This application claims priority to Taiwan Application Serial Number 110109190, filed on Mar. 15, 2021, which is herein incorporated by reference.
The present disclosure relates to a testing apparatus. More particularly, the present disclosure relates to a testing apparatus capable of picking a semiconductor element through vacuum suction.
With the rapid development of electronic technology and the appearance of high-tech electronical industries in recent years, electronic products with more user-friendly and better function are constantly introduced and designed in the trend of light and compact.
However, when a semiconductor element is pressed down to a testing area for a testing procedure, since the thinner semiconductor element may be less resistant to pressure, during an error detection process, the above-mentioned semiconductor element is easy to be damaged or cracked, and even affect the test results.
Therefore, the above-mentioned method still has inconveniences and shortcomings, which needs to be further improved. Therefore, how to effectively solve the above-mentioned inconveniences and shortcomings is one of the current essential research and development topics, and it has also become an urgent need for improvement in related fields.
One aspect of the present disclosure is to provide a testing apparatus and its element pickup module to solve the aforementioned problems of the prior art.
In one embodiment of the present disclosure, a testing apparatus is provided, and includes a vacuum pump equipment, a testing stage and an element pickup module. The testing stage includes a testing area and a plurality of terminals arranged within the testing area. The element pickup module includes a mobile arm, an air passage set and a pressure-buffering portion. The mobile arm is movable towards the testing stage. The air passage set is disposed within the mobile arm, and respectively connected to the vacuum pump equipment and a bottom portion of the mobile arm. The pressure-buffering portion includes an elastic pad and a plurality of penetrating openings. The elastic pad is disposed on the bottom portion of the mobile arm, and the elastic pad is provided with a flat surface for contacting a semiconductor element. The penetrating openings are distributed on the flat surface to connect to the air passage set so that the semiconductor element is fixedly held on the flat surface by the vacuum pump equipment through the penetrating openings. When the pressure-buffering portion presses the semiconductor element downwardly on the terminals in the testing area, the semiconductor element is electrically connected to the terminals.
In one embodiment of the present disclosure, an element pickup module is provided, and the element pickup module includes a mobile arm, an air passage set and a pressure-buffering portion. The air passage set disposed within the mobile arm, and connected to one bottom portion of the mobile arm for connecting to a vacuum pump equipment. The pressure-buffering portion includes an elastic pad and a plurality of penetrating openings. The elastic pad is disposed on the bottom portion of the mobile arm, and provided with a flat surface for contacting a semiconductor element. The penetrating openings are distributed on the flat surface to connect to the air passage set so that the semiconductor element is fixedly held on the flat surface by the vacuum pump equipment through the penetrating openings.
Thus, through the construction of the embodiments above, the present disclosure can slow down the warpage of the semiconductor element as the semiconductor element being pressed down to the testing area, so as to reduce the possibilities of the semiconductor element getting damaged or cracked under pressure, and make the semiconductor element to be more resistant to pressure.
The above description is merely used for illustrating the problems to be resolved, the technical methods for resolving the problems and their efficacies, etc. The specific details of the present disclosure will be explained in the embodiments below and related drawings.
The accompanying drawings are included to provide a further understanding of the present disclosure, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure.
Reference will now be made in detail to the present embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts. According to the embodiments, it will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the present disclosure.
