first circulation fluid 334B from the outlet 371B to the inlet 371A of the first temperature unit 370A, (ii) the second temperature unit 372A can include a second active bypass valve 372C that can be controlled to selectively direct the flow of the first circulation fluid 334B from the outlet 371B to the inlet 371A of the second temperature unit 372A, and (iii) the third temperature unit 374A can include a third active bypass valve 374C that can be controlled to selectively direct the flow of the first circulation fluid 334B from the outlet 371B to the inlet 371A of the third temperature unit 374A.
The chiller/heat exchangers 370B, 372B, 374B typically have a certain minimum flow rate required for their efficient operation. The bypass valves 370C, 372C, 374C can be used at the supply and return of the chiller/heat exchangers 370B, 372B, 374B to ensure their continuous operation even when the flow between a particular temperature unit 370A, 372A, 374A and the zones 362A-362C is approximately zero. More specifically, the bypass valves 370B, 372B, 374B at the chiller may be required because at certain times, the flow of the circulation fluid to the zones can be zero.
As provided above, in order to increase the flow of the circulation fluid to the zones, the bypass valve and the valve assemblies can be operated in a complementary fashion (for example: if medium valve is open fully at inlet of zone then bypass valve for medium temp chiller can be closed so that most of the flow is going to the zone). As an example, at a particular time, if there is no flow of the cold coolant to the zones, the first bypass valve 370C can be opened so that the circulation fluid 342B exiting the first temperature unit 370A through outlet 371B can be rerouted (via the first bypass valve 370B) to the inlet 371A of the first temperature unit 370A to maintain the flow of the circulation fluid 342B in the first temperature unit 370A. Subsequently, when the cold coolant is required in the zones, the first bypass valve 370B can be selectively closed so that maximum cold coolant flow can be directed to the zones.
In
In
Additionally, in
Next, in
Subsequently, at block 406, the valve switching necessary to achieve the desired temperature and flow rate of the circulation fluid to the respective zones are determined. Basically, the valve switching determines which valves and how much these valves need to be open to achieve the desired temperature correction. As non-exclusive examples, the valves can be digital (pulse wave modulated) or analog (infinitely variable).
Next, block 408 represents the system temperature dynamics that results from the flow of the circulation fluid through the respective zones and from the heat dissipation of the stage mover 16.
In this embodiment, the feedback control 400 is constantly correcting for errors all the time, and in parallel the feedforward control 402 corrects for predictable disturbances, such as the known stage trajectory and force required from stage mover 16, which will include (but is not limited to) the heat output from the coils.
As provided herein, the problem of precision temperature control of an outer surface of a motor is solved by augmenting error feedback with (i) feedforward of coil heat for disturbance compensation, (ii) predictive control for overcoming time lag, and (iii) an active bypass to maximize flow. In contrast, a control system that uses only error feedback for temperature control may be unable to achieve fine temperature control due to the fact that a significant heat energy is dissipated at each of the conductor units and rapid compensation of this disturbance would require a significantly large gains that may make the control system 422 unstable and oscillatory. To solve this problem, feedforward of the heat dissipation of various zones can be used to take compensatory action at an earlier time or in a more rapid manner than what is possible with a stable feedback controller, thereby providing finer temperature control.
Further, the feedforward control system 402 assists in solving a time lag (time delay “Td”) issue. More specifically, the valves in the inlet valve assembly 376 that operate the flow of the circulation fluid 342B into the zones 362A-362C are a finite distance away from the zones 362A-362C. If a valve opens (starting from a completely closed position to a finite flow) then the circulation fluid 342B that exits the valve will take a finite time to reach the respective zone 362A-362C. Thus, there is a time delay (Td) between when a valve opens and when the circulation fluid reaches the zone and starts cooling/heating. The time delay will depend on the fluid velocity, distance of fluid travel between the valves and the zones, and the diameter of the connecting lines. If the flow velocity is high (flow velocity can be made larger for a given flow rate by decreasing the cross-section), the time delay is lower, but the flow resistance (pressure drop) is larger. This time lag is detrimental to fine control of temperature since it limits the maximum stable gain.
This problem can be tackled by following ways. The time lag can be reduced by decreasing the distance between valves and the zones 362A-362C as well as by decreasing the cross section area of the tubes (to increase flow velocity for a given volumetric flow rate). However, but decreasing the area results in a penalty of increased flow resistance and higher pressure. Additionally, the feedforward control 402 can be calculated Td seconds ahead of time. The application of feedforward control 402 ahead of time (predictive control) is possible since the exact movements of the stage and the usage of the conductor units 40 is known ahead of time.
