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last 30 patents
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Patent Grant
Plasma immersion ion implantation reactor with extended cathode pro...
Patent number
8,900,405
Issue date
Dec 2, 2014
Applied Materials, Inc.
Peter I. Porshnev
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation method using a pure or nearly pur...
Patent number
8,168,519
Issue date
May 1, 2012
Applied Materials, Inc.
Shijian Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Removal of surface dopants from a substrate
Patent number
7,989,329
Issue date
Aug 2, 2011
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation method using a pure or nearly pur...
Patent number
7,968,439
Issue date
Jun 28, 2011
Applied Materials, Inc.
Shijian Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma immersed ion implantation process
Patent number
7,732,309
Issue date
Jun 8, 2010
Applied Materials, Inc.
Shijian Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process using a plasma source hav...
Patent number
7,700,465
Issue date
Apr 20, 2010
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
RF measurement feedback control and diagnostics for a plasma immers...
Patent number
7,666,464
Issue date
Feb 23, 2010
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Semiconductor on insulator vertical transistor fabrication and dopi...
Patent number
7,642,180
Issue date
Jan 5, 2010
Applied Materials, Inc.
Amir Al-Bayati
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process
Patent number
7,465,478
Issue date
Dec 16, 2008
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor substrate process using an optically writable carbon-...
Patent number
7,429,532
Issue date
Sep 30, 2008
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
O-ringless tandem throttle valve for a plasma reactor chamber
Patent number
7,428,915
Issue date
Sep 30, 2008
Applied Materials, Inc.
Andrew Nguyen
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Process for low temperature plasma deposition of an optical absorpt...
Patent number
7,422,775
Issue date
Sep 9, 2008
Applied Materials, Inc.
Kartik Ramaswamy
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Low temperature CVD process with selected stress of the CVD layer o...
Patent number
7,393,765
Issue date
Jul 1, 2008
Applied Materials, Inc.
Hiroji Hanawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Copper conductor annealing process employing high speed optical ann...
Patent number
7,335,611
Issue date
Feb 26, 2008
Applied Materials, Inc.
Kartik Ramaswamy
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Semiconductor substrate process using a low temperature deposited c...
Patent number
7,323,401
Issue date
Jan 29, 2008
Applied Materials, Inc.
Kartik Ramaswamy
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma immersion ion implantation system including a plasma source...
Patent number
7,320,734
Issue date
Jan 22, 2008
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low temperature plasma deposition process for carbon layer deposition
Patent number
7,312,162
Issue date
Dec 25, 2007
Applied Materials, Inc.
Kartik Ramaswamy
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Copper barrier reflow process employing high speed optical annealing
Patent number
7,312,148
Issue date
Dec 25, 2007
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process using an inductively coup...
Patent number
7,303,982
Issue date
Dec 4, 2007
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor on insulator vertical transistor fabrication and dopi...
Patent number
7,294,563
Issue date
Nov 13, 2007
Applied Materials, Inc.
Amir Al-Bayati
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
Patent number
7,292,428
Issue date
Nov 6, 2007
Applied Materials, Inc.
Hiroji Hanawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process using a capacitively coup...
Patent number
7,291,545
Issue date
Nov 6, 2007
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process
Patent number
7,288,491
Issue date
Oct 30, 2007
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Very low temperature CVD process with independently variable confor...
Patent number
7,223,676
Issue date
May 29, 2007
Applied Materials, Inc.
Hiroji Hanawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Silicon-on-insulator wafer transfer method using surface activation...
Patent number
7,183,177
Issue date
Feb 27, 2007
Applied Materials, Inc.
Amir Al-Bayati
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for ion implanting insulator material to reduce dielectric c...
Patent number
7,166,524
Issue date
Jan 23, 2007
Applied Materials, Inc.
Amir Al-Bayati
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation apparatus including a plasma sour...
Patent number
7,137,354
Issue date
Nov 21, 2006
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor junction formation process including low temperature...
Patent number
7,109,098
Issue date
Sep 19, 2006
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process
Patent number
7,094,670
Issue date
Aug 22, 2006
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma immersion ion implantation process using a capacitively coup...
Patent number
7,037,813
Issue date
May 2, 2006
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE
Publication number
20110256691
Publication date
Oct 20, 2011
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA IMMERSION ION IMPLANTATION METHOD USING A PURE OR NEARLY PUR...