Reference is now made to
The element pickup module 300 includes a mobile arm 310, an air passage set 320 and a pressure-buffering portion 330. The mobile arm 310 is movable towards the testing area 211, for example, the mobile arm 310 can be driven to move downward to the testing area 211 by a robotic device or a cylinder. More specifically, the mobile arm 310 can be moved to the testing area 211 of the testing stage 200 or away from the testing area 211 of the testing stage 200 along a vertical direction (for example, the Z axis). The pressure-buffering portion 330 includes an elastic pad 340 and a plurality of penetrating openings 350. The elastic pad 340 is in a flat shape, and the elastic pad 340 includes an installation surface 341 and a flat surface 342 that are opposite to each other. The installation surface 341 of the elastic pad 340 is fixedly connected to a bottom portion 312 of the mobile arm 310. The penetrating openings 350 are spaced arranged on the elastic pad 340. Each of the penetrating openings 350 goes through the elastic pad 340 to be connected to the installation surface 341 and the flat surface 342, respectively. The air passage set 320 is disposed within the mobile arm 310, and respectively connected to the vacuum pump equipment 100 and the bottom portion 312 of the mobile arm 310. One end of the air passage set 320 is in communication with the vacuum pump equipment 100, the other end of the air passage set 320 is in communication with the penetrating openings 350 through the bottom portion 312 of the mobile arm 310. With the vacuum suction force V provided by the vacuum pump equipment 100, a semiconductor element 400 (e.g., semiconductor product) can be fixedly sucked on the flat surface 342 of the elastic pad 340 through the penetrating openings 350 by a vacuum adsorption fashion.
Thus, when the mobile arm 310 is moved to the semiconductor element 400, the mobile arm 310 directly flat contacts with one side of the semiconductor element 400 using the flat surface 342 of the elastic pad 340, and the mobile arm 310 fixedly sucks the semiconductor element 400 through the vacuum suction force V from the penetrating openings 350. Accordingly, the mobile arm 310 is able to pick up the semiconductor element 400 and then move the semiconductor element 400 above the testing area 211; next, when the mobile arm 310 presses the semiconductor element 400 down to the testing area 211 in a vertical direction (e.g., axis Z), the other side of the semiconductor element 400 can be electrically connected to the terminals 230 located within the testing area 211 for processing the testing procedure.
Therefore, through the construction of the embodiments above, the present disclosure can slow down the warpage of the semiconductor element as the semiconductor element being pressed down to the testing area, so as to reduce the possibilities of the semiconductor element getting damaged or cracked under pressure, and make the semiconductor element to be more resistant to pressure.
It is noted, since the elastic pad 340 is airtight, no external air can penetrate between the flat surface 342 of the elastic pad 340 and the semiconductor element 400; because the elastic pad 340 is compressible, when the semiconductor element 400 is pressed to be sandwiched between the elastic pad 340 and the terminals 230, the pressure-buffering portion 330 is able to reduce the opposing pressure force of the semiconductor element 400 by the compression of the elastic pad 340, thereby reducing the possibilities of the semiconductor element 400 being cracked; since the elastic pad 340 is soft, the flat surface 342 of the elastic pad 340 will not damage the side of the semiconductor element 400. For example, the elastic pad 340 includes a rubber pad, a silicon rubber pad or an indium foil, etc. However, the present disclosure is not limited to this.
Furthermore, as shown in
Also, the air passage set 320 comprises a main pipe 321 and a plurality of sub-pipes 322 collectively in communication with the main pipe 321 and directly connected to the penetrating openings 350 respectively. In this embodiment, each of the sub-pipes 322 is L-shaped, one end of each of the sub-pipes 322 is exposed from the bottom portion 312 of the mobile arm 310, and the other end of each of the sub-pipes 322 is connected to the main pipe 321. The printed wiring board 360 is further formed with a through hole 363. The through hole 363 is located between the main pipe 321 and the aforementioned air gap 391, is coaxially aligned with the main pipe 321, and connected with the main pipe 321 and the aforementioned air gap 391, respectively.
Furthermore, the air passage set 320 further includes a configuration recess 323 concavely formed at the top 311 of the mobile arm 310 facing away from the pressure-buffering portion 330 for accommodating the above-mentioned printed wiring board 360, the memory unit 370 and the probe pins 380. In addition, the configuration recess 323 is further connected to the vacuum pump equipment 100 through pipelines 110. Thus, when the vacuum pump equipment 100 starts to provide vacuum suction force V, that is, air in the air passage set 320 starts to be drawn back to the vacuum pump equipment 100 through the through hole 363 of the printed wiring board 360, the air gap 391 and the configuration recess 323 in order to perform the process of the semiconductor element 400 being sucked to the pressure-buffering portion 330 by the vacuum adsorption fashion.
