Bart van Schravendijk

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low stress films for advanced semiconductor applications
- Patent number 12,341,002
- Issue date Jun 24, 2025
- Lam Research Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 12,261,038
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bubble defect reduction
- Patent number 12,248,252
- Issue date Mar 11, 2025
- Lam Research Corporation
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing doped silicon using a diffusion barrier layer
- Patent number 12,125,705
- Issue date Oct 22, 2024
- Lam Research Corporation
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to create air gaps
- Patent number 12,112,980
- Issue date Oct 8, 2024
- Lam Research Corporation
- Patrick A. Van Cleemput
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stop layer
- Patent number 12,087,572
- Issue date Sep 10, 2024
- Lam Research Corporation
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of oxidation profile for substrate processing
- Patent number 12,087,573
- Issue date Sep 10, 2024
- Lam Research Corporation
- Gerald Joseph Brady
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidative conversion in atomic layer deposition processes
- Patent number 12,087,574
- Issue date Sep 10, 2024
- Lam Research Corporation
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...
- Patent number 12,049,699
- Issue date Jul 30, 2024
- Lam Research Corporation
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 12,051,589
- Issue date Jul 30, 2024
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective carbon deposition
- Patent number 12,037,686
- Issue date Jul 16, 2024
- Lam Research Corporation
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitride films with improved etch selectivity for 3D NAND integration
- Patent number 12,040,180
- Issue date Jul 16, 2024
- Lam Research Corporation
- Pramod Subramonium
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulated atomic layer deposition
- Patent number 12,040,181
- Issue date Jul 16, 2024
- Lam Research Corporation
- Chan Myae Myae Soe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Minimizing radical recombination using ALD silicon oxide surface co...
- Patent number 11,920,239
- Issue date Mar 5, 2024
- Lam Research Corporation
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,784,047
- Issue date Oct 10, 2023
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to create air gaps
- Patent number 11,637,037
- Issue date Apr 25, 2023
- Lam Research Corporation
- Patrick van Cleemput
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...
- Patent number 11,293,098
- Issue date Apr 5, 2022
- Lam Research Corporation
- Joseph Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,183,383
- Issue date Nov 23, 2021
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 11,133,180
- Issue date Sep 28, 2021
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to create air gaps
- Patent number 11,088,019
- Issue date Aug 10, 2021
- Lam Research Corporation
- Patrick A. Van Cleemput
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical source design for remote plasma atomic layer deposition
- Patent number 11,053,587
- Issue date Jul 6, 2021
- Novellus Systems, Inc.
- Bart J. van Schravendijk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gap fill using carbon-based films
- Patent number 11,049,716
- Issue date Jun 29, 2021
- Lam Research Corporation
- Wei Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,031,245
- Issue date Jun 8, 2021
- Lan Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for deposition and etch in gap fill
- Patent number 10,957,514
- Issue date Mar 23, 2021
- Lam Research Corporation
- Akhil Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective inhibition in atomic layer deposition of silicon-containi...
- Patent number 10,804,099
- Issue date Oct 13, 2020
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of encapsulation
- Patent number 10,763,107
- Issue date Sep 1, 2020
- Lam Research Corporation
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometrically selective deposition of a dielectric film
- Patent number 10,763,108
- Issue date Sep 1, 2020
- Lam Research Corporation
- Dennis M. Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective atomic layer deposition with post-dose treatment
- Patent number 10,679,848
- Issue date Jun 9, 2020
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of SiN on horizontal surfaces
- Patent number 10,615,169
- Issue date Apr 7, 2020
- Lam Research Corporation
- Bart J. van Schravendijk
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
BUBBLE DEFECT REDUCTION
- Publication number 20250216788
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES
- Publication number 20250207246
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Ian John CURTIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM-FREE AND CRACK-FREE DEPOSITION
- Publication number 20250188609
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL FILM DEPOSITION
- Publication number 20250166989
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Jason Alexander Varnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF GRAPHENE ON COBALT-CAPPED COPPER DUAL DAMAS...
- Publication number 20250096036
- Publication date Mar 20, 2025
- LAM RESEARCH CORPORATION
- Asish Parbatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASING DEPOSITION RATES OF OXIDE FILMS
- Publication number 20250087481
- Publication date Mar 13, 2025
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE DEPOSITION
- Publication number 20250069882
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PRESSURE PLASMA INHIBITION
- Publication number 20250062118
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TE...
- Publication number 20250054751
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON NITRIDE
- Publication number 20250054747
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROVIDING DOPED SILICON USING A DIFFUSION BARRIER LAYER
- Publication number 20250046613
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Purushottam KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF
- Publication number 20250014890
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO CREATE AIR GAPS
- Publication number 20240429091
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Patrick A. Van Cleemput
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILA...
- Publication number 20240410053
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULATION OF OXIDATION PROFILE FOR SUBSTRATE PROCESSING
- Publication number 20240404822
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Gerald Joseph Brady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING
- Publication number 20240387226
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Aaron Blake MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE CARBON DEPOSITION
- Publication number 20240368761
- Publication date Nov 7, 2024
- LAM RESEARCH CORPORATION
- Awnish GUPTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULATED ATOMIC LAYER DEPOSITION
- Publication number 20240332007
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Chan Myae Myae Soe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...
- Publication number 20240218509
- Publication date Jul 4, 2024
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRAPHENE-CAPPED COPPER IN DUAL DAMASCENE INTERCONNECT
- Publication number 20240213159
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Asish Parbatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU FILM ANNEALING IN SUBSTRATE PROCESSING
- Publication number 20240167153
- Publication date May 23, 2024
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240030031
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20230366094
- Publication date Nov 16, 2023
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPURITY REDUCTION IN SILICON-CONTAINING FILMS
- Publication number 20230317449
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCING INTRALEVEL CAPACITANCE IN SEMICONDUCTOR DEVICES
- Publication number 20230307290
- Publication date Sep 28, 2023
- LAM RESEARCH CORPORATION
- Joseph R. ABEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPO...
- Publication number 20230245896
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL
- Publication number 20230175117
- Publication date Jun 8, 2023
- LAM RESEARCH CORPORATION
- Dustin Zachary AUSTIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULATION OF OXIDATION PROFILE FOR SUBSTRATE PROCESSING
- Publication number 20230005740
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Gerald Joseph Brady
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE CARBON DEPOSITION
- Publication number 20220235464
- Publication date Jul 28, 2022
- LAM RESEARCH CORPORATION
- Awnish GUPTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Bart van Schravendijk

Person

Patents Grantslast 30 patents

Low stress films for advanced semiconductor applications

Gapfill of variable aspect ratio features with a composite PEALD an...

Bubble defect reduction

Method for providing doped silicon using a diffusion barrier layer

Method to create air gaps

Etch stop layer

Modulation of oxidation profile for substrate processing

Oxidative conversion in atomic layer deposition processes

Film stack simplification for high aspect ratio patterning and vert...

Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...

Tin oxide thin film spacers in semiconductor device manufacturing

Selective carbon deposition

Nitride films with improved etch selectivity for 3D NAND integration

Modulated atomic layer deposition

Minimizing radical recombination using ALD silicon oxide surface co...

Tin oxide thin film spacers in semiconductor device manufacturing

Method to create air gaps

Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...

Tin oxide thin film spacers in semiconductor device manufacturing

Gapfill of variable aspect ratio features with a composite PEALD an...

Method to create air gaps

Radical source design for remote plasma atomic layer deposition

Gap fill using carbon-based films

Tin oxide thin film spacers in semiconductor device manufacturing

Apparatus and method for deposition and etch in gap fill

Selective inhibition in atomic layer deposition of silicon-containi...

Methods of encapsulation

Geometrically selective deposition of a dielectric film

Selective atomic layer deposition with post-dose treatment

Selective deposition of SiN on horizontal surfaces

Patents Applicationslast 30 patents

BUBBLE DEFECT REDUCTION

REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES

SEAM-FREE AND CRACK-FREE DEPOSITION

THERMAL FILM DEPOSITION

SELECTIVE DEPOSITION OF GRAPHENE ON COBALT-CAPPED COPPER DUAL DAMAS...

INCREASING DEPOSITION RATES OF OXIDE FILMS

SILICON NITRIDE DEPOSITION

HIGH PRESSURE PLASMA INHIBITION

ALD PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TE...

CONFORMAL DEPOSITION OF SILICON NITRIDE

METHOD FOR PROVIDING DOPED SILICON USING A DIFFUSION BARRIER LAYER

CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF

METHOD TO CREATE AIR GAPS

CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILA...

MODULATION OF OXIDATION PROFILE FOR SUBSTRATE PROCESSING

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING

SELECTIVE CARBON DEPOSITION

MODULATED ATOMIC LAYER DEPOSITION

MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...

GRAPHENE-CAPPED COPPER IN DUAL DAMASCENE INTERCONNECT

IN-SITU FILM ANNEALING IN SUBSTRATE PROCESSING

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

IMPURITY REDUCTION IN SILICON-CONTAINING FILMS

REDUCING INTRALEVEL CAPACITANCE IN SEMICONDUCTOR DEVICES

CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPO...

SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL

MODULATION OF OXIDATION PROFILE FOR SUBSTRATE PROCESSING

SELECTIVE CARBON DEPOSITION