Three dimensional six surface conformal die coating

Abstract

Semiconductor die are typically manufactured as a large group of integrated circuit die imaged through photolithographic means on a semiconductor wafer or slice made of silicon. After manufacture, the silicon wafer is thinned, usually by mechanical means, and the wafer is cut, usually with a diamond saw, to singulate the individual die. The resulting individual integrated circuit has six exposed surfaces. The top surface of the die includes the circuitry images and any passivation layers that have been added to the top layer during wafer fabrication. The present invention describes a method for protecting and insulating all six surfaces of the die to reduce breakage, provide electrical insulation for these layers, and to provide physical surfaces that can be used for bonding one semiconductor die to another for the purpose of stacking die in an interconnected module or component.

Description

BACKGROUND AND SUMMARY OF THE PRESENT INVENTION

Semiconductor die are typically manufactured as a large group of integrated circuit die imaged through photolithographic means on a semiconductor wafer or slice made of silicon. After manufacture, the silicon wafer is thinned, usually by mechanical means, and the wafer is cut, usually with a diamond saw, to singulate the individual die. The resulting individual integrated circuit has six exposed surfaces. The top surface of the die includes the circuitry images and any passivation layers that have been added to the top layer during wafer fabrication. The present invention describes a method for protecting and insulating all six surfaces of the die to reduce breakage, provide electrical insulation for these layers, and to provide physical surfaces that can be used for bonding one semiconductor die to another for the purpose of stacking die in an interconnected module or component.

The present invention provides the advantages of reducing chipping, cracking, and physical damage to die during die handling and processing operations such as burn-in, test, and assembly. The present invention is useable for any semiconductor chips including, but not limited to memory chips.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagram illustrating a single semiconductor die with original connection pads running down the center of the die, and rerouting lines connecting the original connection pads at the center of the die with new connection pads located at the edges of the die.

FIG. 2 is a diagram illustrating a cross sectional side view of a semiconductor die showing the die coated with a conformal, insulating coating.

FIG. 3 is a diagram illustrating a cross section view of the semiconductor die showing the conformal coating and openings in the conformal coating above the original connection pads which run down the center of the semiconductor die.

FIG. 4 shows a semiconductor die with connection pads around the periphery of the die.

FIG. 5 shows a semiconductor die with peripheral pads, either original or relocated, coated with a conformal insulative coating, and with openings in the insulative coating located above the peripherally located electrical connection pads.

DETAILED DESCRIPTION OF THE INVENTION

Referring to FIG. 1, semiconductor die 10, with original connection pads 60 have had an insulating layer applied to the top surface, 30 of all of the die while the die are still connected together in a wafer form. A metal layer is deposited and defined using photolithography, to reroute the electrical signals from the original connection pads 60 to new locations at the edge of the die. An additional layer of insulating material is optionally applied above the metal layer, and openings are made in the top layer of insulating material at the relocated pad locations at the edge of the semiconductor die, and optionally at the original pad locations down the center of the top surface of the die.

Referring to FIG. 2, the semiconductor die, 10, has been thinned by grinding or lapping, and has been singulated from the semiconductor wafer, and said semiconductor die has been coated with a conformal insulating coating 20.

Referring to FIG. 3, openings have been made in the coating, 20, above original connection pads, 60, of semiconductor die, 10. The electrical connection pads in this illustration run down the center of the top surface of the die.

Referring to FIG. 4, this shows a semiconductor die 70 with connection pads 80 located around the periphery of the die top surface.

FIG. 5 shows openings in the conformal coating material at locations 90 on a semiconductor die whose electrical connections are located at the edges of the surface of the die. The electrical connection points may be located anywhere on any of the surfaces of the die, but are typically located on the top surface of the die and are typically either at the peripheral edges of the top surface or down the center of the top surface.

Claims

1. Individual freestanding silicon die, including six surfaces, which have been singulated from a semiconductor wafer, the die being coated on all six surfaces with a parylene film which has been applied to all surfaces; the parylene film providing electrical insulation and serving as a mechanical protection for the surfaces to prevent chipping and cracking of the silicon die.

2. The die as in claim 1 including openings in the parylene film where the parylene film has been removed to expose a specific layer or feature underneath the insulating material.

3. The die as in claim 2 wherein the opening is above electrical connection pads above circuitry on a top surface of the die.

4. The die as in claim 2 wherein the opening is above optical emitters or sensors on a top surface of the die.

5. The die as in claim 2 wherein the openings are formed through the use of a laser to remove, or ablate, the polymer material from above a specific layer or feature.