Claims
- 1. The process of developing an image-wise exposed photoresist-coated substrate comprising:
- (1) coating said substrate with a negative-working, radiation-sensitive composition useful as a photoresist, said composition comprising an admixture in a solvent of:
- (a) at least one cyclized rubber polymer;
- (b) at least one photoactive compound; and
- (c) an effective contrast enhancing amount of an azo dye of the formula: ##STR6## (2) subjecting said coating on said substrate to an image-wise exposure of radiant light energy; and
- (3) subjecting said image-wise exposed coating substrate to a developing solution to remove the nonexposed image-wise area of said coated radiation-sensitive composition with said developing solution and to form a negative image-wise pattern in the coating.
- 2. The process of claim 1 wherein said cyclized rubber polymer is a cyclized polyisoprene resin.
- 3. The process of claim 1 wherein said photoactive compound is bis-2,6-(4-azidobenzylidene) 4-methyl cyclohexanone.
- 4. The process of claim 1 wherein said photoactive compound or compounds are present in the amount of about 1% to about 6% by weight, said cyclized rubber polymer is present in the amount of about 94% to about 99% by weight, and said dye is present in the amount of 0.001% to about 4.0% by weight, all based on the total solids content of said radiation-sensitive composition.
- 5. The process of claim 1 further comprising at least one substance selected from the group consisting of solvents, actinic dyes, anti-halation agents, plasticizers, and speed enhancers.
- 6. The process of claim 1 wherein said dye is present in the amount of from about 0.01% to about 2.0% by weight, based on the total solids content of said radiation-sensitive composition.
Parent Case Info
This application is a division of application Ser. No. 07/650,341 filed Feb. 4, 1991 which issued as U.S. Pat. No. 5,206,110 on Apr. 27, 1993.
US Referenced Citations (8)
Foreign Referenced Citations (2)
Number |
Date |
Country |
48214 |
Mar 1982 |
EPX |
263921 |
Apr 1988 |
EPX |
Non-Patent Literature Citations (1)
Entry |
Housley et al. "Dyes in Photoresists: Today's View", Semiconductor International, Apr. 1988, pp. 142-144. |
Divisions (1)
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Number |
Date |
Country |
Parent |
650341 |
Feb 1991 |
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