More specifically, the semiconductor element 400 includes a substrate 410, a bare die element 420, a plurality of solder balls 430 and a plurality of contacting points 440. The substrate 410 is formed with a first surface 411 and a second surface 412 which are opposite to each other. The solder balls 430 are spaced arranged on the first surface 411 of the substrate 410 in the horizontal direction (e.g., axis Y). The contacting points 440 are spaced arranged on the second surface 412 of the substrate 410 in the horizontal direction (e.g., axis Y). The bare die element 420 is disposed on the second surface 412 of the substrate 410 between the contacting points 440 for directly flat contacting with the flat surface 342 of the elastic pad 340. An area of the bare die element 420 is not greater than an area of the flat surface 342 of the elastic pad 340, however, the present disclosure is not limited thereto.
Therefore, when the pressure-buffering portion 330 sucks the semiconductor element 400, the flat surface 342 of the elastic pad 340 directly flat contacts with one surface of the bare die element 420 facing away from the substrate 410 to suck the surface of the bare die element 420 by the vacuum suction force V from the penetrating openings 350. In addition, when the pressure-buffering portion 330 presses the semiconductor element 400 down to the testing area 211, the semiconductor element 400 is pressed to be sandwiched between the elastic pad 340 and the terminals 230, so that the contacting points 440 of the semiconductor element 400 are respectively in contact with the probe pins 380, and the solder balls 430 of the semiconductor element 400 are respectively in contact with the terminals 230 of the testing stage 200. It is noted, since two pressure forces respectively applied to the opposite main surfaces of the semiconductor element 400 by the pressure-buffering portion 330 and the terminals 230 are substantially the same, the semiconductor element 400 will not be damaged and cracked when being pressed. Thus, since the pressure forces respectively applied to the upper and lower sides of the semiconductor element 400 are approximately equal and evenly, the warpage of the substrate 410 of the semiconductor element 400 can be declined, thereby rendering the substrate 410 of the semiconductor element 400 not easy to be cracked.
Reference is now made to
Also, specifically, as shown in
Reference is now made to
Specifically, as shown in
In the embodiment, the crack noise monitoring device 50 further includes a sensor 810 and a trigger switch 820. The sensor 810 is electrically connected to the processing unit 900 for detecting whether the semiconductor element 400 is being pressed down on the testing stage 200. The trigger switch 820 is electrically connected to the processing unit 900 and the voiceprint generation unit 600. Thus, when it is detected that the semiconductor element 400 is being pressed to the testing stage 200 in an instant, the processing unit 900 controls the trigger switch 820 to activate the voiceprint generation unit 600. Thus, within a predetermined interval, the voiceprint generation unit 600 starts to receive the sound wave transmitted from the semiconductor element 400 through the testing apparatus 10, and converts the sound wave into the second voiceprint pattern for subsequent comparison and determination by the processing unit 900.
For example, the predetermined interval is set as a time period from the beginning of the semiconductor element 400 pressed down to the completion of the semiconductor element 400 pressed down. The starting point for monitoring the split of the semiconductor element 400 is 200 milliseconds before the semiconductor element 400 reaches the testing area 211 and the ending point for monitoring the same is 300 milliseconds after the semiconductor element 400 reaches the testing area 211, so the predetermined interval is about 500 milliseconds in total. In this embodiment, the sensor 810 is, for example, a conventional method such as pressure sensing detection, light detection, or image detection. However, the present disclosure is not limited thereto.
