Claims
- 1. An optical element comprising:
a refractive optical element in a first surface of a substrate; a diffractive optical element in the first surface of the substrate, the diffractive optical element in a separate portion of the substrate than the refractive optical element, the refractive and the diffractive optical elements having been transferred into the first surface of the substrate.
- 2. A method of making an optical element on a first surface of a substrate already having features with a vertical dimension thereon, the method comprising:
creating a pattern for the optical element on the first surface of the substrate, in a separate portion of the substrate from the features; providing a protective layer over the features; transferring the pattern into the substrate using an analog etch to form the optical element, the protective layer protecting the features during said transferring; and removing the protective layer.
- 3. The method of claim 2, wherein said providing the protective layer includes providing a layer more resistant to said analog etch than said pattern.
- 4. The method of claim 2, wherein said providing the protective layer includes providing a layer of a same material as the pattern that is thicker than the pattern.
- 5. The method of claim 2, wherein said providing the protective layer includes providing a layer less resistant to said analog etch than said pattern, the layer being thicker than the pattern.
- 6. The method of claim 2, wherein said providing the protective layer includes providing a layer having a same material as the substrate.
- 7. The method of claim 2, wherein said creating and providing are simultaneous.
- 8. The method of claim 2, wherein said creating occurs after said providing.
- 9. The method of claim 2, wherein said removing occurs during said transferring.
- 10. The method of claim 2, further comprising stabilizing the pattern.
- 11. The method of claim 2, wherein the features are another optical element.
- 12. The method of claim 11, wherein the feature is a diffractive element and the optical element is a refractive element.
- 13. The method of claim 12, wherein said creating the pattern for the refractive optical element includes reflowing photoresist
- 14. The method of claim 13, wherein the providing the protective layer includes providing a layer which maintains substantially all of its vertical dimension during said reflowing.
- 15. The method of claim 2, wherein said providing a protective layer includes providing a lift off layer over a region in which the optical element is to be formed, providing the protective layer over the first surface, and lifting off the protective layer in the region.
- 16. The method of claim 2, wherein the features are alignment features.
- 17. The method of claim 2, wherein the features are electro-optical elements.
- 18. The method of claim 2, wherein the features are metal portions.
- 19. The method of claim 2, wherein the features are one of dichroic portions and dielectric portions.
- 20. The method of claim 2, wherein said providing the protective layer includes die bonding protective portions over the features.
- 21. A method of making different optical element in a first surface of a substrate, the method comprising:
forming a first optical element on the first surface of the substrate; creating a pattern for a second optical element on the first surface of the substrate, in a separate portion of the substrate from the first optical element; providing a protective layer over the first optical element, said providing being separate from said creating; transferring the pattern into the substrate to form the second optical element, the protective layer protecting the first optical element during said transferring; and removing the protective layer.
- 22. The method of claim 21, wherein said providing the protective layer includes providing a layer more resistant to said etch than said pattern.
- 23. The method of claim 21, wherein said providing the protective layer includes providing a layer of a same material as the pattern that is thicker than the pattern.
- 24. The method of claim 21, wherein said providing the protective layer includes providing a layer less resistant to said etch than said pattern, the layer being thicker than the pattern.
- 25. The method of claim 21, wherein said providing the protective layer includes providing a layer having a same material as the substrate.
- 26. The method of claim 21, wherein said creating occurs after said providing.
- 27. The method of claim 21, wherein said removing occurs during said transferring.
- 28. The method of claim 21, further comprising stabilizing the pattern.
- 29. The method of claim 21, wherein the first optical element is a refractive optical element and the second optical element is a diffractive optical element.
- 30. The method of claim 29, wherein creating the pattern for the diffractive optical element includes coating the first surface with a photoresist.
- 31. The method of claim 30, wherein the providing the protective layer is achieved with said coating.
- 32. The method of claim 30, wherein said coating includes one of spray coating and solvent assisted coating.
- 33. The method of claim 21, wherein said providing the protective layer includes die bonding protective portions over the features.
- 34. The method of claim 21, wherein the first optical element is a diffractive optical element and the second optical element is a refractive optical element.
- 35. The method of claim 34, wherein said creating the pattern for the refractive optical element includes reflowing photoresist
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present application claims priority under 35 U.S.C. §119(e) to U.S. Provisional Application Serial No. 60/330,504 entitled “Transfer of Optical Element Patterns on a Same Side of a Substrate Already Having a Feature Thereon” filed Oct. 23, 2001, the entire contents of which are hereby incorporated by reference for all purposes.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60330504 |
Oct 2001 |
US |