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5879459 | Gadgil et al. | Mar 1999 | A |
5968279 | MacLeish et al. | Oct 1999 | A |
5998283 | Takamizawa et al. | Dec 1999 | A |
Entry |
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Dry Wafer Cleaning by Use of a Reducing Plasma, J. E. Drew, IBM Technical Disclosure Bulletin, vol. 34, No. 4A, Sep. 1991, p. 226. |