Claims
- 1. A tray for a semiconductors comprising:
a tray portion having a plurality of chip recesses formed therein; a rail portion extending substantially around the tray portion; and an intermediate portion interconnecting the tray portion and the rail portion, wherein the intermediate portion is oriented at an angle of more than 115° with respect to the rail portion.
- 2. The tray of claim 1, wherein the intermediate portion is oriented at an angle of between 115° and 150° with respect to the rail portion.
- 3. The tray of claim 1, wherein the rail portion has a plurality of reduced thickness regions, wherein the reduced thickness regions have a thickness that is less than 80 percent of a thickness of the rail portion.
- 4. The tray of claim 2, wherein the reduced thickness regions comprise more than about 33 percent of a length of the rail portion.
- 5. The tray of claim 1, wherein the tray has a length and a width that are both greater than about 3.5 inches.
- 6. The tray of claim 4, wherein an upper surface of the tray portion has a deviation in height of less than 0.004 inches.
- 7. The tray of claim 1, and further comprising at least one nub extending from a lower surface of the tray portion, wherein the at least one nub enables the tray to be used with a jig that is designed for use with a differently sized tray.
- 8. The tray of claim 1, wherein an upper surface of the tray portion is higher than an upper surface of the intermediate portion and wherein the upper surface of the intermediate portion is higher than an upper surface of the rail portion.
- 9. A system for storing semiconductors comprising:
a first chip tray comprising a first tray portion, a first rail portion and a first intermediate portion, wherein the first rail portion extends substantially around the first tray portion, wherein the first intermediate portion interconnects the first tray portion and the first rail portion, wherein the first intermediate portion is oriented at an angle of more than 115° with respect to the rail portion, and wherein a lower surface of the first tray portion, the first intermediate portion and the first rail portion define a recess; and a second chip tray comprising a second tray portion, a second rail portion and a second intermediate portion, wherein the second rail portion extends substantially around the second tray portion, wherein the second intermediate portion interconnects the second tray portion and the second rail portion, and wherein the second intermediate portion is oriented at an angle of more than 115° with respect to the rail portion, wherein the second tray portion seats in the recess to retain semiconductors in desired positions on the second tray portion so that an upper surface of the second tray portion is proximate a lower surface of the first tray portion.
- 10. The system of claim 9, wherein the first and second rail portions each have a plurality of reduced thickness regions, wherein the reduced thickness regions have a thickness that is less than 80 percent of a thickness of the first and second rail portions.
- 11. The system of claim 9, wherein the first and second tray each have a length and a width that are both greater than about 3.5 inches.
- 12. The system of claim 11, wherein upper surfaces of the first and second tray portions each have a deviation in height of less than 0.004 inches.
- 13. The system of claim 9, and further comprising a spring box having a recess formed therein that is adapted to receive the first and second chip trays and maintain the first and second chip trays at a substantially stationary position therein.
- 14. A method of forming a tray for a semiconductor chip, the method comprising integrally molding a tray portion, a rail portion and an intermediate portion, wherein the rail portion extends substantially around the tray portion, and wherein the intermediate portion is oriented at an angle of at least 115° with respect to the rail portion.
- 15. The method of claim 14, wherein the intermediate portion is oriented at an angle of between 115° and 150° with respect to the rail portion.
- 16. The method of claim 14, and further comprising forming a plurality of reduced thickness regions on the rail portion, wherein the reduced thickness regions have a thickness that is less than 80 percent of a thickness of the rail portion.
- 17. The method of claim 16, wherein the reduced thickness regions comprise more than about 33 percent of a length of the rail portion.
- 18. The method of claim 14, wherein the tray has a length and a width that are both greater than about 3.5 inches, and wherein an upper surface of the tray portion has a deviation in height of less than 0.004 inches.
- 19. A method of preparing a tray for a semiconductor chip, the method comprising:
integrally molding a tray portion, a rail portion and an intermediate portion, wherein the tray portion has a substantially square configuration, with a plurality of sides, wherein the rail portion extends substantially around the tray portion and wherein the intermediate portion is oriented at an angle of at least 115° with respect to the rail portion; and enhancing uniformity of the molding process by forming at least one reduced thickness region along each side of the rail portion, wherein the reduced thickness region has a thickness that is less than 80 percent of the thickness of the rail portion.
- 20. The method of claim 19, wherein the intermediate portion is oriented at an angle of between 115° and 150° with respect to the rail portion.
- 21. The method of claim 19, and further comprising forming a plurality of reduced thickness regions on the rail portion, wherein the reduced thickness regions have a thickness that is less than 80 percent of a thickness of the rail portion.
- 22. The method of claim 21, wherein the reduced thickness regions comprise more than about 33 percent of a length of the rail portion.
- 23. The method of claim 19, wherein the tray has a length and a width that are both greater than about 3.5 inches, and wherein an upper surface of the tray portion has a deviation in height of less than 0.004 inches.
- 24. The method of claim 19, and further comprising forming at least one nub extending from a lower surface of the tray portion wherein the at least one nub enables the tray to be used with a jig that is designed for use with a differently sized tray.
- 25. A method of preparing a tray for a semiconductor chip having a length and a width of at least 3.5 inches, the method comprising integrally molding a tray portion, a rail portion and an intermediate portion, wherein the rail portion extends substantially around the tray portion, wherein the intermediate portion is oriented at an angle of at least 115° with respect to the rail portion, and wherein an upper surface of the tray portion has a deviation in height of less than 0.004 inches.
REFERENCE TO RELATED APPLICATION
[0001] This application claims benefit to the filing date of U.S. Provisional Application Serial No. 60/305,785, filed Jul. 15, 2001. This application is hereby incorporated by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60305785 |
Jul 2001 |
US |