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Heat-resistant IR alloy
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Patent number 11,773,473
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Issue date Oct 3, 2023
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Ishifuku Metal Industry Co., Ltd.
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Shunsuke Yokota
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Iridium alloy
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Patent number 11,685,970
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Issue date Jun 27, 2023
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Denso Corporation
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Satoshi Hara
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Electrocatalyst
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Patent number 11,682,773
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Issue date Jun 20, 2023
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Shinshu University
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Wataru Sugimoto
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H01 - BASIC ELECTRIC ELEMENTS
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Heat-resistant Ir alloy
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Patent number 11,505,848
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Issue date Nov 22, 2022
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Ishifuku Metal Industry Co., Ltd.
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Shunsuke Yokota
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Heat-resistant Ir alloy wire
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Patent number 11,486,024
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Issue date Nov 1, 2022
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Ishifuku Metal Industry Co., Ltd.
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Shunsuke Yokota
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B22 - CASTING POWDER METALLURGY
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Heat-resistant Ir alloy
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Patent number 11,131,008
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Issue date Sep 28, 2021
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Ishifuku Metal Industry Co., Ltd.
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Shunsuke Yokota
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Core-shell structure type nanosheet
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Patent number 10,985,382
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Issue date Apr 20, 2021
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Shinshu University
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Wataru Sugimoto
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B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Sputtering target material
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Patent number 9,127,346
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Issue date Sep 8, 2015
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Sputtering target material
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Patent number 8,858,877
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Issue date Oct 14, 2014
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Sputtering target material
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Patent number 8,252,127
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Issue date Aug 28, 2012
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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FePtP-alloy magnetic thin film
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Patent number 8,158,276
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Issue date Apr 17, 2012
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Conductive material
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Patent number 8,133,432
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Issue date Mar 13, 2012
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Sputtering target material
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Patent number 7,959,746
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Issue date Jun 14, 2011
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Sputtering target material
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Patent number 7,465,424
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Issue date Dec 16, 2008
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Ishifuku Metal Industry Co., Ltd.
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Koichi Hasegawa
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C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
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Compound electrode for electrolysis
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Patent number 6,051,118
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Issue date Apr 18, 2000
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Ishifuku Metal Industry Co., Ltd.
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Tomoyoshi Asaki
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR