Anthony C. Speranza

Person

Gilbert, SC, US

People

Patents Grantslast 30 patents

Information Patent Grant
Nano deposition and ablation for the repair and fabrication of inte...
- Patent number 10,607,899
- Issue date Mar 31, 2020
- International Business Machines Corporation
- Shawn A. Adderly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nano deposition and ablation for the repair and fabrication of inte...
- Patent number 9,583,401
- Issue date Feb 28, 2017
- International Business Machines Corporation
- Shawn A. Adderly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlled metal extrusion opening in semiconductor structure and m...
- Patent number 9,484,301
- Issue date Nov 1, 2016
- GLOBALFOUNDRIES Inc.
- Max G. Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures with metal lines
- Patent number 9,087,839
- Issue date Jul 21, 2015
- International Business Machines Corporation
- Shawn A. Adderly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled metal extrusion opening in semiconductor structure and m...
- Patent number 9,059,258
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Max G. Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS (complementary metal oxide semiconductor) technology
- Patent number 7,696,037
- Issue date Apr 13, 2010
- International Business Machines Corporation
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS (Complementary metal oxide semiconductor) technology with leak...
- Patent number 7,462,528
- Issue date Dec 9, 2008
- International Business Machines Corporation
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS (complementary metal oxide semiconductor) technology
- Patent number 7,271,044
- Issue date Sep 18, 2007
- International Business Machines Corporation
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a liner in a trench
- Patent number 6,417,070
- Issue date Jul 9, 2002
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
STI fill for SOI which makes SOI inspectable
- Patent number 6,121,064
- Issue date Sep 19, 2000
- International Business Machines Corporation
- Jerome B. Lasky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual work function CMOS device
- Patent number 6,028,339
- Issue date Feb 22, 2000
- International Business Machines Corporation
- Robert O. Frenette
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor
- Patent number 5,985,768
- Issue date Nov 16, 1999
- International Business Machines Corporation
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing dual work function CMOS device
- Patent number 5,770,490
- Issue date Jun 23, 1998
- International Business Machines Corporation
- Robert O. Frenette
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a diffused lightly doped drain device with built i...
- Patent number 5,518,945
- Issue date May 21, 1996
- International Business Machines Corporation
- John A. Bracchitta
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTE...
- Publication number 20170117195
- Publication date Apr 27, 2017
- International Business Machines Corporation
- Shawn A. Adderly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED METAL EXTRUSION OPENING IN SEMICONDUCTOR STRUCTURE AND M...
- Publication number 20150255395
- Publication date Sep 10, 2015
- International Business Machines Corporation
- Max G. Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTE...
- Publication number 20150228548
- Publication date Aug 13, 2015
- International Business Machines Corporation
- Shawn A. Adderly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURES WITH METAL LINES
- Publication number 20140291802
- Publication date Oct 2, 2014
- International Business Machines Corporation
- Shawn A. Adderly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED METAL EXTRUSION OPENING IN SEMICONDUCTOR STRUCTURE AND M...
- Publication number 20140246777
- Publication date Sep 4, 2014
- International Business Machines Corporation
- Max G. Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS (COMPLEMENTARY METAL OXIDE SEMICONDUCTOR) TECHNOLOGY
- Publication number 20080299721
- Publication date Dec 4, 2008
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS (COMPLEMENTARY METAL OXIDE SEMICONDUCTOR) TECHNOLOGY
- Publication number 20070231990
- Publication date Oct 4, 2007
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED CMOS (Complementary Metal Oxide Semiconductor) TECHNOLOGY
- Publication number 20070020830
- Publication date Jan 25, 2007
- International Business Machines Corporation
- Anthony C. Speranza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A LINER IN A TRENCH
- Publication number 20020106906
- Publication date Aug 8, 2002
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS

Anthony C. Speranza

Person

Patents Grantslast 30 patents

Nano deposition and ablation for the repair and fabrication of inte...

Nano deposition and ablation for the repair and fabrication of inte...

Controlled metal extrusion opening in semiconductor structure and m...

Semiconductor structures with metal lines

Controlled metal extrusion opening in semiconductor structure and m...

CMOS (complementary metal oxide semiconductor) technology

CMOS (Complementary metal oxide semiconductor) technology with leak...

CMOS (complementary metal oxide semiconductor) technology

Method for forming a liner in a trench

STI fill for SOI which makes SOI inspectable

Dual work function CMOS device

Method of forming a semiconductor

Method for producing dual work function CMOS device

Method of making a diffused lightly doped drain device with built i...

Patents Applicationslast 30 patents

NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTE...

CONTROLLED METAL EXTRUSION OPENING IN SEMICONDUCTOR STRUCTURE AND M...

NANO DEPOSITION AND ABLATION FOR THE REPAIR AND FABRICATION OF INTE...

SEMICONDUCTOR STRUCTURES WITH METAL LINES

CONTROLLED METAL EXTRUSION OPENING IN SEMICONDUCTOR STRUCTURE AND M...

CMOS (COMPLEMENTARY METAL OXIDE SEMICONDUCTOR) TECHNOLOGY

CMOS (COMPLEMENTARY METAL OXIDE SEMICONDUCTOR) TECHNOLOGY

IMPROVED CMOS (Complementary Metal Oxide Semiconductor) TECHNOLOGY

METHOD FOR FORMING A LINER IN A TRENCH