Technique for providing an inductively coupled radio frequency plasma flood gun

Abstract

A technique for providing an inductively coupled radio frequency plasma flood gun is disclosed. In one particular exemplary embodiment, the technique may be realized as a plasma flood gun in an ion implantation system. The plasma flood gun may comprise: a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; and a power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma. Entire inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. In addition, the one or more apertures may be wide enough for at least one portion of charged particles from the plasma to flow through.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

In order to facilitate a fuller understanding of the present disclosure, reference is now made to the accompanying drawings, in which like elements are referenced with like numerals. These drawings should not be construed as limiting the present disclosure, but are intended to be exemplary only.

FIG. 1 shows a side view of an exemplary PFG in accordance with an embodiment of the present disclosure.

FIG. 2 shows an exit aperture in a PFG in accordance with an embodiment of the present disclosure.

FIG. 3 shows a perspective view of an exemplary PFG in accordance with an embodiment of the present disclosure.

FIG. 4 shows a bottom view of a PFG with one exemplary arrangement of magnets in accordance with an embodiment of the present disclosure.

FIG. 5 shows a bottom view of a PFG with another exemplary arrangement of magnets in accordance with an embodiment of the present disclosure.

FIG. 6 shows a bottom view of a PFG with yet another exemplary arrangement of magnets in accordance with an embodiment of the present disclosure.

FIG. 7 shows a flow chart illustrating an exemplary method for providing a PFG in accordance with an embodiment of the present disclosure.

FIG. 8 shows an exemplary RF coil for use in a PFG in accordance with an embodiment of the present disclosure.

FIG. 9 shows an exemplary aperture plate for use in a PFG in accordance with an embodiment of the present disclosure.

FIG. 10 shows a bottom view of a PFG with still another exemplary arrangement of magnets in accordance with an embodiment of the present disclosure.

Claims

1. A plasma flood gun in an ion implantation system, the plasma flood gun comprising: a plasma chamber having one or more apertures;a gas source capable of supplying at least one gaseous substance to the plasma chamber; anda power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma;wherein entire inner surface of the plasma chamber is free of metal-containing material and the plasma is not exposed to any metal-containing component within the plasma chamber, and wherein the one or more apertures are wide enough for at least one portion of charged particles from the plasma to flow through.

2. The plasma flood gun according to claim 1, wherein a portion of the inner surface of the plasma chamber comprises one or more materials selected from a group consisting of graphite and silicon carbide.

3. The plasma flood gun according to claim 1, wherein the power source is coupled to the plasma chamber via a dielectric interface.

4. The plasma flood gun according to claim 3, wherein the dielectric interface comprises quartz.

5. The plasma flood gun according to claim 1, wherein a bulk of the plasma is magnetically confined in one or more magnetic cusps that are produced by a plurality of magnets placed outside the plasma chamber.

6. The plasma flood gun according to claim 5, wherein the plurality of magnets are further arranged to produce one or more magnetic dipoles to filter out high-energy electrons from the plasma.

7. The plasma flood gun according to claim 1, wherein each of the one or more apertures is wider than twice a sheath width of the plasma.

8. The plasma flood gun according to claim 1, further comprising: an unbiased cage having an opening for an ion beam to pass through, wherein the plasma chamber is positioned sufficiently close to the opening to allow the ion beam to transport the at least one portion of charged particles from the plasma.

9. The plasma flood gun according to claim 8, wherein the one or more apertures form an array that extends across a width of the ion beam or a scan width of the ion beam.

10. The plasma flood gun according to claim 8, wherein: the ion beam is directed at a wafer; andthe one or more apertures are tilted towards the wafer such that the exiting plasma joins the ion beam at an angle.

11. The plasma flood gun according to claim 1, wherein the one or more apertures comprise a slit aperture.

12. The plasma flood gun according to claim 1, wherein: the power source comprises an elongated planar coil that extends alongside an external wall of the plasma chamber.

13. The plasma flood gun according to claim 12, wherein the elongated planar coil is made essentially of aluminum.

14. The plasma flood gun according to claim 12, wherein the elongated planar coil has: two or more turns spaced 1/16 to 1 inch apart;a bend radius in a range of ¼ to 1 inch; anda bend radius to bend radius length in a range of 6 to 16 inches.

15. The plasma flood gun according to claim 14, wherein the elongated planar coil has: two turns spaced ⅛ inch apart;a bend radius of ½ inch; anda bend radius to bend radius length of 12.25 inches.

16. The plasma flood gun according to claim 1, wherein there is no electrode located inside the plasma chamber.

17. The plasma flood gun according to claim 1, wherein the at least one gaseous substance comprises one or more substances selected from a group consisting of argon, krypton, xenon, and helium.

18. The plasma flood gun according to claim 1, wherein the plasma chamber comprises an aperture plate having: a length in a range of 6 to 16 inches;a width in a range of 2 to 4 inches;a height in a range of 1/16 to ¼ inches; anda plurality of apertures along the length, each aperture having a diameter in a range of 0.020 to 0.100 inches and a depth in a range of 0.005 to 0.050 inches.

19. The plasma flood gun according to claim 18, wherein the plasma chamber comprises an aperture plate having: a length of 14 inches;a width of ½ inch;a height of ¼ inch; andten apertures evenly spaced by 1.2 inches along the length and centered, each aperture having a diameter of 1.4 mm and a depth of 0.7 mm.

20. A plasma flood gun in an ion implantation system, the plasma flood gun comprising: a plasma chamber having one or more apertures;a gas source capable of supplying at least one gaseous substance to the plasma chamber; anda power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma;wherein entire inner surface of the plasma chamber comprises no metal other than aluminum, and wherein the one or more apertures are wide enough for at least one portion of charged particles from the plasma to flow through.

21. The plasma flood gun according to claim 20, wherein the plasma chamber comprises a dielectric interface to the power source and wherein the dielectric interface comprises aluminum oxide.

22. A method for providing a plasma flood gun in an ion implantation system, the method comprising: providing a plasma chamber having a dielectric interface and one or more apertures, the entire inner surface of the plasma chamber being free of metal or metal compound;supplying at least one gaseous substance to the plasma chamber;generating a plasma by inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance; andcausing at least a portion of charged particles from the plasma to exit the plasma chamber via the one or more apertures.