Claims
- 1. A wafer load/unload apparatus used for an E-Gun evaporating process, the apparatus comprising:a base having an even upper surface; a central pillar having a recessed trench in a top surface thereof, the central pillar being connected to the even upper surface of the base and the central pillar being adapted to penetrate through a clamp ring; and at least one peripheral pillar also connected to the even upper surface of the base the, wherein a distance between the peripheral pillar and the central pillar is greater than a width of the clamp ring.
- 2. The apparatus of claim 1, wherein the central pillar is cylindrical.
- 3. The apparatus of claim 2, wherein an inner diameter of the clamp ring is greater than a diameter of said central pillar.
- 4. The apparatus of claim 1, wherein a size of the recessed trench is sufficient to allow a vacuum chucking pen to stretch into the recessed trench.
- 5. The apparatus of claim 1, wherein the peripheral pillar comprises three separate cylindrical pillars.
- 6. The apparatus of claim 5, wherein the three cylindrical peripheral pillars are higher than the central pillar.
- 7. The apparatus of claim 1, wherein the peripheral pillar is used to prevent a wafer placed on the top surface of the central pillar from falling down.
- 8. The apparatus of claim 7, wherein the peripheral pillar is used to align a mark edge of the wafer for marking a position of the wafer.
- 9. A wafer load/unload apparatus using for an E-Gun evaporating process, the apparatus comprising:a base having an upper surface; and a central pillar having a recessed trench in a top surface thereof, wherein the central pillar is connected to the upper surface of the base and the central pillar is adapted to penetrate through a clamp ring.
- 10. The apparatus of claim 9, further comprising a plurality of peripheral pillars connected to the upper surface of the base and around the central pillar.
- 11. The apparatus of claim 10, wherein the plurality of peripheral cylinders comprises at least three cylinders.
- 12. The apparatus of claim 10, wherein each peripheral pillar is higher than the central pillar.
- 13. The apparatus of claim 10, wherein the plurality of peripheral pillars is used to align a mark edge of the wafer to mark a position of the wafer.
- 14. The apparatus of claim 9, wherein the upper surface of the base is an even surface.
- 15. The apparatus of claim 9, wherein a distance between each peripheral pillar and the central pillar is greater than a width of the clamp ring.
- 16. The apparatus of claim 9, wherein a size of the recessed trench is sufficient to allow a vacuum chucking pen to stretch into the recessed trench.
- 17. The apparatus of claim 9, wherein an inner diameter of said clamp ring is greater than a width, length or diameter of a cross section of the central pillar.
Priority Claims (1)
Number |
Date |
Country |
Kind |
88113833 A |
Aug 1999 |
TW |
|
RELATED APPLICATION
This application claims priority from Taiwan Application No. 88113833, filed Aug. 12, 1999, which is incorporated herein by reference.