Alexander Kabansky

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective etch using a sacrificial mask
- Patent number 12,027,375
- Issue date Jul 2, 2024
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etching for nanowires
- Patent number 11,521,860
- Issue date Dec 6, 2022
- Lam Research Corporation
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional deposition on patterned structures
- Patent number 10,825,680
- Issue date Nov 3, 2020
- Lam Research Corporation
- Alexander Kabansky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,515,816
- Issue date Dec 24, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,186,426
- Issue date Jan 22, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 9,805,941
- Issue date Oct 31, 2017
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 9,576,811
- Issue date Feb 21, 2017
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a substrate using a single phase proximity he...
- Patent number 8,313,580
- Issue date Nov 20, 2012
- Lam Research Corporation
- Mike Ravkin
- B08 - CLEANING
Information Patent Grant
Single phase proximity head having a controlled meniscus for treati...
- Patent number 7,997,288
- Issue date Aug 16, 2011
- Lam Research Corporation
- Mike Ravkin
- B08 - CLEANING
Information Patent Grant
Removing whisker defects
- Patent number 7,351,663
- Issue date Apr 1, 2008
- Cypress Semiconductor Corporation
- Alex Kabansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication dual plasma process with separate in...
- Patent number 6,641,698
- Issue date Nov 4, 2003
- LSI Logic Corporation
- Alex Kabansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication dual plasma process with separate in...
- Patent number 6,461,972
- Issue date Oct 8, 2002
- LSI Logic Corporation
- Alex Kabansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to provide enhanced resistance to cracking and to further r...
- Patent number 6,346,488
- Issue date Feb 12, 2002
- LSI Logic Corporation
- Alex Kabansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for treating damaged surfaces of low k carbon doped silicon...
- Patent number 6,346,490
- Issue date Feb 12, 2002
- LSI Logic Corporation
- Wilbur G. Catabay
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE ETCH USING A SACRIFICIAL MASK
- Publication number 20220122848
- Publication date Apr 21, 2022
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210335626
- Publication date Oct 28, 2021
- LAM RESEARCH CORPORATION
- Jun XUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210272814
- Publication date Sep 2, 2021
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20200161139
- Publication date May 21, 2020
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20190139778
- Publication date May 9, 2019
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES
- Publication number 20180233357
- Publication date Aug 16, 2018
- LAM RESEARCH CORPORATION
- Alexander Kabansky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20180033635
- Publication date Feb 1, 2018
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES
- Publication number 20170178899
- Publication date Jun 22, 2017
- LAM RESEARCH CORPORATION
- Alexander Kabansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20170117159
- Publication date Apr 27, 2017
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20160203995
- Publication date Jul 14, 2016
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SOLUTION FOR CLEANING METAL RESIDUE
- Publication number 20150079786
- Publication date Mar 19, 2015
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE USING A SINGLE PHASE PROXIMITY HE...
- Publication number 20110265823
- Publication date Nov 3, 2011
- Mike Ravkin
- B08 - CLEANING
Information Patent Application
SINGLE PHASE PROXIMITY HEAD HAVING A CONTROLLED MENISCUS FOR TREATI...
- Publication number 20080266367
- Publication date Oct 30, 2008
- Mike Ravkin
- B08 - CLEANING
Information Patent Application
Integrated circuit fabrication dual plasma process with separate in...
- Publication number 20020179248
- Publication date Dec 5, 2002
- Alex Kabansky
- H01 - BASIC ELECTRIC ELEMENTS

Alexander Kabansky

Person

Patents Grantslast 30 patents

Selective etch using a sacrificial mask

Selectively etching for nanowires

Directional deposition on patterned structures

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Method for processing a substrate using a single phase proximity he...

Single phase proximity head having a controlled meniscus for treati...

Removing whisker defects

Integrated circuit fabrication dual plasma process with separate in...

Integrated circuit fabrication dual plasma process with separate in...

Process to provide enhanced resistance to cracking and to further r...

Process for treating damaged surfaces of low k carbon doped silicon...

Patents Applicationslast 30 patents

SELECTIVE ETCH USING A SACRIFICIAL MASK

SELECTIVELY ETCHING FOR NANOWIRES

SELECTIVELY ETCHING FOR NANOWIRES

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

METHOD AND SOLUTION FOR CLEANING METAL RESIDUE

METHOD FOR PROCESSING A SUBSTRATE USING A SINGLE PHASE PROXIMITY HE...

SINGLE PHASE PROXIMITY HEAD HAVING A CONTROLLED MENISCUS FOR TREATI...

Integrated circuit fabrication dual plasma process with separate in...