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4028547 | Eisenberger | Jun 1974 | |
4803713 | fujii | Feb 1989 | |
4881257 | Nakagawa | Nov 1989 | |
5124561 | Faure et al. | Jun 1992 | |
5224139 | Korenaga et al. | Jun 1993 | |
5291536 | Itoh et al. | Mar 1994 |
Number | Date | Country |
---|---|---|
4130621 | May 1992 | JPX |
5326378 | Dec 1993 | JPX |
Entry |
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Seese et al., "Accelerated Radiation Damage Testing of X-Ray Mask Membrane Materials", Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, David O. Patterson, editor, Proc. Society of Photo-Optical Instrumentation Engineers, vol. 1924, pp. 457-466 (1993). |