Aihua Chen

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for forming a high quality low temperature sil...
- Patent number 7,972,663
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten nitride atomic layer deposition processes
- Patent number 7,745,329
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten nitride atomic layer deposition processes
- Patent number 7,429,516
- Issue date Sep 30, 2008
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
- Patent number 7,335,266
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a high quality low temperature silicon nitride film
- Patent number 7,172,792
- Issue date Feb 6, 2007
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Patent number 7,115,499
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
- Patent number 6,982,214
- Issue date Jan 3, 2006
- Applied Materials, Inc.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming silicon comprising films using hexachlorodisila...
- Patent number 6,884,464
- Issue date Apr 26, 2005
- Applied Materials, Inc.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Patent number 6,833,161
- Issue date Dec 21, 2004
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for silicon oxide and oxynitride deposition using single wa...
- Patent number 6,713,127
- Issue date Mar 30, 2004
- Applied Materials, Inc.
- Janardhanan Anand Subramony
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heater temperature uniformity qualification tool
- Patent number 6,500,266
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Henry Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas mixing apparatus and method
- Patent number 6,303,501
- Issue date Oct 16, 2001
- Applied Materials, Inc.
- Chen-An Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer edge deposition elimination
- Patent number 6,231,674
- Issue date May 15, 2001
- Applied Materials, Inc.
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for generating plasma
- Patent number 6,143,084
- Issue date Nov 7, 2000
- Applied Materials, Inc.
- Steven T. Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas mixing apparatus and method
- Patent number 6,068,703
- Issue date May 30, 2000
- Applied Materials, Inc.
- Chen-An Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer edge deposition elimination
- Patent number 6,033,480
- Issue date Mar 7, 2000
- Applied Materials, Inc.
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrical connector for power transmission in an electrostatic chuck
- Patent number 5,908,334
- Issue date Jun 1, 1999
- Applied Materials, Inc.
- Aihua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lid assembly for semiconductor processing chamber
- Patent number 5,906,683
- Issue date May 25, 1999
- Applied Materials, Inc.
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Clamp ring for shielding a substrate during film layer deposition
- Patent number 5,868,847
- Issue date Feb 9, 1999
- Applied Materials, Inc.
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slotted RF coil shield for plasma deposition system
- Patent number 5,763,851
- Issue date Jun 9, 1998
- Applied Materials, Inc.
- John Forster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of purging and passivating a semiconductor processing chamber
- Patent number 5,759,287
- Issue date Jun 2, 1998
- Applied Materials, Inc.
- Aihua Chen
- C30 - CRYSTAL GROWTH
Information Patent Grant
High temperature polyimide electrostatic chuck
- Patent number 5,691,876
- Issue date Nov 25, 1997
- Applied Materials, Inc.
- Aihua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of purging and pumping vacuum chamber to ultra-high vacuum
- Patent number 5,536,330
- Issue date Jul 16, 1996
- Applied Materials, Inc.
- Aihua Chen
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
Method and Apparatus for Forming a High Quality Low Temperature Sil...
- Publication number 20100029094
- Publication date Feb 4, 2010
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES
- Publication number 20080305629
- Publication date Dec 11, 2008
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES
- Publication number 20070020924
- Publication date Jan 25, 2007
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
- Publication number 20060024926
- Publication date Feb 2, 2006
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Publication number 20050176240
- Publication date Aug 11, 2005
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electron beam treatment of SixNy films
- Publication number 20040266123
- Publication date Dec 30, 2004
- APPLIED MATERIALS, INC.
- Zhenjiang Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming a high quality low temperature sil...
- Publication number 20040194706
- Publication date Oct 7, 2004
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming a high quality low temperature sil...
- Publication number 20040121085
- Publication date Jun 24, 2004
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for forming silicon comprising films using hexachlorodisila...
- Publication number 20040086640
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
- Publication number 20040063301
- Publication date Apr 1, 2004
- APPLIED MATERIALS, INC.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclical deposition of tungsten nitride for metal oxide gate electrode
- Publication number 20030161952
- Publication date Aug 28, 2003
- APPLIED MATERIALS, INC.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for silicon oxide and oxynitride deposition using single wa...
- Publication number 20030138562
- Publication date Jul 24, 2003
- Janardhanan Anand Subramony
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of annealing an oxide film
- Publication number 20030124873
- Publication date Jul 3, 2003
- Guangcai Xing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cycling deposition of low temperature films in a cold wall single w...
- Publication number 20030059535
- Publication date Mar 27, 2003
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Method and apparatus for forming a high quality low temperature sil...

Tungsten nitride atomic layer deposition processes

Tungsten nitride atomic layer deposition processes

Method of forming a controlled and uniform lightly phosphorous dope...

Method for forming a high quality low temperature silicon nitride film

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Method of forming a controlled and uniform lightly phosphorous dope...

Methods for forming silicon comprising films using hexachlorodisila...

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Methods for silicon oxide and oxynitride deposition using single wa...

Heater temperature uniformity qualification tool

Gas mixing apparatus and method

Wafer edge deposition elimination

Apparatus and method for generating plasma

Gas mixing apparatus and method

Wafer edge deposition elimination

Electrical connector for power transmission in an electrostatic chuck

Lid assembly for semiconductor processing chamber

Clamp ring for shielding a substrate during film layer deposition

Slotted RF coil shield for plasma deposition system

Method of purging and passivating a semiconductor processing chamber

High temperature polyimide electrostatic chuck

Method of purging and pumping vacuum chamber to ultra-high vacuum

Patents Applicationslast 30 patents

Method and Apparatus for Forming a High Quality Low Temperature Sil...

TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES

TUNGSTEN NITRIDE ATOMIC LAYER DEPOSITION PROCESSES

Method of forming a controlled and uniform lightly phosphorous dope...

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Electron beam treatment of SixNy films

Method and apparatus for forming a high quality low temperature sil...

Method and apparatus for forming a high quality low temperature sil...

Methods for forming silicon comprising films using hexachlorodisila...

Method of forming a controlled and uniform lightly phosphorous dope...

Cyclical deposition of tungsten nitride for metal oxide gate electrode

Methods for silicon oxide and oxynitride deposition using single wa...

Method of annealing an oxide film

Cycling deposition of low temperature films in a cold wall single w...