Publication number
20110207307
Publication date
Aug 25, 2011
Applied Materials, Inc.
Shijian Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma immersion ion implantation method using a pure or nearly pur...
Publication number
20090197401
Publication date
Aug 6, 2009
Applied Materials, Inc.
Shijian Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE
Publication number
20090162996
Publication date
Jun 25, 2009
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma immersion ion implantation reactor with extended cathode pro...
Publication number
20090120367
Publication date
May 14, 2009
Applied Materials, Inc.
Peter I. Porshnev
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA IMMERSED ION IMPLANTATION PROCESS
Publication number
20080138967
Publication date
Jun 12, 2008
Shijian Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Semiconductor on insulator vertical transistor fabrication and dopi...
Publication number
20080044960
Publication date
Feb 21, 2008
APPLIED MATERIALS, INC.
Amir Al-Bayati
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Low temperature CVD process with selected stress of the CVD layer o...
Publication number
20070212811
Publication date
Sep 13, 2007
APPLIED MATERIALS, INC.
Hiroji Hanawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma immersion ion implantation apparatus including a capacitivel...
Publication number
20070119546
Publication date
May 31, 2007
APPLIED MATERIALS, INC.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ION IMPLANTED INSULATOR MATERIAL WITH REDUCED DIELECTRIC CONSTANT
Publication number
20070042580
Publication date
Feb 22, 2007
Amir Al-Bayati
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Copper barrier reflow process employing high speed optical annealing
Publication number
20070032004
Publication date
Feb 8, 2007
APPLIED MATERIALS, INC.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Semiconductor substrate process using a low temperature deposited c...
Publication number
20070032054
Publication date
Feb 8, 2007
APPLIED MATERIALS, INC.
Kartik Ramaswamy
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Semiconductor substrate process using an optically writable carbon-...
Publication number
20070032082
Publication date
Feb 8, 2007
APPLIED MATERIALS, INC.
Kartik Ramaswamy
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Copper conductor annealing process employing high speed optical ann...
Publication number
20070032095
Publication date
Feb 8, 2007
APPLIED MATERIALS, INC.
Kartik Ramaswamy
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Application
Low temperature absorption layer deposition and high speed optical...
Publication number
20060260545
Publication date
Nov 23, 2006
Kartik Ramaswamy
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Low temperature plasma deposition process for carbon layer deposition
Publication number
20060264060
Publication date
Nov 23, 2006
Kartik Ramaswamy
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Process for low temperature plasma deposition of an optical absorpt...
Publication number
20060263540
Publication date
Nov 23, 2006
Kartik Ramaswamy
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
Publication number
20060238953
Publication date
Oct 26, 2006
Hiroji Hanawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
O-ringless tandem throttle valve for a plasma reactor chamber
Publication number
20060237136
Publication date
Oct 26, 2006
Andrew Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RF measurement feedback control and diagnostics for a plasma immers...
Publication number
20060088655
Publication date
Apr 27, 2006
APPLIED MATERIALS, INC.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma immersion ion implantation process
Publication number
20060081558
Publication date
Apr 20, 2006
APPLIED MATERIALS, INC.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma immersion ion implantation process using a capacitively coup...
Publication number
20060073683
Publication date
Apr 6, 2006
APPLIED MATERIALS, INC.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma immersion ion implantation apparatus
Publication number
20050230047
Publication date
Oct 20, 2005
APPLIED MATERIALS, INC.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma immersion ion implantation process
Publication number
20050191830
Publication date
Sep 1, 2005
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma immersion ion implantation process
Publication number
20050191827
Publication date
Sep 1, 2005
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for ion implanting insulator material to reduce dielectric c...
Publication number
20050191828
Publication date
Sep 1, 2005
APPLIED MATERIALS, INC.
Amir Al-Bayati
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Semiconductor on insulator vertical transistor fabrication and dopi...
Publication number
20050136604
Publication date
Jun 23, 2005
Amir Al-Bayati
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Silicon-on-insulator wafer transfer method using surface activation...
Publication number
20050070073
Publication date
Mar 31, 2005
APPLIED MATERIALS, INC.
Amir Al-Bayati
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma immersion ion implantation system including an inductively c...
Publication number
20050051271
Publication date
Mar 10, 2005
APPLIED MATERIALS, INC.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma immersion ion implantation process using an inductively coup...
Publication number
20050051272
Publication date
Mar 10, 2005
APPLIED MATERIALS, INC.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS