Bhargav Citla

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective etch using material modification and RF pulsing
- Patent number 12,057,329
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for depositing dielectric material
- Patent number 11,972,943
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Bhargav S. Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directional selective deposition
- Patent number 11,862,458
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive patterning of semiconductor film stacks
- Patent number 11,798,606
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- John O. Dukovic
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods for depositing dielectric material
- Patent number 11,631,591
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming amorphous carbon hard mask layers and hard mask...
- Patent number 11,581,183
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Bhargav S. Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon carbonitride gapfill with tunable carbon content
- Patent number 11,566,325
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Mei-Yee Shek
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Methods for depositing dielectric material
- Patent number 11,114,306
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Bhargav Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Additive patterning of semiconductor film stacks
- Patent number 11,049,537
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- John O. Dukovic
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods for film modification
- Patent number 11,049,731
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Erica Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming amorphous carbon hard mask layers and hard mask...
- Patent number 10,950,429
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density, low stress amorphous carbon film, and process and equ...
- Patent number 10,858,727
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve film quality for PVD carbon with reactive gas and...
- Patent number 10,570,506
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Bhargav Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch using material modification and RF pulsing
- Patent number 9,865,484
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate electrode material residual removal process
- Patent number 9,640,385
- Issue date May 2, 2017
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
- Publication number 20240331975
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Shuchi Sunil Ojha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE FILL FOR SILICON GAP FILL PROCESSES
- Publication number 20240234128
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Taiki Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE FILL USING HIGH DENSITY PLASMA
- Publication number 20240234131
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Purvam Dineshbhai Modi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING FILMS WITH IMPROVED FILM QUALITY
- Publication number 20240038527
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE SILICON OXIDE GAP FILL
- Publication number 20230386829
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Soham Asrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE DEPOSITION
- Publication number 20230377875
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE DEPOSITION
- Publication number 20230071366
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON CARBONITRIDE GAPFILL WITH TUNABLE CARBON CONTENT
- Publication number 20230066497
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Mei-Yee Shek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CURING DIELECTRIC MATERIAL
- Publication number 20220351969
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Bhargav Sridhar CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220298636
- Publication date Sep 22, 2022
- Soham Sunjay ASRANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220301867
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Jethro TANNOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20210384040
- Publication date Dec 9, 2021
- Bhargav S. CITLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE PATTERNING OF SEMICONDUCTOR FILM STACKS
- Publication number 20210305501
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- John O. DUKOVIC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING AMORPHOUS CARBON HARD MASK LAYERS AND HARD MASK...
- Publication number 20210193461
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- Bhargav S. CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon Carbonitride Gapfill With Tunable Carbon Content
- Publication number 20210189555
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- Mei-Yee Shek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20210090883
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Bhargav S. Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADDITIVE PATTERNING OF SEMICONDUCTOR FILM STACKS
- Publication number 20210035619
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- John O. DUKOVIC
- G11 - INFORMATION STORAGE
Information Patent Application
Methods For Film Modification
- Publication number 20200105541
- Publication date Apr 2, 2020
- Applied Materials, Inc.
- Erica Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20200090946
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Bhargav S. CITLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING AMORPHOUS CARBON HARD MASK LAYERS AND HARD MASK...
- Publication number 20190348283
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Bhargav S. CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...
- Publication number 20190127842
- Publication date May 2, 2019
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING
- Publication number 20190088457
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND...
- Publication number 20180209037
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Bhargav CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING
- Publication number 20180082861
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...
- Publication number 20180051368
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING
- Publication number 20180005850
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE ELECTRODE MATERIAL RESIDUAL REMOVAL PROCESS
- Publication number 20160240385
- Publication date Aug 18, 2016
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS

Bhargav Citla

Person

Patents Grantslast 30 patents

Selective etch using material modification and RF pulsing

Methods and apparatus for depositing dielectric material

Methods and apparatus for processing a substrate

Directional selective deposition

Additive patterning of semiconductor film stacks

Methods for depositing dielectric material

Methods of forming amorphous carbon hard mask layers and hard mask...

Silicon carbonitride gapfill with tunable carbon content

Methods for depositing dielectric material

Additive patterning of semiconductor film stacks

Methods for film modification

Methods of forming amorphous carbon hard mask layers and hard mask...

High density, low stress amorphous carbon film, and process and equ...

Method to improve film quality for PVD carbon with reactive gas and...

Selective etch using material modification and RF pulsing

Gate electrode material residual removal process

Patents Applicationslast 30 patents

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES

DIRECTIONAL SELECTIVE FILL FOR SILICON GAP FILL PROCESSES

DIRECTIONAL SELECTIVE FILL USING HIGH DENSITY PLASMA

FORMING FILMS WITH IMPROVED FILM QUALITY

LOW TEMPERATURE SILICON OXIDE GAP FILL

DIRECTIONAL SELECTIVE DEPOSITION

DIRECTIONAL SELECTIVE DEPOSITION

SILICON CARBONITRIDE GAPFILL WITH TUNABLE CARBON CONTENT

METHODS AND APPARATUS FOR CURING DIELECTRIC MATERIAL

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS FOR DEPOSITING DIELECTRIC MATERIAL

ADDITIVE PATTERNING OF SEMICONDUCTOR FILM STACKS

METHODS OF FORMING AMORPHOUS CARBON HARD MASK LAYERS AND HARD MASK...

Silicon Carbonitride Gapfill With Tunable Carbon Content

METHODS AND APPARATUS FOR DEPOSITING DIELECTRIC MATERIAL

ADDITIVE PATTERNING OF SEMICONDUCTOR FILM STACKS

Methods For Film Modification

METHODS FOR DEPOSITING DIELECTRIC MATERIAL

METHODS OF FORMING AMORPHOUS CARBON HARD MASK LAYERS AND HARD MASK...

PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...

SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING

METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND...

SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING

HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...

SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING

GATE ELECTRODE MATERIAL RESIDUAL REMOVAL PROCESS