The present invention relates to a dual wafer stage switching system for a lithography machine, which can be applied into the lithography machine for semiconductor and belongs to the field of semiconductor manufacturing device.
In the magnetic suspending dual wafer stage switching system for a lithography machine, since the two wafer stages have no handspike or other limit structure, controlling the positions and postures of the wafer stages on the balancing block is completely depending on the position measurement by the sensors. Besides, when the two stages are exchanging or the controlling system fails, the two stages may collide, causing great damage and cost to themselves due to their complicated structures. Therefore, an anti-collision structure is crucial for wafer stages. Further, when the two stages collide, they may bounce off from each other, in which case, the measuring system cannot operate before performing direction finding and zero-setting, which has a great negative influence on the efficiency of production. Therefore, a stable buffer structure is necessary for the anti-collision system so as to promptly stop the moving stages when collision occurs.
In prior art, the anti-collision structure is a structure in which cantilever bars amounted along the two sides of the wafer stage with sensors disposed on the cantilever bars. When the two stages are getting too close, the sensors send an alarming signal in response to which the moving stages stop promptly. However, if the controlling system fails, the cantilever bar, and then the stages, are collided and damaged, without any secondary protection. As to the design, if the wafer stages are added at their peripheral with the anti-collision bars, proximity sensors and buffers etc., the stages may have an overly large size, and besides, for the device which has a higher requirement for the integration level, the complicatedness of the structure and the difficulty of design will be increased when adding a plurality of elements, parts and sensors thereto.
The present invention provides a wafer stage having function of anti-collision, using gasbags and buffer elements as anti-collision structures, which has the following advantages: (i) when the two wafer stages are being exchanged or the controlling system fails, the parts of the wafer stages can be protected and the measuring system can operate normally, thus improve the efficiency of production; (ii) the stage has a simple structure which facilitates maintenance work.
A wafer stage having function of anti-collision is provided, comprising a body and a cable stage fixed on one side of the body, wherein: the wafer stage further includes three gasbags, four damping buffer elements and a gas source, the three gasbags are arranged in series and are fixed on the other three sides of the body respectively by a gasbag support; adjacent two gasbags have a damping buffer element therebetween to be in communication with a gas conduit which is fixed on the cable stage and in communication with the gas source.
Further, the damping buffer element has at least one long slim damping hole thereon.
Further, the gasbag is made of rubber.
In comparison with the prior art, the present invention has the following advantages: since the gasbags made of rubber have good elasticity, when collision occurs, the gas is squeezed, into adjacent two gasbags via the damping buffer element (i.e., the damping hole), and then into the gas circulation system. Therefore, the damping hole can locally change the flow area of the fluid to generate a pressure loss, achieving purposes such as throttling, pressure regulating, buffering, and anti-vibration. In the present invention, the damping hole has a simple structure of long slim hole. When the damping buffer element is in a state of stable laminar flow, the pressure difference between two ends of the damping buffer element is in a good proportional relation with the flow rate through the damping hole, which can effectively increase the damping force and buffer the bouncing force on collision in a maximized way, thus stopping the moving wafer stages promptly when collision occurs. Through the settings for the gas pressure of the gasbags and the parameters of the damping holes, the positioning precision for the two wafer stages can satisfy the requirements of the controlling system, thus the efficiency of production is improved since no zero setting is needed when collision occurs.
In the Figures, 1—body of the wafer stage; 2—cable stage; 3—gasbag; 4—damping buffer element; 5—gasbag support; 6—gas source; 7—base; 8a—the first wafer stage; 8b—the second wafer stage.
The speed of depressurization of the long slim damping hole can be optimized through calculation of the value of the impact force, the parameters relating to the material of the gasbags, and the instantaneous speeds on collision etc., in such a manner that the two moving wafer stages can be stopped promptly on colliding due to the elasticity of the gasbags and the wafer stages will not bounce back due to a certain degree of rigidity of the gasbags. Through the above process, a double anti-collision protection can be achieved for the two wafer stages.
Number | Date | Country | Kind |
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201210533774.1 | Dec 2012 | CN | national |
Filing Document | Filing Date | Country | Kind |
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PCT/CN2013/088729 | 12/6/2013 | WO | 00 |