In certain embodiments, this time delay comes into play only when the previously flowing coolant is at a different temperature than the future coolant. For example, if the flowing coolant is at the medium temperature, and next, the hot temperature coolant is needed because the power to zone is reduced or turned off, the valves 376 need to open and close Td seconds before power to the conductor units 40 will be turned off. This hot coolant has to be turned on Td seconds before power to the coils is turned off. On the other hand, if coolant of the proper temperature was already flowing, and only a flow rate change is required, the valves 376 can adjust at the same time that the power dissipation of the conductor units 40 changes.
As provided herein, temperature control of the outer surface to within a narrow band is possible by making use of feedforward control 402 for disturbance compensation and actuating valves 376 and bypass valves 370C, 372C, 374C ahead of time to compensate for time lags. The feedforward control 402 reduces disturbances, and the feedback control 400 corrects errors in temperature.
One example of the sample logic for valve opening is as follows: (i) if −q<a<q medium temperature valve is opened (q is an empirical threshold for valve actuation that depends on feedforward and feedback gain and parameter “a” is defined above); (ii) if a>q (parameter “a” greater than q) then the hot valve is opened; (iii) if a<−q (parameter “a” less than negative q) then the cold valve is opened.
Further, with information from the feedback the feedback elements 264, the model temperature estimator can be regularly updated and improved so as to more accurately and effectively predict the required coolant flow rate for each zone 462.
Comparing the second profile 502 to the third profile 504, there is less temperature error with feedforward control. More specifically, in the second profile 502, there is an overshoot error 506 because of the beginning of the power pulse directed to the coils in the first zone was not anticipated and the cold coolant was sent too late. Also, in the second profile 502, there is an undershoot error 508 because ending of the power pulse to the coils in the first zone was not anticipated and the hot coolant was sent too late.
In contrast, in the third profile 504, the overshoot 506 and the undershoot 508 have been significantly reduced using the feedforward control which can open or close valves in advance of any changes in the power supplied to the conductor units 40. As provided herein, the feedforward control can be used to reduce the influence of any predicted disturbance (e.g., changes in the applied heat) on the system.
With this design, the first temperature system 642A can individually control the flow of the first circulation fluid 642B to one or more of the heat exchangers 654A, 654B, and the second temperature system 644A can direct the second circulation fluid 644B into the passageway around the conductor units 640A, 640B, 640C.
In
As provided herein, the temperature controller 720 can be controlled by the control system 722 to selectively and individually control the flow rate and/or temperature of the first circulation fluid 742B and/or the second circulation fluid 744B to each conductor unit 740 depending upon the amount of heat generated by the respective conductor unit 740. Thus, during operation of the stage mover 716, if the 6/6 conductor unit generates more heat than the 12/1 conductor unit, the temperature controller 720 can selectively and individually adjust the temperature and/or flow rate of the first circulation fluid 742B and the second circulation fluid 744B accordingly. Alternatively, only the flow rate and temperature of the first circulation fluid 742B that is directed to each of the conductor units 740 is individually controlled.
With this design, the problem of using high volumetric flow rate of circulation fluids 742B, 744B (coolant) of a planar motor 716 is solved by controlling the fluid flow rate of one or both of the circulation fluids 742B, 744B to each conductor units 740 based on their power utilization. In this way, each conductor unit 740 is only supplied with the minimum necessary flow of the circulation fluids 742B, 744B.
Additionally, in this embodiment, each conductor unit 740 can include one or more feedback elements 764 (represented with an “x”) that provides feedback to the control system 722 for controlling the temperature controller 720.
However, in this embodiment, the base assembly 718 includes (i) a base body manifold 718A (illustrated with a box in phantom) that connects the first circulation system 742A in fluid communication with the body exchanger assembly 754 for each conductor unit 740, and (ii) a base surface manifold 718B (illustrated with a box in phantom) that connects the second circulation system 744A in fluid communication with the surface exchanger assembly 756 for each conductor unit 740.
Further, the body exchanger assembly 754 includes a unit body manifold 754D and a unit body flow control 754E that are in fluid communication with the base body manifold 718A; and (ii) the surface exchanger assembly 756 includes a unit surface manifold 756B that is in fluid communication with the base surface manifold 718B.
