Number | Name | Date | Kind |
---|---|---|---|
3652274 | Verest et al. | Mar 1972 | |
3934057 | Moreau et al. | Jan 1976 | |
3984582 | Feder et al. | Oct 1976 | |
4007047 | Kaplan et al. | Feb 1977 | |
4125650 | Chiu et al. | Nov 1978 | |
4180604 | Feng et al. | Dec 1979 | |
4211834 | Lapadula et al. | Jul 1980 | |
4289573 | Economy et al. | Sep 1981 | |
4307178 | Kaplan et al. | Dec 1981 | |
4373043 | Yagi et al. | Feb 1983 | |
4396704 | Taylor | Aug 1983 | |
4426247 | Tamamura et al. | Jan 1984 | |
4430153 | Gleason et al. | Feb 1984 | |
4489200 | Dziark | Dec 1984 | |
4493855 | Sachdev et al. | Jan 1985 | |
4502916 | Umezaki et al. | Mar 1985 | |
4521274 | Reichmanis et al. | Jun 1985 | |
4551418 | Hult et al. | Nov 1985 | |
4552833 | Ito et al. | Nov 1985 | |
4596761 | Brault | Jun 1986 | |
4613398 | Chiong et al. | Sep 1986 |
Number | Date | Country |
---|---|---|
7719 | Sep 1975 | JPX |
129214 | Oct 1981 | JPX |
1246704 | Sep 1971 | GBX |
1367830 | Sep 1974 | GBX |
1520466 | Aug 1978 | GBX |
2154330 | Sep 1985 | GBX |
Entry |
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Practicing the Novolac Deep-UV Portable Conformable Masking Technique, B. J. Lin et al., J. Vac. Sci. Technol., 19(4), Nov. Dec. 1981, pp. 1313-1319. |
A Practical Multilayer Resist Process for .mu.m Lines, Thomas Batchelder et al., Semiconductor International. |