Claims
- 1. A phase shift mask comprising;
- a substrate which is transmissive at a given wavelength; and
- a deposited phase shift layer comprising silicon, nitrogen and a species which is absorbant at said wavelength.
- 2. The phase shift mask of claim 1 wherein said species is carbon.
- 3. The phase shift mask of claim 1 wherein said species includes a metal ion.
- 4. A phase shift mask comprising;
- a substrate which is transmissive at a given wavelength; and
- a deposited phase shift layer comprising silicon, oxygen and a species which is absorbant at said wavelength.
- 5. The phase shift mask of claim 4 wherein said species includes a metal ion.
- 6. The phase shift mask of claim 4 wherein said species includes MoO.sub.3.
- 7. A lithographic mask for use with energy of a given wavelength, said mask comprising:
- a substrate that is transmissive for energy at said wavelength;
- a layer on said substrate that provides both a phase shift and an attenuation of energy of said wavelength, said layer comprising:
- a matrix which is essentially transparent to energy of said wavelength;
- a controlled amount of a species which absorbs energy at said wavelength distributed in said matrix.
- 8. The mask of claim 7 wherein said matrix contains silicon.
- 9. The mask of claim 7 wherein said species includes a metal ion.
- 10. The mask of claim 7 wherein said matrix includes silicon dioxide and said absorbing species is MoO.sub.3.
Parent Case Info
This is a continuation of parent application Ser. No. 08/200,117, filed Feb. 22, 1994, now abandoned.
US Referenced Citations (19)
Foreign Referenced Citations (2)
Number |
Date |
Country |
4339481 |
Jun 1995 |
DEX |
9411786 |
Aug 1994 |
WOX |
Continuations (1)
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Number |
Date |
Country |
Parent |
200117 |
Feb 1994 |
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