Membership
Tour
Register
Log in
Asao Isobe
Follow
Person
Hitachi, JP
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Method of forming pattern and making semiconductor device using rad...
Patent number
5,441,849
Issue date
Aug 15, 1995
Hitachi, Ltd.
Hiroshi Shiraishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive quinone diazide and resin composition having high ab...
Patent number
5,314,783
Issue date
May 24, 1994
Hitachi Chemical Co., Ltd.
Shigeru Koibuchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition and pattern formation using the same
Patent number
5,215,858
Issue date
Jun 1, 1993
Hitachi Chemical Company, Ltd.
Shigeru Koibuchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for producing a pattern with negative-type photosensitive c...
Patent number
4,801,519
Issue date
Jan 31, 1989
Hitachi Chemical Company Ltd.
Shigeru Koibuchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for producing fine patterns
Patent number
4,722,883
Issue date
Feb 2, 1988
Hitachi, Ltd.
Shigeru Koibuchi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Photosensitive composition with 4-azido-2'-methoxychalcone
Patent number
4,698,291
Issue date
Oct 6, 1987
Hitachi Chemical Co., Ltd.
Shigeru Koibuchi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Photosensitive resin composition and method for forming fine patter...
Patent number
4,554,237
Issue date
Nov 19, 1985
Hitach, Ltd.
Fumio Kataoka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Electron beam or X-ray reactive image-formable resinous composition
Patent number
4,513,077
Issue date
Apr 23, 1985
Hitachi Chemical Company, Ltd.
Asao Isobe
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Soldering mask formed from a photosensitive resin composition and a...
Patent number
4,499,163
Issue date
Feb 12, 1985
Hitachi Chemical Company, Ltd.
Toshiaki Ishimaru
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photo-curable coating compositions for building materials
Patent number
4,295,947
Issue date
Oct 20, 1981
Hitachi Chemical Company, Ltd.
Eiichi Ohtani
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Water-dispersible epoxy modified alkyd resins
Patent number
4,154,709
Issue date
May 15, 1979
Hitachi Chemical Company, Ltd.
Ryoji Ukita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Monofunctional monomer-containing photosensitive composition for ph...
Patent number
4,108,666
Issue date
Aug 22, 1978
Hitachi Chemical Co., Ltd.
Nobuyuki Hayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of an apparatus for producing film-laminated base plates
Patent number
4,101,364
Issue date
Jul 18, 1978
Hitachi Chemical Company, Ltd.
Katsushige Tsukada
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL