Alan H. Ouye

Person

San Mateo, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sensor assembly and methods of vapor monitoring in process chambers
- Patent number 11,721,566
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Xiaozhou Che
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Proximity contact cover ring for plasma dicing
- Patent number 11,195,756
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- James M. Holden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber lid heater ring assembly
- Patent number 10,595,365
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Alan H. Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal pyrolytic graphite shadow ring assembly for heat dissipatio...
- Patent number 9,478,455
- Issue date Oct 25, 2016
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma reactor having RF phase control and meth...
- Patent number 9,378,930
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma thermal shield for heat dissipation in plasma chamber
- Patent number 9,293,304
- Issue date Mar 22, 2016
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled tape frame lift and low contact shadow ring for plasma heat...
- Patent number 9,236,284
- Issue date Jan 12, 2016
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled tape frame lift and low contact shadow ring for plasma heat...
- Patent number 9,165,812
- Issue date Oct 20, 2015
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery apparatus and method for atomic layer deposition
- Patent number 8,668,776
- Issue date Mar 11, 2014
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 8,568,553
- Issue date Oct 29, 2013
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for generating a precursor for a semiconductor...
- Patent number 8,062,422
- Issue date Nov 22, 2011
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,943,005
- Issue date May 17, 2011
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,909,961
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery apparatus for atomic layer deposition
- Patent number 7,780,788
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery apparatus for atomic layer deposition
- Patent number 7,780,785
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ampoule for liquid draw and vapor draw with a continuous level sensor
- Patent number 7,775,508
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Kenric T. Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery apparatus for atomic layer deposition
- Patent number 7,699,023
- Issue date Apr 20, 2010
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical precursor ampoule for vapor deposition processes
- Patent number 7,597,758
- Issue date Oct 6, 2009
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for generating a chemical precursor
- Patent number 7,588,736
- Issue date Sep 15, 2009
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for generating a precursor for a semiconductor...
- Patent number 7,524,374
- Issue date Apr 28, 2009
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of generating PDMAT precursor
- Patent number 7,270,709
- Issue date Sep 18, 2007
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for gas temperature control in a semiconductor...
- Patent number 6,955,211
- Issue date Oct 18, 2005
- Applied Materials, Inc.
- Vincent W. Ku
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Gas delivery apparatus and method for atomic layer deposition
- Patent number 6,916,398
- Issue date Jul 12, 2005
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of generating PDMAT precursor
- Patent number 6,905,541
- Issue date Jun 14, 2005
- Applied Materials, Inc.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus to reduce contaminants from semiconductor wafers
- Patent number 6,598,316
- Issue date Jul 29, 2003
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to reduce contaminants from semiconductor wafers
- Patent number 6,406,553
- Issue date Jun 18, 2002
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density and etch rate enhancing semiconductor processing cha...
- Patent number 6,228,208
- Issue date May 8, 2001
- Applied Materials, Inc.
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SENSOR ASSEMBLY AND METHODS OF VAPOR MONITORING IN PROCESS CHAMBERS
- Publication number 20230018891
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- Xiaozhou CHE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY CONTACT COVER RING FOR PLASMA DICING
- Publication number 20160086852
- Publication date Mar 24, 2016
- James M. Holden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLED TAPE FRAME LIFT AND LOW CONTACT SHADOW RING FOR PLASMA HEAT...
- Publication number 20150221539
- Publication date Aug 6, 2015
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLED TAPE FRAME LIFT AND LOW CONTACT SHADOW RING FOR PLASMA HEAT...
- Publication number 20150221553
- Publication date Aug 6, 2015
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA THERMAL SHIELD FOR HEAT DISSIPATION IN PLASMA CHAMBER
- Publication number 20150170884
- Publication date Jun 18, 2015
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVELY-COOLED SHADOW RING FOR HEAT DISSIPATION IN PLASMA CHAMBER
- Publication number 20150170955
- Publication date Jun 18, 2015
- Applied Materials, Inc.
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA THERMAL SHIELD FOR HEAT DISSIPATION IN PLASMA CHAMBER
- Publication number 20150170885
- Publication date Jun 18, 2015
- Alan Hiroshi Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PURITY ALUMINUM COATING HARD ANODIZATION
- Publication number 20120103526
- Publication date May 3, 2012
- Applied Materials, Inc.
- Alan Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER LID HEATER RING ASSEMBLY
- Publication number 20120090784
- Publication date Apr 19, 2012
- Applied Materials, Inc.
- Alan H. Ouye
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DC VOLTAGE CHARGING OF CATHODE FOR PLASMA STRIKING
- Publication number 20110236806
- Publication date Sep 29, 2011
- Applied Materials, Inc.
- ALAN HIROSHI OUYE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20110162797
- Publication date Jul 7, 2011
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION
- Publication number 20100247767
- Publication date Sep 30, 2010
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100224321
- Publication date Sep 9, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SOURCE FIELD SHAPING IN A PLASMA ETCH REACTOR
- Publication number 20090220865
- Publication date Sep 3, 2009
- APPLIED MATERIALS, INC.
- ALAN HIROSHI OUYE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GENERATING A PRECURSOR FOR A SEMICONDUCTOR...
- Publication number 20090151633
- Publication date Jun 18, 2009
- LING CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL PRECURSOR AMPOULE FOR VAPOR DEPOSITION PROCESSES
- Publication number 20080216743
- Publication date Sep 11, 2008
- LING CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMPOULE FOR LIQUID DRAW AND VAPOR DRAW WITH A CONTINOUS LEVEL SENSOR
- Publication number 20080099933
- Publication date May 1, 2008
- Kenric T. Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099431
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099426
- Publication date May 1, 2008
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY APPARATUS FOR ATOMIC LAYER DEPOSITION
- Publication number 20080041313
- Publication date Feb 21, 2008
- LING CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION PROCESS
- Publication number 20080038463
- Publication date Feb 14, 2008
- APPLIED MATERIALS, INC.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATION PROCESS OF TUNGSTEN ATOMIC LAYER DEPOSITION FOR METALLI...
- Publication number 20070099415
- Publication date May 3, 2007
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for generating a precursor for a semiconductor...
- Publication number 20070067609
- Publication date Mar 22, 2007
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR GENERATING A CHEMICAL PRECURSOR
- Publication number 20060257295
- Publication date Nov 16, 2006
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus of generating PDMAT precursor
- Publication number 20050189072
- Publication date Sep 1, 2005
- APPLIED MATERIALS, INC.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas delivery apparatus and method for atomic layer deposition
- Publication number 20050173068
- Publication date Aug 11, 2005
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus of generating PDMAT precursor
- Publication number 20040014320
- Publication date Jan 22, 2004
- APPLIED MATERIALS, INC.
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for gas temperature control in a semiconductor...
- Publication number 20040011504
- Publication date Jan 22, 2004
- Vincent W. Ku
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Integration of ALD tantalum nitride and alpha-phase tantalum for co...
- Publication number 20030124262
- Publication date Jul 3, 2003
- Ling Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Alan H. Ouye

