Bea-Jane L. Yang

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Yorktown Heights, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions of controlled dissolution rate in alkaline...
- Patent number 4,980,264
- Issue date Dec 25, 1990
- International Business Machines Corporation
- Kaolin N. Chiong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned resist and process
- Patent number 4,737,425
- Issue date Apr 12, 1988
- International Business Machines Corporation
- Burn J. Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Formation of etch-resistant resists through preferential permeation
- Patent number 4,613,398
- Issue date Sep 23, 1986
- International Business Machines Corporation
- Kaolin N. Chiong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY