Anh N. Nguyen

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing system workpiece carrier with thermally isolated...
- Patent number 11,322,337
- Issue date May 3, 2022
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution showerhead for semiconductor processing
- Patent number 10,829,855
- Issue date Nov 10, 2020
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution showerhead for semiconductor processing
- Patent number 10,577,690
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer carrier with independent isolated heater zones
- Patent number 10,431,435
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quartz upper and lower domes
- Patent number 9,768,043
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Anzhong Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas heater
- Patent number 9,766,022
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Tao Hou
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
CVD apparatus for improved film thickness non-uniformity and partic...
- Patent number 9,312,154
- Issue date Apr 12, 2016
- Applied Materials, Inc.
- Binh Tran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition chamber with multi inject
- Patent number 9,175,394
- Issue date Nov 3, 2015
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process gas delivery for semiconductor process chambers
- Patent number 8,382,897
- Issue date Feb 26, 2013
- Applied Materials, Inc.
- Kedarnath Sangam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas heater
- Patent number 8,309,874
- Issue date Nov 13, 2012
- Applied Materials, Inc.
- Tao Hou
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Process gas delivery for semiconductor process chamber
- Patent number 8,187,381
- Issue date May 29, 2012
- Applied Materials, Inc.
- Kedarnath Sangam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper deposition chamber having integrated bevel clean with edge b...
- Patent number 7,947,131
- Issue date May 24, 2011
- Applied Materials, Inc.
- Chen-An Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated bevel clean chamber
- Patent number 7,520,939
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Henry Ho
- B08 - CLEANING
Information Patent Grant
Multi-chemistry plating system
- Patent number 7,223,323
- Issue date May 29, 2007
- Applied Materials, Inc.
- Michael X. Yang
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Grant
Electronically actuated valve
- Patent number 7,222,636
- Issue date May 29, 2007
- Applied Materials, Inc.
- Anh N. Nguyen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Valve control system for atomic layer deposition chamber
- Patent number 7,201,803
- Issue date Apr 10, 2007
- Applied Materials, Inc.
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Valve control system for atomic layer deposition chamber
- Patent number 6,734,020
- Issue date May 11, 2004
- Applied Materials, Inc.
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Lid assembly for a processing system to facilitate sequential depos...
- Patent number 6,660,126
- Issue date Dec 9, 2003
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic substrate support
- Patent number 6,494,955
- Issue date Dec 17, 2002
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chemical vapor deposition chamber
- Patent number 6,364,954
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Local repair of top guide in boiling water reactor by installation...
- Patent number 6,351,511
- Issue date Feb 26, 2002
- General Electric Company
- Gerald Alan Deaver
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
One-piece dual gas faceplate for a showerhead in a semiconductor wa...
- Patent number 6,302,964
- Issue date Oct 16, 2001
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Head for vaporizing and flowing various precursor materials onto se...
- Patent number 6,299,692
- Issue date Oct 9, 2001
- Applied Materials, Inc.
- Vincent Ku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual gas faceplate for a showerhead in a semiconductor wafer proces...
- Patent number 6,086,677
- Issue date Jul 11, 2000
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor optimized for chemical vapor deposition of titanium
- Patent number 6,079,356
- Issue date Jun 27, 2000
- Applied Materials, Inc.
- Salvador Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for repairing jet pump diffusers in a nuclear...
- Patent number 5,876,146
- Issue date Mar 2, 1999
- General Electric Company
- Gerald Alan Deaver
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Core differential pressure and liquid control line apparatus in a n...
- Patent number 5,615,239
- Issue date Mar 25, 1997
- General Electric Company
- Gerald A. Deaver
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER ADAPTER
- Publication number 20230005765
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Son T. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUARTZ UPPER AND LOWER DOMES
- Publication number 20180005856
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Anzhong CHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING
- Publication number 20170335457
- Publication date Nov 23, 2017
- Applied Materials, Inc.
- Anh N. NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING
- Publication number 20170335456
- Publication date Nov 23, 2017
- Applied Materials, Inc.
- Anh N. NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM WORKPIECE CARRIER WITH THERMALLY ISOLATED...
- Publication number 20170250060
- Publication date Aug 31, 2017
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CARRIER WITH INDEPENDENT ISOLATED HEATER ZONES
- Publication number 20160035544
- Publication date Feb 4, 2016
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
QUARTZ UPPER AND LOWER DOMES
- Publication number 20140199056
- Publication date Jul 17, 2014
- Anzhong CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS HEATER
- Publication number 20130058637
- Publication date Mar 7, 2013
- APPLIED MATERIALS, INC.
- Tao Hou
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Apparatus and Process for Atomic Layer Deposition
- Publication number 20120225191
- Publication date Sep 6, 2012
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus And Process For Atomic Layer Deposition
- Publication number 20120225192
- Publication date Sep 6, 2012
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBERS
- Publication number 20120208372
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- KEDARNATH SANGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Process for Atomic Layer Deposition
- Publication number 20120135609
- Publication date May 31, 2012
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION CHAMBER WITH MULTI INJECT
- Publication number 20110223334
- Publication date Sep 15, 2011
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD APPARATUS FOR IMPROVED FILM THICKNESS NON-UNIFORMITY AND PARTIC...
- Publication number 20100294199
- Publication date Nov 25, 2010
- Applied Materials, Inc.
- BINH TRAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF ALIGNING AND POSITIONING A COLD SUBSTRATE O...
- Publication number 20100279516
- Publication date Nov 4, 2010
- Chen-An Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COPPER DEPOSITION CHAMBER HAVING INTEGRATED BEVEL CLEAN WITH EDGE B...
- Publication number 20100218784
- Publication date Sep 2, 2010
- CHEN-AN CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBER
- Publication number 20100048032
- Publication date Feb 25, 2010
- Applied Materials, Inc.
- KEDARNATH SANGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS HEATER
- Publication number 20090283252
- Publication date Nov 19, 2009
- Tao Hou
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Copper deposition chamber having integrated bevel clean with edge b...
- Publication number 20070209684
- Publication date Sep 13, 2007
- APPLIED MATERIALS, INC.
- Chen-An Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual gas faceplate for a showerhead in a semiconductor wafer proces...
- Publication number 20060021703
- Publication date Feb 2, 2006
- APPLIED MATERIALS, INC.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electronically actuated valve
- Publication number 20050229969
- Publication date Oct 20, 2005
- Anh N. Nguyen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Integrated bevel clean chamber
- Publication number 20040206375
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Henry Ho
- B08 - CLEANING
Information Patent Application
Valve control system for atomic layer deposition chamber
- Publication number 20040143370
- Publication date Jul 22, 2004
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Application
Multi-chemistry plating system
- Publication number 20040016637
- Publication date Jan 29, 2004
- APPLIED MATERIALS, INC.
- Michael X. Yang
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Application
Chamber hardware design for titanium nitride atomic layer deposition
- Publication number 20030116087
- Publication date Jun 26, 2003
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition chamber
- Publication number 20030019428
- Publication date Jan 30, 2003
- APPLIED MATERIALS, INC.
- Vincent W. Ku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Valve control system for atomic layer deposition chamber
- Publication number 20020127745
- Publication date Sep 12, 2002
- Siqing Lu
- G05 - CONTROLLING REGULATING
Information Patent Application
Processing chamber and method of distributing process fluids therei...
- Publication number 20020121241
- Publication date Sep 5, 2002
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lid assembly for a processing system to facilitate sequential depos...
- Publication number 20020121342
- Publication date Sep 5, 2002
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION CHAMBER
- Publication number 20010054381
- Publication date Dec 27, 2001
- SALVADOR P UMOTOY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Anh N. Nguyen