Person

Patents Grantslast 30 patents

Sensor assembly and methods of vapor monitoring in process chambers

Proximity contact cover ring for plasma dicing

Chamber lid heater ring assembly

Thermal pyrolytic graphite shadow ring assembly for heat dissipatio...

Inductively coupled plasma reactor having RF phase control and meth...

Plasma thermal shield for heat dissipation in plasma chamber

Cooled tape frame lift and low contact shadow ring for plasma heat...

Cooled tape frame lift and low contact shadow ring for plasma heat...

Gas delivery apparatus and method for atomic layer deposition

Method and apparatus for photomask plasma etching

Method and apparatus for generating a precursor for a semiconductor...

Method and apparatus for photomask plasma etching

Method and apparatus for photomask plasma etching

Gas delivery apparatus for atomic layer deposition

Gas delivery apparatus for atomic layer deposition

Ampoule for liquid draw and vapor draw with a continuous level sensor

Gas delivery apparatus for atomic layer deposition

Chemical precursor ampoule for vapor deposition processes

Apparatus and method for generating a chemical precursor

Method and apparatus for generating a precursor for a semiconductor...

Method and apparatus of generating PDMAT precursor

Method and apparatus for gas temperature control in a semiconductor...

Gas delivery apparatus and method for atomic layer deposition

Method and apparatus of generating PDMAT precursor

Apparatus to reduce contaminants from semiconductor wafers

Method to reduce contaminants from semiconductor wafers

Plasma density and etch rate enhancing semiconductor processing cha...

Patents Applicationslast 30 patents

SENSOR ASSEMBLY AND METHODS OF VAPOR MONITORING IN PROCESS CHAMBERS

PROXIMITY CONTACT COVER RING FOR PLASMA DICING

COOLED TAPE FRAME LIFT AND LOW CONTACT SHADOW RING FOR PLASMA HEAT...

COOLED TAPE FRAME LIFT AND LOW CONTACT SHADOW RING FOR PLASMA HEAT...

PLASMA THERMAL SHIELD FOR HEAT DISSIPATION IN PLASMA CHAMBER

ACTIVELY-COOLED SHADOW RING FOR HEAT DISSIPATION IN PLASMA CHAMBER

PLASMA THERMAL SHIELD FOR HEAT DISSIPATION IN PLASMA CHAMBER

HIGH PURITY ALUMINUM COATING HARD ANODIZATION

CHAMBER LID HEATER RING ASSEMBLY

DC VOLTAGE CHARGING OF CATHODE FOR PLASMA STRIKING

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

GAS DELIVERY APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

METHOD AND APPARATUS FOR SOURCE FIELD SHAPING IN A PLASMA ETCH REACTOR

METHOD AND APPARATUS FOR GENERATING A PRECURSOR FOR A SEMICONDUCTOR...

CHEMICAL PRECURSOR AMPOULE FOR VAPOR DEPOSITION PROCESSES

AMPOULE FOR LIQUID DRAW AND VAPOR DRAW WITH A CONTINOUS LEVEL SENSOR

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

GAS DELIVERY APPARATUS FOR ATOMIC LAYER DEPOSITION

ATOMIC LAYER DEPOSITION PROCESS

INTEGRATION PROCESS OF TUNGSTEN ATOMIC LAYER DEPOSITION FOR METALLI...

Method and apparatus for generating a precursor for a semiconductor...

APPARATUS AND METHOD FOR GENERATING A CHEMICAL PRECURSOR

Method and apparatus of generating PDMAT precursor

Gas delivery apparatus and method for atomic layer deposition

Method and apparatus of generating PDMAT precursor

Method and apparatus for gas temperature control in a semiconductor...

Integration of ALD tantalum nitride and alpha-phase tantalum for co...