Number | Name | Date | Kind |
---|---|---|---|
2976576 | Wichterle et al. | Apr 1961 | |
3220960 | Wichterle | Nov 1965 | |
3535137 | Haller et al. | Oct 1970 | |
3620726 | Chu | Nov 1971 | |
3669660 | Golda et al. | Jun 1972 | |
3758448 | Stamberger | Sep 1973 | |
4011351 | Gipstein et al. | Mar 1977 | |
4262082 | Rosenkranz | Apr 1981 | |
4293636 | Okuya | Oct 1981 | |
4355093 | Hartmann et al. | Oct 1982 | |
4458008 | Konstantinov et al. | Jul 1984 | |
4652604 | Walls et al. | Mar 1987 | |
4707437 | Walls et al. | Nov 1987 | |
4806450 | Hofmann et al. | Feb 1989 | |
5035982 | Walls | Jul 1991 | |
5147759 | Ohtawa et al. | Sep 1992 | |
5155011 | Zertani et al. | Oct 1992 | |
5164286 | Blakeney et al. | Nov 1992 | |
5200291 | Wanat | Apr 1993 | |
5212047 | Hertler et al. | May 1993 | |
5229245 | Lin et al. | Jul 1993 | |
5368982 | Suzuki et al. | Nov 1994 | |
5374500 | Carpenter, Jr. et al. | Dec 1994 | |
5420171 | Unruh | May 1995 | |
5506088 | Nozaki et al. | Apr 1996 |
Number | Date | Country |
---|---|---|
0674224A1 | Sep 1995 | EPX |
0702271A1 | Mar 1996 | EPX |
63-69786 | Sep 1989 | JPX |
Entry |
---|
Method to Remove Positive Photoresist Stains from Garments, Mar. 1991, Research Disclosure n434-03-91. |
Tadao et al., Photoengraving Method, Jap. 62-264053, 1987, Abstract. |
RN 25249-16-5, Registry Copyright 1997 ACS, Computer Printout. 1 page. |
Bohumil Bednar et al, Resists in Microlithography and Printing, Materials Science Monographs: 76, 2nd revised Ed, Elsevier, Amsterdam, 1993, pp. 84-86. |