In this embodiment, (i) the first temperature system 742A independently directs the first circulation fluid 742B through the body exchanger assembly 754 of each conductor unit 740A, 740B, 740Z to remove the bulk of the heat; and (i) the second temperature system 744A directs the second circulation fluid 744B through the surface exchanger assembly 756 of each conductor unit 740A, 740B, 740Z to maintain the upper, outer surface of each conductor unit 740A, 740B, 740Z at the desired temperature.
In the embodiment illustrated in
In one embodiment, the body flow control 754E of each conductor unit 740A, 740B, 740Z includes a valve assembly 754F that can be used to control the flow rate of the first circulation fluid 742B to the body exchangers 754A, 754B, 754C of each conductor unit 740A, 740B, 740Z. For example, the valve assembly 754F can be an electronic valve controlled by the control system 722. With this design, the control system 722 can independently and selectively adjust the valve assembly 754F of each conductor unit 740A, 740B, 740Z to selectively adjust and control the flow rate of the first circulation fluid 742B to the body exchangers 754A, 754B, 754C of each conductor unit 740A, 740B, 740Z. In alternative embodiments, the valve assembly 754F can be one or more fixed orifices that determine flow rates that correspond to the average heat dissipated in each conductor unit 740A, 740B, 740Z.
In
Further, in
In summary, in
In
Further, the body flow control 854E of each conductor unit 840A, 840B, 840Z includes a valve assembly 854F that can be used to independently control the flow rate of the first circulation fluid 842B to each of the body exchangers 854A, 854B, 854C of each conductor unit 840A, 840B, 840Z. For example, the valve assembly 854F can include three electronic valves A, B, C controlled by the control system 822. With this design, the control system 822 can independently and selectively adjust the valves A, B, C to selectively and independently adjust and control the flow rate of the first circulation fluid 8542B to each body exchanger 854A, 854B, 854C of each conductor unit 840A, 840B, 840Z based on the amount of heat generated, and which coil set (not shown in
Further, in
In this embodiment, the surface flow control 856C of each conductor unit 840A, 840B, 840Z includes a valve assembly 856D that can be used to individual control the flow rate of the second circulation fluid 844B to the surface exchange 856A of each conductor unit 840A, 840B, 840Z based on the flow rate required to maintain the proper surface temperature. For example, the valve assembly 856D can be an electronic valve controlled by the control system 822. The valve assembly 856D can be positioned at the inlet or the outlet of the unit surface manifold 856B. As non-exclusive examples, the valve assembly 856D can include a pulse width modulated valve or metering valve.
In summary, in
It should be noted that other embodiments of the temperature controller are possible.
In this embodiment, the first circulation system 942A again directs the circulation fluid 942B through the body exchangers 954A, 954B, 954C to remove the bulk of the heat from the conductor unit 940. Further, the flow rate and/or temperature of the first circulation fluid 942B (i) can be selectively and individually controlled according to the heat generated by each conductor unit 940; (ii) can be selectively and individually controlled to various portions of each conductor unit 940; (iii) can be selectively and individually controlled to various groups of the conductor units 940; or (iv) can be controlled to be the same for all of the conductor units 940.
However, in this embodiment, the second temperature system 944A is different. More specifically, in this embodiment, the second temperature system 944A includes an exchanger assembly 944B that includes a phase change material to maintain the upper, outer surface 946 of each conductor unit 940 at the desired temperature. This can inhibit the transfer of heat from the conductor units 940 to the surrounding environment.
In certain embodiments, the phase change material can be engineered to melt/freeze or to boil/condense at the required temperature. With this design, the surface temperature can be maintained without directing a coolant through the exchanger assembly 944B. Thus, a very large flow of coolant is not necessary to maintain constant temperature of the surface 946.
With this design, the problem of temperature control of the countermass surface temperature using fluid flow along with active control system is solved by a stationary phase change material at the surface of the countermass that changes phase at the nominal surface temperature without the need for fluid flow or active temperature control.
In this embodiment, the exchanger assembly 1044B includes a housing assembly 1072 that defines a sealed housing chamber 1074, and a substantially stationary (non-circulating) phase change material 1076 positioned in the sealed housing chamber 1074. The housing 1072 can be made from a non-electrically conductive, non-magnetic material, such as titanium, or non-electrically conductive plastic or ceramic.
