OCG Microelectronic Materials, Inc.

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Cheshire, CT, US

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Patents Grantslast 30 patents

Information Patent Grant
Wet-chemical developable, etch-stable photoresist for UV radiation...
- Patent number 5,776,657
- Issue date Jul 7, 1998
- OCG Microelectronic Materials, Inc.
- Ulrich Schaedeli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the preparation of partially protected phenolic resins
- Patent number 5,663,038
- Issue date Sep 2, 1997
- OCG Microelectronic Materials, Inc.
- Carl-Lorenz Mertesdorf
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist stripping composition
- Patent number 5,648,324
- Issue date Jul 15, 1997
- OCG Microelectronic Materials, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected O-quinonediazide sulfonic acid esters of phenolic compound...
- Patent number 5,602,260
- Issue date Feb 11, 1997
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified radiation-sensitive composition used in a proc...
- Patent number 5,565,304
- Issue date Oct 15, 1996
- OCG Microelectronic Materials, Inc.
- Kenji Honda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chelating reagent containing photoresist stripper composition
- Patent number 5,561,105
- Issue date Oct 1, 1996
- OCG Microelectronic Materials, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions containing copolymers having acid-labile g...
- Patent number 5,558,978
- Issue date Sep 24, 1996
- OCG Microelectronic Materials, Inc.
- Ulrich Sch adeli
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Tetra (hydroxphenyl) alkanes
- Patent number 5,554,797
- Issue date Sep 10, 1996
- OCG Microelectronic Materials, Inc.
- Reinhard Schulz
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified radiation-sensitive composition
- Patent number 5,550,004
- Issue date Aug 27, 1996
- OCG Microelectronic Materials, Inc.
- Kenji Honda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
O-quinonediazide sulfonic acid esters of phenolic compounds and the...
- Patent number 5,547,814
- Issue date Aug 20, 1996
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Non-corrosive photoresist stripper composition
- Patent number 5,545,353
- Issue date Aug 13, 1996
- OCG Microelectronic Materials, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected o-quinonediazide sulfonic acid esters of phenolic compound...
- Patent number 5,541,033
- Issue date Jul 30, 1996
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sesamol/aldehyde condensation products as sensitivity enhancers for...
- Patent number 5,275,911
- Issue date Jan 4, 1994
- OCG Microelectronic Materials, Inc.
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation sensitive mixtures and articles containi...
- Patent number 5,275,909
- Issue date Jan 4, 1994
- OCG Microelectronic Materials, Inc.
- Tripunithura V. Jayaraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of developing a positive pattern in an O-quinone diazide ph...
- Patent number 5,256,521
- Issue date Oct 26, 1993
- OCG Microelectronic Materials, Inc.
- Tripunithura V. Jayaraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected methylol-substituted trihydroxybenzophenones and their use...
- Patent number 5,254,440
- Issue date Oct 19, 1993
- OCG Microelectronic Materials, Inc.
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phenolic novolak resin compositions containing 5-indanol and their...
- Patent number 5,250,653
- Issue date Oct 5, 1993
- OCG Microelectronic Materials, Inc.
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process of developing a negative-working radiation-sensitive photor...
- Patent number 5,250,392
- Issue date Oct 5, 1993
- OCG Microelectronic Materials, Inc.
- Stephen F. Marcotte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photogenerated polycarbodiimides from poly(tetrazole-5-thiones) and...
- Patent number 5,240,811
- Issue date Aug 31, 1993
- OCG Microelectronic Materials, Inc.
- James W. Taylor
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selected methylol-substituted trihydroxybenzophenones and their use...
- Patent number 5,239,122
- Issue date Aug 24, 1993
- OCG Microelectronic Materials, Inc.
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive compositions containing fully substituted novol...
- Patent number 5,237,037
- Issue date Aug 17, 1993
- OCG Microelectronic Materials, Inc.
- Charles E. Ebersole
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of developing an image-wise exposed resist-coated substrate
- Patent number 5,234,795
- Issue date Aug 10, 1993
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polylactide compounds as sensitivity enhancers for radiation sensit...
- Patent number 5,234,789
- Issue date Aug 10, 1993
- OCG Microelectronic Materials, Inc.
- James G. Favier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected block copolymer novolak binder resins
- Patent number 5,235,022
- Issue date Aug 10, 1993
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected block phenolic oligomers and their use in phenolic resin c...
- Patent number 5,232,819
- Issue date Aug 3, 1993
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selected photoactive methylolated cyclohexanol compounds and their...
- Patent number 5,225,318
- Issue date Jul 6, 1993
- OCG Microelectronic Materials, Inc.
- Sobhy Tadros
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected trihydroxybenzophenone compounds and their use in photoact...
- Patent number 5,219,714
- Issue date Jun 15, 1993
- OCG Microelectronic Materials, Inc.
- Medhat A. Toukhy
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selected trihydroxybenzophenone compounds
- Patent number 5,220,073
- Issue date Jun 15, 1993
- OCG Microelectronic Materials, Inc.
- Medhat A. Toukhy
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancer...
- Patent number 5,215,856
- Issue date Jun 1, 1993
- OCG Microelectronic Materials, Inc.
- Tripunithura V. Jayaraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixtures containing cyclized r...
- Patent number 5,206,110
- Issue date Apr 27, 1993
- OCG Microelectronic Materials, Inc.
- Stephen F. Marcotte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

OCG Microelectronic Materials, Inc.

Organization

Patents Grantslast 30 patents

Wet-chemical developable, etch-stable photoresist for UV radiation...

Process for the preparation of partially protected phenolic resins

Photoresist stripping composition

Selected O-quinonediazide sulfonic acid esters of phenolic compound...

Chemically amplified radiation-sensitive composition used in a proc...

Chelating reagent containing photoresist stripper composition

Photoresist compositions containing copolymers having acid-labile g...

Tetra (hydroxphenyl) alkanes

Chemically amplified radiation-sensitive composition

O-quinonediazide sulfonic acid esters of phenolic compounds and the...

Non-corrosive photoresist stripper composition

Selected o-quinonediazide sulfonic acid esters of phenolic compound...

Sesamol/aldehyde condensation products as sensitivity enhancers for...

Positive-working radiation sensitive mixtures and articles containi...

Process of developing a positive pattern in an O-quinone diazide ph...

Selected methylol-substituted trihydroxybenzophenones and their use...

Phenolic novolak resin compositions containing 5-indanol and their...

Process of developing a negative-working radiation-sensitive photor...

Photogenerated polycarbodiimides from poly(tetrazole-5-thiones) and...

Selected methylol-substituted trihydroxybenzophenones and their use...

Radiation-sensitive compositions containing fully substituted novol...

Process of developing an image-wise exposed resist-coated substrate

Polylactide compounds as sensitivity enhancers for radiation sensit...

Selected block copolymer novolak binder resins

Selected block phenolic oligomers and their use in phenolic resin c...

Selected photoactive methylolated cyclohexanol compounds and their...

Selected trihydroxybenzophenone compounds and their use in photoact...

Selected trihydroxybenzophenone compounds

Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancer...

Negative-working radiation-sensitive mixtures containing cyclized r...

Patents Applicationslast 30 patents

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