Claims
- 1. A resist for producing a positive lithographic pattern when exposed to actinic radiation which comprises poly (2-hydroxypentyl methacrylate).
- 2. The resist of claim 1 wherein the poly (2-hydroxypentyl methacrylate) has a weight average molecular weight of about 104 to about 106.
- 3. The resist of claim 1 wherein the poly (2-hydroxypentyl methacrylate) has a weight average molecular weight of about 50,000 to about 650,000.
- 4. The resist of claim 3 wherein the poly (2-hydroxypentyl methacrylate) has a Tg of up to about 70° C.
- 5. The resist of claim 1 wherein the poly (2-hydroxypentyl methacrylate) has a Tg of up to about 70° C.
- 6. A resist for producing a positive lithographic pattern when exposed to actinic radiation which comprises poly (2-hydroxypentyl acrylate).
- 7. The resist of claim 6 wherein the poly (2-hydroxypentyl acrylate) has a weight average molecular weight of about 104 to about 106.
- 8. The resist of claim 6 wherein the poly (2-hydroxypentyl acrylate) has a weight average molecular weight of about 50,000 to about 650,000.
- 9. The resist of claim 8 wherein the poly (2-hydroxypentyl acrylate) has a Tg of up to about 70° C.
- 10. The resist of claim 6 wherein the poly (2-hydroxypentyl acrylate) has a Tg of up to about 70° C.
CROSS-REFERENCE TO RELATED APPLICATION
This application is a divisional of U.S. patent application Ser. No. 09/179,423 filed Oct. 27, 1998 now U.S. Pat. No. 6,100,011, which is a divisional of U.S. patent application Ser. No. 08/700,348 filed Sep. 23, 1996, now U.S. Pat. No. 5,955,242.
US Referenced Citations (4)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0 674 224A1 |
Sep 1995 |
EP |
0 702 271A1 |
Mar 1996 |
EP |
Non-Patent Literature Citations (1)
Entry |
Nuguist et al, Vibrational Spectroscopy vol. 8, (1994), pp. 71-85. |