A thermosetting composition comprising (A) an organopolysiloxane and (B) a curing catalyst, characterized in that
Description
BRIEF DESCRIPTION OF THE DRAWING
FIG. 1 is a differential scanning calorimetry chart of the composition prepared in Example 1 and that of a composition comprising all the components used in Example 1 but chloroplatinic acid catalyst.
Claims
1. A thermosetting composition comprising (A) an organopolysiloxane and (B) a curing catalyst, characterized in that
the organopolysiloxane (A) has at least two alkenyl groups per molecule and a phenyl group in an amount of from 10 to 99% of whole substituents bonded to silicon atoms of the organopolysiloxane, and softens or melts at a temperature of from 30° C. to a temperature lower than an onset temperature of heat curing of the composition.
2. The composition according to claim 1, wherein the curing catalyst (B) is an organic peroxide having a half life of 10 hours at a temperature of 90° C. or higher and the onset temperature of the heat curing of the composition is 150° C. or higher.
3. The composition according to claim 1, wherein a cured product of the composition has a glass transition temperature of 120° C. or lower.
4. The composition according to claim 1, wherein the composition further comprises (C) an organohydrogensiloxane having at least two SiH bonds per molecule and (D) an addition reaction catalyst.
5. The composition according to claim 4, wherein the organohydrogensiloxane (C) is contained in such an amount that a molar ratio of its SiH bonds to the alkenyl groups of the organopolysiloxane (A) is in the range of from 0.01 to 0.7 mole/mole.
6. The composition according to claim 1, wherein the composition further comprises (E) an adhesive aid selected from the group consisting of organic compounds, organic silicon compounds and organic titanium compounds all having at least two groups selected from the group consisting of alkenyl, epoxy, alkoxysilyl, acryl, methacryl, ester, carboxylic acid anhydride, isocyanate, amino and amide groups.
7. The composition according to claim 1, wherein the composition further comprises an inorganic filler.
8. A film having a layer comprising the composition according to any one of claims 1 to 7 on at least one side.
9. A semiconductor device comprising a cured product of the composition according to any one of claims 1 to 7.