Person

Patents Grantslast 30 patents

Plasma processing system workpiece carrier with thermally isolated...

Gas distribution showerhead for semiconductor processing

Gas distribution showerhead for semiconductor processing

Wafer carrier with independent isolated heater zones

Quartz upper and lower domes

Gas heater

CVD apparatus for improved film thickness non-uniformity and partic...

Atomic layer deposition chamber with multi inject

Process gas delivery for semiconductor process chambers

Gas heater

Process gas delivery for semiconductor process chamber

Copper deposition chamber having integrated bevel clean with edge b...

Integrated bevel clean chamber

Multi-chemistry plating system

Electronically actuated valve

Valve control system for atomic layer deposition chamber

Valve control system for atomic layer deposition chamber

Lid assembly for a processing system to facilitate sequential depos...

Ceramic substrate support

High temperature chemical vapor deposition chamber

Local repair of top guide in boiling water reactor by installation...

One-piece dual gas faceplate for a showerhead in a semiconductor wa...

Head for vaporizing and flowing various precursor materials onto se...

Dual gas faceplate for a showerhead in a semiconductor wafer proces...

Reactor optimized for chemical vapor deposition of titanium

Apparatus and methods for repairing jet pump diffusers in a nuclear...

Core differential pressure and liquid control line apparatus in a n...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING CHAMBER ADAPTER

QUARTZ UPPER AND LOWER DOMES

GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING

GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING

PLASMA PROCESSING SYSTEM WORKPIECE CARRIER WITH THERMALLY ISOLATED...

WAFER CARRIER WITH INDEPENDENT ISOLATED HEATER ZONES

QUARTZ UPPER AND LOWER DOMES

GAS HEATER

Apparatus and Process for Atomic Layer Deposition

Apparatus And Process For Atomic Layer Deposition

PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBERS

Apparatus and Process for Atomic Layer Deposition

ATOMIC LAYER DEPOSITION CHAMBER WITH MULTI INJECT

CVD APPARATUS FOR IMPROVED FILM THICKNESS NON-UNIFORMITY AND PARTIC...

APPARATUS AND METHOD OF ALIGNING AND POSITIONING A COLD SUBSTRATE O...

COPPER DEPOSITION CHAMBER HAVING INTEGRATED BEVEL CLEAN WITH EDGE B...

PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBER

GAS HEATER

Copper deposition chamber having integrated bevel clean with edge b...

Dual gas faceplate for a showerhead in a semiconductor wafer proces...

Electronically actuated valve

Integrated bevel clean chamber

Valve control system for atomic layer deposition chamber

Multi-chemistry plating system

Chamber hardware design for titanium nitride atomic layer deposition

Chemical vapor deposition chamber

Valve control system for atomic layer deposition chamber

Processing chamber and method of distributing process fluids therei...

Lid assembly for a processing system to facilitate sequential depos...

HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION CHAMBER