Ahmad D. Katnani

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mitigation of hot carrier damage in field-effect transistors
- Patent number 10,566,446
- Issue date Feb 18, 2020
- GLOBALFOUNDRIES Inc.
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner protection in deep trench etching
- Patent number 8,030,157
- Issue date Oct 4, 2011
- International Business Machines Corporation
- Habib Hichri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat sink
- Patent number 7,856,341
- Issue date Dec 21, 2010
- International Business Machines Corporation
- Brian L. Carlson
- G01 - MEASURING TESTING
Information Patent Grant
Low “K” factor hybrid photoresist
- Patent number 6,440,635
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Steven J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing an integrated circuit chip using frequency doub...
- Patent number 6,372,412
- Issue date Apr 16, 2002
- International Business Machines Corporation
- Mark C. Hakey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deactivated aromatic amines as additives in acid-catalyzed resists
- Patent number 6,372,406
- Issue date Apr 16, 2002
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blends of hydroxystyrene polymers for use in chemically amplified p...
- Patent number 6,365,321
- Issue date Apr 2, 2002
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive silicon-containing resists
- Patent number 6,344,305
- Issue date Feb 5, 2002
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silsesquioxane polymers, method of synthesis, photoresist compositi...
- Patent number 6,340,734
- Issue date Jan 22, 2002
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuit chip produced by using frequency doubling hybrid...
- Patent number 6,313,492
- Issue date Nov 6, 2001
- International Business Machines Corporation
- Mark C. Hakey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Irradiation sensitive positive-tone resists using polymers containi...
- Patent number 6,303,263
- Issue date Oct 16, 2001
- International Business Machines Machines
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive photoresists
- Patent number 6,300,035
- Issue date Oct 9, 2001
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing an integrated circuit chip using low “k...
- Patent number 6,284,439
- Issue date Sep 4, 2001
- International Business Machines Corporation
- Steven J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approach to formulating irradiation sensitive positive resists
- Patent number 6,268,436
- Issue date Jul 31, 2001
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions with pendant polar-functionalized aromatic...
- Patent number 6,265,134
- Issue date Jul 24, 2001
- International Business Machines Corporation
- Pushkara R. Varanasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist system and process for aerial image enhancement
- Patent number 6,245,492
- Issue date Jun 12, 2001
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and process of forming a patterned resist layer...
- Patent number 6,210,856
- Issue date Apr 3, 2001
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of space width for hybrid photoresist
- Patent number 6,200,726
- Issue date Mar 13, 2001
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low “K” factor hybrid photoresist
- Patent number 6,190,829
- Issue date Feb 20, 2001
- International Business Machines Corporation
- Steve J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive silicon-containing resists
- Patent number 6,187,505
- Issue date Feb 13, 2001
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions with pendant polar-functionalized aromatic...
- Patent number 6,140,015
- Issue date Oct 31, 2000
- International Business Machines Corporation
- Pushkara R. Varanasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency doubling hybrid photoresist having negative and positive...
- Patent number 6,114,082
- Issue date Sep 5, 2000
- International Business Machines Corporation
- Mark C. Hakey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approach to formulating irradiation sensitive positive resists
- Patent number 6,103,447
- Issue date Aug 15, 2000
- International Business Machines Corp.
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silsesquioxane polymers, method of synthesis, photoresist compositi...
- Patent number 6,087,064
- Issue date Jul 11, 2000
- International Business Machines Corporation
- Qinghuang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam application to mask making using new improved KRS resist system
- Patent number 6,043,003
- Issue date Mar 28, 2000
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam application to mask making using new improved KRS resist system
- Patent number 6,037,097
- Issue date Mar 14, 2000
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a rim-type phase-shift mask and mask manufactured...
- Patent number 5,955,222
- Issue date Sep 21, 1999
- International Business Machines Corporation
- Michael Straight Hibbs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for preparing photoresist compositions
- Patent number 5,919,597
- Issue date Jul 6, 1999
- IBM Corporation of Armonk
- Roger F. Sinta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid Scavengers for use in chemically amplified photoresists
- Patent number 5,733,705
- Issue date Mar 31, 1998
- International Business Machines Corporation
- Nageshwer Rao Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid scavengers for use in chemically amplified photoresists
- Patent number 5,667,938
- Issue date Sep 16, 1997
- International Business Machines Corporation
- Nageshwer Rao Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MITIGATION OF HOT CARRIER DAMAGE IN FIELD-EFFECT TRANSISTORS
- Publication number 20190371918
- Publication date Dec 5, 2019
- GLOBALFOUNDRIES INC.
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT SINK METHOD, SYSTEM, AND PROGRAM PRODUCT
- Publication number 20090210190
- Publication date Aug 20, 2009
- International Business Machine Corporation
- Brian L. Carlson
- G01 - MEASURING TESTING
Information Patent Application
Positive photoresists containing crosslinked polymers
- Publication number 20020012869
- Publication date Jan 31, 2002
- Shipley Company, L.L.C.
- Timothy G. Adams
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Ahmad D. Katnani

Person

Patents Grantslast 30 patents

Mitigation of hot carrier damage in field-effect transistors

Liner protection in deep trench etching

Heat sink

Low &#x0201C;K&#x0201D; factor hybrid photoresist

Method of producing an integrated circuit chip using frequency doub...

Deactivated aromatic amines as additives in acid-catalyzed resists

Blends of hydroxystyrene polymers for use in chemically amplified p...

Radiation sensitive silicon-containing resists

Silsesquioxane polymers, method of synthesis, photoresist compositi...

Integrated circuit chip produced by using frequency doubling hybrid...

Irradiation sensitive positive-tone resists using polymers containi...

Chemically amplified positive photoresists

Method of producing an integrated circuit chip using low &#x0201C;k...

Approach to formulating irradiation sensitive positive resists

Photoresist compositions with pendant polar-functionalized aromatic...

Photoresist system and process for aerial image enhancement

Resist composition and process of forming a patterned resist layer...

Optimization of space width for hybrid photoresist

Low &#x0201C;K&#x0201D; factor hybrid photoresist

Radiation sensitive silicon-containing resists

Photoresist compositions with pendant polar-functionalized aromatic...

Frequency doubling hybrid photoresist having negative and positive...

Approach to formulating irradiation sensitive positive resists

Silsesquioxane polymers, method of synthesis, photoresist compositi...

E-beam application to mask making using new improved KRS resist system

E-beam application to mask making using new improved KRS resist system

Method of making a rim-type phase-shift mask and mask manufactured...

Methods for preparing photoresist compositions

Acid Scavengers for use in chemically amplified photoresists

Acid scavengers for use in chemically amplified photoresists

Patents Applicationslast 30 patents

MITIGATION OF HOT CARRIER DAMAGE IN FIELD-EFFECT TRANSISTORS

HEAT SINK METHOD, SYSTEM, AND PROGRAM PRODUCT

Positive photoresists containing crosslinked polymers

Low “K” factor hybrid photoresist

Method of producing an integrated circuit chip using low “k...

Low “K” factor hybrid photoresist