Claims
- 1. An anti-reflective coating composition comprising:
a solvent system; and a polymer dispersed or dissolved in said solvent system, said polymer including
recurring units having the formula 9wherein: M is a metal; each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys; and X is selected from the group consisting of compounds having the structure of I or II: 10where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls.
- 2. The composition of claim 1, said polymer further comprising recurring units having the formula
- 3. The composition of claim 1, wherein M in each recurring unit is a metal individually selected from the group consisting of Ti, Zr, Si, and Al.
- 4. The composition of claim 1, wherein said composition further comprises a second polymer.
- 5. The composition of claim 4, wherein said second polymer is selected from the group consisting of epoxy novolac resins, acrylates, polymerized aminoplasts, glycourils, vinyl ethers, and mixtures thereof.
- 6. The composition of claim 4, wherein said second polymer has a weight average molecular weight of from about 1,000 to about 25,000.
- 7. The composition of claim 1, wherein one R is —CH3 and the other R is —OC2H5.
- 8. The composition of claim 1, wherein each of X and Y is individually selected from the group consisting of carbonyls, cyanics, nitrites, sulfones, and —CO2R4, where R4 is an alkyl.
- 9. An anti-reflective coating composition comprising:
a solvent system; and a polymer dispersed or dissolved in said solvent system, said polymer being formed by reacting a polymeric metal alkoxide, an organic compound, and a chromophore, said polymeric metal alkoxide including recurring units having the formula 12wherein M is a metal, and each L is individually selected from the group consisting of diketo and alkoxide ligands; said organic compound comprising a functional group for coordinating with M of said polymeric metal alkoxide; and said chromophore being selected from the group consisting of compounds having the structure of I or II: 13where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls.
- 10. The composition of claim 9, wherein M in each recurring unit is a metal individually selected from the group consisting of Ti, Zr, Si, and Al.
- 11. The composition of claim 9, wherein said composition further comprises a second polymer.
- 12. The composition of claim 11, wherein said second polymer is selected from the group consisting of epoxy novolac resins, acrylates, polymerized aminoplasts, glycourals, vinyl ethers, and mixtures thereof.
- 13. The composition of claim 12, wherein said second polymer has a weight average molecular weight of from about 1,000 to about 25,000.
- 14. The composition of claim 9, wherein each L individually has the formula
- 15. The composition of claim 14, wherein at least one L is a moiety of ethyl acetoacetate.
- 16. The composition of claim 14, wherein one R is —CH3 and the other R is —OC2H5.
- 17. The composition of claim 9, wherein said functional group is selected from the group consisting of alcohol, phenol, and carbonyl groups.
- 18. The composition of claim 17, wherein said organic compound is selected from the group consisting of trimethylol ethoxylate, 4-hydroxybenzaldehyde, and 2-cyano-3-(4-hydroxyphenyl)-acrylic acid ethyl ester.
- 19. A method of using a composition in photolithographic processes, said method comprising the step of applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising:
a solvent system; and a polymer dispersed or dissolved in said solvent system, said polymer including
recurring units having the formula 15wherein: M is a metal; each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys; and X is selected from the group consisting of compounds having the structure of I or II: 16where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls.
- 20. The method of claim 19, wherein said applying step comprises spin-coating said composition onto said substrate surface.
- 21. The method of claim 19, wherein said substrate has a hole formed therein, said hole being defined by a bottom wall and sidewalls, and said applying step comprises applying said composition to at least a portion of said bottom wall and sidewalls.
- 22. The method of claim 19, further including the step of baking said layer, after said applying step, at a temperature of from about 100-250° C. to yield a cured layer.
- 23. The method of claim 22, further including the step of applying a photoresist to said baked layer.
- 24. The method of claim 23, furthering including the steps of:
exposing at least a portion of said photoresist to activating radiation; and developing said exposed photoresist.
- 25. The method of claim 24, wherein said developing step results in the removal of said composition from areas adjacent said exposed photoresist.
- 26. A method of using a composition in photolithographic processes, said method comprising the step of applying a quantity of a composition to a substrate to form a layer thereon, said composition comprising:
a solvent system; and a polymer dispersed or dissolved in said solvent system, said polymer being formed by reacting a polymeric metal alkoxide, an organic compound, and a chromophore,
said polymeric metal alkoxide including recurring units having the formula 17wherein M is a metal, and each L is individually selected from the group consisting of diketo and alkoxide ligands; said organic compound comprising a functional group for coordinating with M of said polymeric metal alkoxide; and said chromophore being selected from the group consisting of compounds having the structure of I or II: 18where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls.
- 27. The method of claim 26, wherein said applying step comprises spin-coating said composition onto said substrate surface.
- 28. The method of claim 26, wherein said substrate has a hole formed therein, said hole being defined by a bottom wall and sidewalls, and said applying step comprises applying said composition to at least a portion of said bottom wall and sidewalls.
- 29. The method of claim 26, further including the step of baking said layer, after said applying step, at a temperature of from about 100-250° C. to yield a cured layer.
- 30. The method of claim 29, further including the step of applying a photoresist to said baked layer.
- 31. The method of claim 30, furthering including the steps of:
exposing at least a portion of said photoresist to activating radiation; and developing said exposed photoresist.
- 32. The method of claim 31, wherein said developing step results in the removal of said composition from areas adjacent said exposed photoresist.
RELATED APPLICATIONS
[0001] This application claims the priority benefit of a provisional application entitled WET-DEVELOPER ANTI-REFLECTIVE COMPOSITIONS, Ser. No.60/391,661, filed Jun. 25, 2002, incorporated by reference herein.
Provisional Applications (1)
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Number |
Date |
Country |
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60391661 |
Jun 2002 |
US |