In the embodiment, for example, the crack noise monitoring device 50 further includes an alarm unit 830 electrically connected to the processing unit 900. The alarm unit 830 is a device operating by video, sound, light or driving other machines, for example. However, the present disclosure is not limited thereto. Thus, when it is determined that the first voiceprint pattern is identical to the second voiceprint pattern, the processing unit 900 controls the alarm unit 830 to issue an alarm outwardly. When it is determined that the first voiceprint pattern is not identical to the second voiceprint pattern, the processing unit 900 controls the alarm unit 830 to be inaction, or issues other type of message outwardly. The present disclosure is not limited thereto. In other embodiments, the present disclosure can omit the alarm unit, or use other similar way that can inform the split.
The sound guide tube 720 is respectively fixedly connected to the solid conductive vibrator 710 and the voiceprint generation unit 600. Furthermore, one end of the sound guide tube 720 is fixed to the solid conductive vibrator 710 through a first fixing ring 760, the other end of the sound guide tube 720 is fixed to the voiceprint generation unit 600 through a second fixing ring 770. The sound guide tube 720 is in communication with the solid conductive vibrator 710 and the voiceprint generation unit 600. In addition, the sound guide tube 720 is not limited to a hard type or a soft type thereof. The first fixing ring 760 is formed with an opening 761 that is in communication with a sound transmission channel 732 of the sound guide tube 720. The diaphragm 780 is disposed within the sound guide tube 720. For example, the diaphragm 780 is tightly located within the opening 761 of the first fixing ring 760. The diaphragm 780 is used to push air in the sound transmission channel 732 of the sound guide tube 720 for converting into a corresponding sound wave towards the voiceprint generation unit 600 according to the vibration received from the semiconductor element 400 through the testing apparatus 10.
The sound guide tube 720 includes a soundproof inner tube 730, a soundproof outer tube 740 and a porous sound-absorbing material 750. The soundproof inner tube 730 includes the aforementioned sound transmission channel 732 which penetrates through two opposite ends of the soundproof inner tube 730. The soundproof outer tube 740 surrounds the soundproof inner tube 730 such that an enclosed space 731 is defined between the soundproof inner tube 730 and the soundproof outer tube 740 to surround the sound transmission channel 732. The porous sound-absorbing material 750 is filled in the enclosed space 731 to surround the soundproof inner tube 730 and the sound transmission channel 732. In other words, the sound guide tube 720 is designed with a three-layer coating which are the soundproof inner tube 730, the porous sound-absorbing material 750, and the soundproof outer tube 740 in an order from inside to outside of the sound conduction set 700, so that the noise factor of the sound wave can be optimally blocked.
For example, the voiceprint generation unit 600 includes a micro-electromechanical (MEMS) microphone unit containing a sound chamber 610, two microelectromechanical chips 620, a fixed electrode plate 630 and a vibrating electrode diaphragm 640 therein. The fixed electrode plate 630 is connected to the microelectromechanical chips 620. The vibrating electrode diaphragm 640 is connected to the microelectromechanical chips 620, attached on one side of the fixed electrode plate 630, and faced towards the sound conduction set 700. Thus, when the sound wave passes through the sound conduction set 700 to reach the vibrating electrode diaphragm 640 in the sound chamber 610, the vibrating electrode diaphragm 640 vibrates due to sound pressure, thereby generating a second voiceprint pattern through the electrical signal. Since the micro-electromechanical (MEMS) microphone unit is a well-known technique, it will be no longer repeatedly described again. However, in other embodiments, the voiceprint generation unit may also be other voiceprint analysis machines capable of converting a sound wave into a voiceprint pattern.
Furthermore, before step 902 of the embodiment is performed, the method for monitoring crack noise further includes steps as follows. A detection is performed as to determine whether the semiconductor element 400 is pressed on the testing stage 200 of the testing apparatus. Next, when it is detected that the semiconductor element 400 is being pressed to the testing stage in an instant, in response to that, the sound wave sent from the semiconductor element 400 through the testing apparatus 10 is started to be received immediately, otherwise, any sound wave is not received.
Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the present disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims and their equivalents.
Number | Date | Country | Kind |
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110109190 | Mar 2021 | TW | national |