Alexander S. Perel

Person

Danvers, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Single-slot tubular cathode
- Patent number D1051838
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Bon-Woong Koo
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Variable thickness ion source extraction plate
- Patent number 11,810,746
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,631,567
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped repeller for an indirectly heated cathode ion source
- Patent number 11,251,010
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,127,557
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with multiple configurations
- Patent number 10,896,799
- Issue date Jan 19, 2021
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical shaped arc chamber for indirectly heated cathode ion so...
- Patent number 10,818,469
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic temperature control of an ion source
- Patent number 10,347,457
- Issue date Jul 9, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source for enhanced ionization
- Patent number 10,290,461
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel R. Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual material repeller
- Patent number 9,824,846
- Issue date Nov 21, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and a method for in-situ cleaning thereof
- Patent number 9,142,379
- Issue date Sep 22, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Indirectly heated cathode cartridge design
- Patent number 9,076,625
- Issue date Jul 7, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Craig Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for ion implanting a target
- Patent number 8,937,003
- Issue date Jan 20, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source and a method for in-situ cleaning thereof
- Patent number 8,809,800
- Issue date Aug 19, 2014
- Varian Semicoductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning of an extraction aperture of an ion source
- Patent number 8,455,839
- Issue date Jun 4, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flexible ion source
- Patent number 8,330,127
- Issue date Dec 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional gas injection for an ion source cathode assembly
- Patent number 8,263,944
- Issue date Sep 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- John Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density helicon plasma source for wide ribbon ion beam generation
- Patent number 8,142,607
- Issue date Mar 27, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Cleaning of an extraction aperture of an ion source
- Patent number 8,071,956
- Issue date Dec 6, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- B08 - CLEANING
Information Patent Grant
Ethane implantation with a dilution gas
- Patent number 8,003,957
- Issue date Aug 23, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source cleaning end point detection
- Patent number 8,003,959
- Issue date Aug 23, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Wilhelm P. Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conjugated ICP and ECR plasma sources for wide ribbon ion beam gene...
- Patent number 7,999,479
- Issue date Aug 16, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and apparatus for controlling beam current uniformity in an...
- Patent number 7,767,986
- Issue date Aug 3, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for optical ion beam metrology
- Patent number 7,723,697
- Issue date May 25, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for trapping ion beam particles and focusing an...
- Patent number 7,598,495
- Issue date Oct 6, 2009
- Axcelis Technologies, Inc.
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for improving the performance and extending the lifetime...
- Patent number 7,586,109
- Issue date Sep 8, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source configuration for production of ionized clusters, ionize...
- Patent number 7,459,704
- Issue date Dec 2, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam angle measurement systems and methods for ion implantation...
- Patent number 7,435,977
- Issue date Oct 14, 2008
- Axcelis Technologies, Inc.
- Brian S. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam monitoring in an ion implanter using an imaging device
- Patent number 7,423,277
- Issue date Sep 9, 2008
- Axcelis Technologies, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bellows liner for an ion beam implanter
- Patent number 7,205,556
- Issue date Apr 17, 2007
- Axcelis Technologies, Inc.
- Lyudmila Stone
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Variable Thickness Ion Source Extraction Plate
- Publication number 20230080083
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE
- Publication number 20210383995
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE
- Publication number 20210287872
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion So...
- Publication number 20200194220
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dynamic Temperature Control Of An Ion Source
- Publication number 20190189387
- Publication date Jun 20, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source For Enhanced Ionization
- Publication number 20190122851
- Publication date Apr 25, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel R. Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Material Repeller
- Publication number 20170213684
- Publication date Jul 27, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion source and a method for in-situ cleaning thereof
- Publication number 20140319369
- Publication date Oct 30, 2014
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR ION IMPLANTING A TARGET
- Publication number 20130072008
- Publication date Mar 21, 2013
- Alexander S. Perel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDIRECTLY HEATED CATHODE CARTRIDGE DESIGN
- Publication number 20120256097
- Publication date Oct 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
- Publication number 20110220812
- Publication date Sep 15, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. CHANEY
- B08 - CLEANING
Information Patent Application
CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
- Publication number 20110220144
- Publication date Sep 15, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. CHANEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR GENERATING UNIFORM ION BEAM
- Publication number 20110143527
- Publication date Jun 16, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Wilhelm P. PLATOW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source Cleaning End Point Detection
- Publication number 20100327159
- Publication date Dec 30, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Wilhelm P. Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONJUGATED ICP AND ECR PLASMA SOURCES FOR WIDE RIBBON ION BEAM GENE...
- Publication number 20100264328
- Publication date Oct 21, 2010
- Costel Biloiu
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
DIRECTIONAL GAS INJECTION FOR AN ION SOURCE CATHODE ASSEMBLY
- Publication number 20100155619
- Publication date Jun 24, 2010
- Varian Semiconductor Equipment Associates Inc.
- John Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION
- Publication number 20100055345
- Publication date Mar 4, 2010
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Ion Source and a Method for In-Situ Cleaning Thereof
- Publication number 20100024841
- Publication date Feb 4, 2010
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...
- Publication number 20090314962
- Publication date Dec 24, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh DORAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flexible ion source
- Publication number 20090242793
- Publication date Oct 1, 2009
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETHANE IMPLANTATION WITH A DILUTION GAS
- Publication number 20090200460
- Publication date Aug 13, 2009
- Craig R. Chaney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR OPTICAL ION BEAM METROLOGY
- Publication number 20090078883
- Publication date Mar 26, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for Improving the Performance and Extending the Lifetime...
- Publication number 20080179545
- Publication date Jul 31, 2008
- Varian Semiconductor Equipment Associates
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam monitoring in an ion implanter using an imaging device
- Publication number 20080061250
- Publication date Mar 13, 2008
- Axcelis Technologies, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN...
- Publication number 20070295901
- Publication date Dec 27, 2007
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Johnsen-Rahbek electrostatic chuck driven with AC voltage
- Publication number 20070195482
- Publication date Aug 23, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Richard Muka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of implanting ions and ion sources used for same
- Publication number 20070178678
- Publication date Aug 2, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Christopher Hatem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion beam angle measurement systems and methods for ion implantation...
- Publication number 20070145298
- Publication date Jun 28, 2007
- Axcelis Technologies, Inc.
- Brian S. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for providing an inductively coupled radio frequency plas...
- Publication number 20070137576
- Publication date Jun 21, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion source configuration for production of ionized clusters, ionize...
- Publication number 20060169915
- Publication date Aug 3, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS

