Babak Kadkhodayan

Person

Oakland, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Edge ring assembly with dielectric spacer ring
- Patent number 8,911,589
- Issue date Dec 16, 2014
- Lam Research Corporation
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local plasma confinement and pressure control arrangement and metho...
- Patent number 8,900,398
- Issue date Dec 2, 2014
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform etch system
- Patent number 8,801,892
- Issue date Aug 12, 2014
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring assembly with dielectric spacer ring
- Patent number 8,500,953
- Issue date Aug 6, 2013
- Lam Research Corporation
- Jeremy Chang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hollow anode plasma reactor and method
- Patent number 8,465,620
- Issue date Jun 18, 2013
- Lam Research
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead electrode with centering feature
- Patent number 8,402,918
- Issue date Mar 26, 2013
- Lam Research Corporation
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clamped showerhead electrode assembly
- Patent number 8,313,805
- Issue date Nov 20, 2012
- Lam Research Corporation
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead electrode
- Patent number 8,206,506
- Issue date Jun 26, 2012
- Lam Research Corporation
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clamped showerhead electrode assembly
- Patent number 8,161,906
- Issue date Apr 24, 2012
- Lam Research Corporation
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform etch system
- Patent number 7,371,332
- Issue date May 13, 2008
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system with tuning gas
- Patent number 7,169,231
- Issue date Jan 30, 2007
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow anode plasma reactor and method
- Patent number 6,974,523
- Issue date Dec 13, 2005
- Lam Research Corporation
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system apparatus, and method for delivering RF po...
- Patent number 6,242,360
- Issue date Jun 5, 2001
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chemistry resistant manometer
- Patent number 6,132,513
- Issue date Oct 17, 2000
- Lam Research Corporation
- Babak Kadkhodayan
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
EDGE RING ASSEMBLY WITH DIELECTRIC SPACER RING
- Publication number 20130292056
- Publication date Nov 7, 2013
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY
- Publication number 20120171872
- Publication date Jul 5, 2012
- LAM RESEARCH CORPORATION
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL PLASMA CONFINEMENT AND PRESSURE CONTROL ARRANGEMENT AND METHO...
- Publication number 20110108524
- Publication date May 12, 2011
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT-UP PREVENTION IN ELECTROSTATIC CHUCKS
- Publication number 20110024049
- Publication date Feb 3, 2011
- LAM RESEARCH CORPORATION
- Tom Stevenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD ELECTRODE WITH CENTERING FEATURE
- Publication number 20100252197
- Publication date Oct 7, 2010
- Lam Reseach Corporation
- BABAK KADKHODAYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Showerhead electrode
- Publication number 20100000683
- Publication date Jan 7, 2010
- LAM RESEARCH CORPORATION
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Clamped showerhead electrode assembly
- Publication number 20100003824
- Publication date Jan 7, 2010
- LAM RESEARCH CORPORATION
- Babak Kadkhodayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY WITH DIELECTRIC SPACER RING
- Publication number 20090186487
- Publication date Jul 23, 2009
- LAM RESEARCH CORPORATION
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Yttria insulator ring for use inside a plasma chamber
- Publication number 20090090695
- Publication date Apr 9, 2009
- LAM RESEARCH CORPORATION
- Babak Kadkhodayan
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
HOLLOW ANODE PLASMA REACTOR AND METHOD
- Publication number 20080271849
- Publication date Nov 6, 2008
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM ETCH SYSTEM
- Publication number 20080210377
- Publication date Sep 4, 2008
- LAM RESEARCH CORPORATION
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Edge ring assembly with dielectric spacer ring
- Publication number 20070032081
- Publication date Feb 8, 2007
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Yttria insulator ring for use inside a plasma chamber
- Publication number 20060043067
- Publication date Mar 2, 2006
- Lam Research Corporation
- Babak Kadkhodayan
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Hollow anode plasma reactor and method
- Publication number 20060027328
- Publication date Feb 9, 2006
- Lam Research Corporation
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pretreated gas distribution plate
- Publication number 20040244685
- Publication date Dec 9, 2004
- Lam Research Corporation
- Anthony J. Ricci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniform etch system
- Publication number 20040112540
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- G05 - CONTROLLING REGULATING
Information Patent Application
Gas distribution system with tuning gas
- Publication number 20040112538
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniform etch system
- Publication number 20040112539
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hollow anode plasma reactor and method
- Publication number 20020170881
- Publication date Nov 21, 2002
- LAM RESEARCH
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS

Babak Kadkhodayan

Person

Patents Grantslast 30 patents

Edge ring assembly with dielectric spacer ring

Local plasma confinement and pressure control arrangement and metho...

Uniform etch system

Edge ring assembly with dielectric spacer ring

Hollow anode plasma reactor and method

Showerhead electrode with centering feature

Clamped showerhead electrode assembly

Showerhead electrode

Clamped showerhead electrode assembly

Uniform etch system

Gas distribution system with tuning gas

Hollow anode plasma reactor and method

Plasma processing system apparatus, and method for delivering RF po...

Process chemistry resistant manometer

Patents Applicationslast 30 patents

EDGE RING ASSEMBLY WITH DIELECTRIC SPACER RING

CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY

LOCAL PLASMA CONFINEMENT AND PRESSURE CONTROL ARRANGEMENT AND METHO...

LIGHT-UP PREVENTION IN ELECTROSTATIC CHUCKS

SHOWERHEAD ELECTRODE WITH CENTERING FEATURE

Showerhead electrode

Clamped showerhead electrode assembly

EDGE RING ASSEMBLY WITH DIELECTRIC SPACER RING

Yttria insulator ring for use inside a plasma chamber

HOLLOW ANODE PLASMA REACTOR AND METHOD

UNIFORM ETCH SYSTEM

Edge ring assembly with dielectric spacer ring

Yttria insulator ring for use inside a plasma chamber

Hollow anode plasma reactor and method

Pretreated gas distribution plate

Uniform etch system

Gas distribution system with tuning gas

Uniform etch system

Hollow anode plasma reactor and method