In this example, the phase change material 1076 is represented with (i) rectangles that illustrate the “colder” phase (e.g., solid or liquid of the phase change material 1076, and (ii) circles that illustrate the “hotter” phase (liquid or gaseous, respectively) of the phase change material 1076. In the examples illustrated in the Figures provided herein, the phase change material 1076 is illustrated as being approximately one half in the colder state and approximately one half in the hotter state. However, the actual physical phase of the phase change material 1076 will depend on how much heat is being added or removed from the phase change material 1076. Further, in this embodiment, the phase change material 1076 is sealed within and does not circulate in and out of the sealed housing chamber 1074. With this design, the layer of phase change material 1076 (PCM) (for example an inert, organic-microencapsulated PCM) could be used on the topmost surface of the conductor array. The phase change material 1076 can change between liquid and solid or between liquid and vapor.
Additionally, in certain embodiments, the exchanger assembly 1044B can include one or more feedback elements 1078A, 1078B (two are illustrated herein) which can be used to determine the present phase of the phase change material 1076. With this design, feedback from the feedback elements 1078A, 1078B can be directed to the control system (not shown) which can control the flow and/or temperature of the first circulation fluid (not shown) to actively control the phase of the phase change material 1076. In certain embodiments, the control system maintains the phase change material 1076 at approximately a 50/50 solid to liquid (or liquid to vapor) ratio so that the phase change material 1076 is ready to absorb or liberate heat while still maintaining the desired surface temperature. As non-exclusive examples, one of the feedback elements 1078A can be a temperature sensor, and the other feedback element 1078B can be a pressure sensor or an optical sensor that measures transparency or opacity of phase change material.
Importantly, in this embodiment, heat can be absorbed or liberated from the exchanger assembly 1044B while still maintaining approximately the same temperature of the exchanger assembly 1044B.
In one embodiment, the predetermined temperature is twenty-three degrees Celsius. In
The design of the phase change material 1076 can be varied according to the desired predetermined temperature. As provided herein, the phase change material 1076 can be engineered to have a melting point at the specific, predetermined desired temperature. As a non-exclusive example, the phase change material 1076 can be designed to have a phase change temperature (solid to liquid) at 23 C. Non-exclusive examples of the phase change material 1076 include hydrated salts or organic materials which are able to change phase at around 20C. The size and shape of the exchanger assembly 1044B and the phase change material 1076 can be varied to suit the design requirements of the system.
One advantage of the embodiment shown in
It should be noted that the heat dissipated by the conductor units 1040 still needs to be extracted out of the system by the circulation fluid. However, in this example, the top surface of the housing 1072 can be maintained at a substantially constant and uniform temperature.
The present invention can be used in all lithography systems for maintaining constant temperature without the need for flow or active control system which reduces cost and more allows for more compact design.
With this design the present invention can be used to control the temperature of temperature sensitive equipment 1182. For example, for precision equipment 1182 that needs a constant temperature (e.g. 23C) but is also exposed sometimes to the heat (e.g. sun) or sometimes to cold then the phase change material 1176 could be used to maintain same temperature. In that case, the enclosure of the equipment 1182 can be made of phase change material 1176 (with appropriate phase change temperature). With this design, the phase change material 1176 surrounds the area to be kept at constant temperature. The phase change material 1176 liberates heat and freezes but temperature is constant at 23C. Further, the phase change material 1176 takes up heat and melts but temperature is constant at 23C.
The exposure apparatus 1230 is particularly useful as a lithographic device that transfers a pattern (not shown) of an integrated circuit from the reticle 1288 onto the semiconductor wafer 1290. The exposure apparatus 1230 mounts to the mounting base 1224, e.g., the ground, a base, or floor or some other supporting structure.
The illumination system 1282 includes an illumination source 1292 and an illumination optical assembly 1294. The illumination source 1292 emits a beam (irradiation) of light energy. The illumination optical assembly 1294 guides the beam of light energy from the illumination source 1292 to the optical assembly 1286. The beam illuminates selectively different portions of the reticle 1288 and exposes the semiconductor wafer 1290. In
The optical assembly 1286 projects and/or focuses the light passing through the reticle to the wafer. Depending upon the design of the exposure apparatus 1230, the optical assembly 1286 can magnify or reduce the image illuminated on the reticle.
The reticle stage assembly 1284 holds and positions the reticle 1288 relative to the optical assembly 1286 and the wafer 1290. Similarly, the wafer stage assembly 1210 holds and positions the wafer 1290 with respect to the projected image of the illuminated portions of the reticle 1288.
There are a number of different types of lithographic devices. For example, the exposure apparatus 1230 can be used as scanning type photolithography system that exposes the pattern from the reticle 1288 onto the wafer 1290 with the reticle 1288 and the wafer 1290 moving synchronously. Alternatively, the exposure apparatus 1230 can be a step-and-repeat type photolithography system that exposes the reticle 1288 while the reticle 1288 and the wafer 1290 are stationary.
However, the use of the exposure apparatus 1230 and the stage assemblies provided herein are not limited to a photolithography system for semiconductor manufacturing. The exposure apparatus 1230, for example, can be used as an LCD photolithography system that exposes a liquid crystal display device pattern onto a rectangular glass plate or a photolithography system for manufacturing a thin film magnetic head. Further, the present invention can also be applied to a proximity photolithography system that exposes a mask pattern by closely locating a mask and a substrate without the use of a lens assembly. Additionally, the present invention provided herein can be used in other devices, including other semiconductor processing equipment, elevators, machine tools, metal cutting machines, inspection machines and disk drives.
As described above, a photolithography system according to the above described embodiments can be built by assembling various subsystems, including each element listed in the appended claims, in such a manner that prescribed mechanical accuracy, electrical accuracy, and optical accuracy are maintained. In order to maintain the various accuracies, prior to and following assembly, every optical system is adjusted to achieve its optical accuracy. Similarly, every mechanical system and every electrical system are adjusted to achieve their respective mechanical and electrical accuracies. The process of assembling each subsystem into a photolithography system includes mechanical interfaces, electrical circuit wiring connections and air pressure plumbing connections between each subsystem. Needless to say, there is also a process where each subsystem is assembled prior to assembling a photolithography system from the various subsystems. Once a photolithography system is assembled using the various subsystems, a total adjustment is performed to make sure that accuracy is maintained in the complete photolithography system. Additionally, it is desirable to manufacture an exposure system in a clean room where the temperature and cleanliness are controlled.
Further, semiconductor devices can be fabricated using the above described systems, by the process shown generally in
At each stage of wafer processing, when the above-mentioned preprocessing steps have been completed, the following post-processing steps are implemented. During post-processing, first, in step 1315 (photoresist formation step), photoresist is applied to a wafer. Next, in step 1316 (exposure step), the above-mentioned exposure device is used to transfer the circuit pattern of a mask (reticle) to a wafer. Then in step 1317 (developing step), the exposed wafer is developed, and in step 1318 (etching step), parts other than residual photoresist (exposed material surface) are removed by etching. In step 1319 (photoresist removal step), unnecessary photoresist remaining after etching is removed.
Multiple circuit patterns are formed by repetition of these preprocessing and post-processing steps.
While the particular stage assembly as shown and disclosed herein is fully capable of obtaining the objects and providing the advantages herein before stated, it is to be understood that it is merely illustrative of the presently preferred embodiments of the invention and that no limitations are intended to the details of construction or design herein shown other than as described in the appended claims.
This application claims priority on U.S. Provisional Application Ser. No. 61/592,712, filed Jan. 31, 2012, and entitled “SYSTEM AND METHOD FOR CONTROLLING A SURFACE TEMPERATURE OF A CONDUCTION ARRAY”. This application also claims priority on U.S. Provisional Application Ser. No. 61/594,250, filed Feb. 2, 2012, and entitled “TEMPERATURE CONTROL OF A MOVER WITH ACTIVE BYPASS AND PREDICTIVE FEEDFORWARD CONTROL”. Further, this application claims priority on U.S. Provisional Application Ser. No. 61/594,273, filed Feb. 2, 2012, and entitled “SYSTEM AND METHOD FOR CONTROLLING A TEMPERATURE OF A CONDUCTOR ARRAY”. As far as permitted, the contents of U.S. Provisional Application Ser. Nos. 61/592,712, 61/594,250, and 61/594,273 are incorporated herein by reference. This application is a continuation in part of U.S. patent application Ser. No. 13/538,421 filed on Jun. 29, 2012 and entitled “HYBRID COOLING AND THERMAL SHIELD FOR ELECTROMAGNETIC ACTUATORS”. U.S. patent application Ser. No. 13/538,421 claims priority on U.S. Provisional Application Ser. No. 61/503,095, filed Jun. 30, 2011, and entitled “HYBRID COOLING AND THERMAL SHIELD FOR ELECTROMAGNETIC ACTUATORS”. As far as permitted, the contents of U.S. application Ser. No. 13/538,421 and U.S. Provisional Application Ser. No. 61/503,095 are incorporated herein by reference.
Number | Date | Country | |
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61503095 | Jun 2011 | US | |
61592712 | Jan 2012 | US | |
61594250 | Feb 2012 | US | |
61594273 | Feb 2012 | US |
Number | Date | Country | |
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Parent | 13538421 | Jun 2012 | US |
Child | 13756176 | US |