Ari Aviram

Person

Croton-on-Hudson, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Nanostructure for molecular electronics comprising collinear metal...
- Patent number 8,058,644
- Issue date Nov 15, 2011
- Ari Aviram
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Molecular sensors for explosives
- Patent number 7,824,619
- Issue date Nov 2, 2010
- Ari Aviram
- G01 - MEASURING TESTING
Information Patent Grant
Electrical contacts for molecular electronic transistors
- Patent number 6,989,290
- Issue date Jan 24, 2006
- Ari Aviram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation sensitive silicon-containing negative resists and use the...
- Patent number 6,821,718
- Issue date Nov 23, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers and use thereof
- Patent number 6,689,540
- Issue date Feb 10, 2004
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive silicon-containing negative resists and use the...
- Patent number 6,653,045
- Issue date Nov 25, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective silicon-containing compositions as hardmask layer
- Patent number 6,503,692
- Issue date Jan 7, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organometallic polymers and use thereof
- Patent number 6,458,907
- Issue date Oct 1, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma resistant composition and use thereof
- Patent number 6,436,605
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective silicon-containing compositions as hardmask layer
- Patent number 6,420,088
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mask-making using resist having SIO bond-containing polymer
- Patent number 6,420,084
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
RIE etch resistant nonchemically amplified resist composition and u...
- Patent number 6,348,299
- Issue date Feb 19, 2002
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and use thereof
- Patent number 6,346,362
- Issue date Feb 12, 2002
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High sensitivity, photo-active polymer and developers for high reso...
- Patent number 6,280,901
- Issue date Aug 28, 2001
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-development resist hardening by vapor silylation
- Patent number 6,280,908
- Issue date Aug 28, 2001
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graft polymers and use thereof
- Patent number 6,197,896
- Issue date Mar 6, 2001
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organometallic polymers and use thereof
- Patent number 6,171,757
- Issue date Jan 9, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High sensitivity, photo-active polymer and developers for high reso...
- Patent number 6,100,011
- Issue date Aug 8, 2000
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and use thereof
- Patent number 5,972,571
- Issue date Oct 26, 1999
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High sensitivity, photo-active polymer and developers for high reso...
- Patent number 5,955,242
- Issue date Sep 21, 1999
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compositions for high resolution resist applications
- Patent number 5,908,732
- Issue date Jun 1, 1999
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinone diazo compound containing non-metallic atom
- Patent number 5,644,038
- Issue date Jul 1, 1997
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing a positive pattern utilizing naphtho quinone...
- Patent number 5,567,569
- Issue date Oct 22, 1996
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition containing naphthoquinonediazide compou...
- Patent number 5,552,256
- Issue date Sep 3, 1996
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Interface resistance and knee voltage enhancement in resistive ribb...
- Patent number 4,692,044
- Issue date Sep 8, 1987
- International Business Machines Corporation
- Ari Aviram
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Ribbon transfer color-on-demand resistive ribbon printing
- Patent number 4,609,926
- Issue date Sep 2, 1986
- International Business Machines Corporation
- Ari Aviram
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Color-on-demand ribbon printing
- Patent number 4,577,983
- Issue date Mar 25, 1986
- International Business Machines Corporation
- Ari Aviram
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Thermal transfer printing processes with electroerosion and materia...
- Patent number 4,568,621
- Issue date Feb 4, 1986
- International Business Machines Corporation
- Ari Aviram
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Ink additives for efficient thermal ink transfer printing processes
- Patent number 4,549,824
- Issue date Oct 29, 1985
- International Business Machines Corporation
- Krishna G. Sachdev
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Light induced capacitance changes in donor polymers (or small molec...
- Patent number 4,538,252
- Issue date Aug 27, 1985
- International Business Machines Corporation
- Ari Aviram
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
Electrical contacts for molecular electronic transistors
- Publication number 20050106804
- Publication date May 19, 2005
- Ari Aviram
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation sensitive silicon-containing negative resists and use the...
- Publication number 20040048204
- Publication date Mar 11, 2004
- International Business Machines
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective silicon-containing compositions as hardmask layer
- Publication number 20020187422
- Publication date Dec 12, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive silicon-containing negative resists and use the...
- Publication number 20020115017
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polymers and use thereof
- Publication number 20020090574
- Publication date Jul 11, 2002
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Nanostructure for molecular electronics comprising collinear metal...

Molecular sensors for explosives

Electrical contacts for molecular electronic transistors

Radiation sensitive silicon-containing negative resists and use the...

Polymers and use thereof

Radiation sensitive silicon-containing negative resists and use the...

Antireflective silicon-containing compositions as hardmask layer

Organometallic polymers and use thereof

Plasma resistant composition and use thereof

Antireflective silicon-containing compositions as hardmask layer

Mask-making using resist having SIO bond-containing polymer

RIE etch resistant nonchemically amplified resist composition and u...

Polymers and use thereof

High sensitivity, photo-active polymer and developers for high reso...

Post-development resist hardening by vapor silylation

Graft polymers and use thereof

Organometallic polymers and use thereof

High sensitivity, photo-active polymer and developers for high reso...

Negative resist composition and use thereof

High sensitivity, photo-active polymer and developers for high reso...

Polymer compositions for high resolution resist applications

Quinone diazo compound containing non-metallic atom

Process for producing a positive pattern utilizing naphtho quinone...

Positive resist composition containing naphthoquinonediazide compou...

Interface resistance and knee voltage enhancement in resistive ribb...

Ribbon transfer color-on-demand resistive ribbon printing

Color-on-demand ribbon printing

Thermal transfer printing processes with electroerosion and materia...

Ink additives for efficient thermal ink transfer printing processes

Light induced capacitance changes in donor polymers (or small molec...

Patents Applicationslast 30 patents

Electrical contacts for molecular electronic transistors

Radiation sensitive silicon-containing negative resists and use the...

Antireflective silicon-containing compositions as hardmask layer

Radiation sensitive silicon-containing negative resists and use the...

Polymers and use thereof