Alexander S. Perel

Person

Patents Grantslast 30 patents

Single-slot tubular cathode

Variable thickness ion source extraction plate

Ion source with single-slot tubular cathode

Shaped repeller for an indirectly heated cathode ion source

Ion source with single-slot tubular cathode

Ion source with multiple configurations

Cylindrical shaped arc chamber for indirectly heated cathode ion so...

Dynamic temperature control of an ion source

Ion source for enhanced ionization

Dual material repeller

Ion source and a method for in-situ cleaning thereof

Indirectly heated cathode cartridge design

Technique for ion implanting a target

Ion source and a method for in-situ cleaning thereof

Cleaning of an extraction aperture of an ion source

Flexible ion source

Directional gas injection for an ion source cathode assembly

High density helicon plasma source for wide ribbon ion beam generation

Cleaning of an extraction aperture of an ion source

Ethane implantation with a dilution gas

Ion source cleaning end point detection

Conjugated ICP and ECR plasma sources for wide ribbon ion beam gene...

Method and apparatus for controlling beam current uniformity in an...

Techniques for optical ion beam metrology

Methods and systems for trapping ion beam particles and focusing an...

Technique for improving the performance and extending the lifetime...

Ion source configuration for production of ionized clusters, ionize...

Ion beam angle measurement systems and methods for ion implantation...

Ion beam monitoring in an ion implanter using an imaging device

Bellows liner for an ion beam implanter

Patents Applicationslast 30 patents

Variable Thickness Ion Source Extraction Plate

ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE

ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE

Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion So...

Dynamic Temperature Control Of An Ion Source

Ion Source For Enhanced Ionization

Dual Material Repeller

Ion source and a method for in-situ cleaning thereof

TECHNIQUE FOR ION IMPLANTING A TARGET

INDIRECTLY HEATED CATHODE CARTRIDGE DESIGN

CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE

CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE

TECHNIQUES FOR GENERATING UNIFORM ION BEAM

Ion Source Cleaning End Point Detection

CONJUGATED ICP AND ECR PLASMA SOURCES FOR WIDE RIBBON ION BEAM GENE...

DIRECTIONAL GAS INJECTION FOR AN ION SOURCE CATHODE ASSEMBLY

HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION

Ion Source and a Method for In-Situ Cleaning Thereof

METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...

Flexible ion source

ETHANE IMPLANTATION WITH A DILUTION GAS

TECHNIQUES FOR OPTICAL ION BEAM METROLOGY

Technique for Improving the Performance and Extending the Lifetime...

Ion beam monitoring in an ion implanter using an imaging device

METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN...

Johnsen-Rahbek electrostatic chuck driven with AC voltage

Methods of implanting ions and ion sources used for same

Ion beam angle measurement systems and methods for ion implantation...

Technique for providing an inductively coupled radio frequency plas...

Ion source configuration for production of ionized clusters, ionize...