Brian Aegerter

Person

Kalispell, MT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for wetting substrates
- Patent number 10,373,864
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Paul McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods and apparatus for rinsing and drying
- Patent number 7,429,537
- Issue date Sep 30, 2008
- Semitool, Inc.
- Brian K. Aegerter
- B08 - CLEANING
Information Patent Grant
Selective treatment of microelectric workpiece surfaces
- Patent number 7,399,713
- Issue date Jul 15, 2008
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sonic energy process chamber
- Patent number 7,337,663
- Issue date Mar 4, 2008
- Semitool, Inc.
- Paul Z. Wirth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing microelectronic workpieces usi...
- Patent number 7,102,763
- Issue date Sep 5, 2006
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single workpiece processing system
- Patent number 6,900,132
- Issue date May 31, 2005
- Semitool, Inc.
- Raymon F. Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,794,291
- Issue date Sep 21, 2004
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Sonic immersion process system and methods
- Patent number 6,774,056
- Issue date Aug 10, 2004
- Semitool, Inc.
- Jon Kuntz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,692,613
- Issue date Feb 17, 2004
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Selective treatment of microelectronic workpiece surfaces
- Patent number 6,632,292
- Issue date Oct 14, 2003
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,447,633
- Issue date Sep 10, 2002
- Semitdol, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,423,642
- Issue date Jul 23, 2002
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Selective treatment of the surface of a microelectronic workpiece
- Patent number 6,413,436
- Issue date Jul 2, 2002
- Semitool, Inc.
- Brian Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR WETTING SUBSTRATES
- Publication number 20180182664
- Publication date Jun 28, 2018
- Applied Materials, Inc.
- Paul McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SONIC AND CHEMICAL WAFER PROCESSOR
- Publication number 20080029123
- Publication date Feb 7, 2008
- Brian Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CLEANING EDGES OF A SUBSTRATE
- Publication number 20070193607
- Publication date Aug 23, 2007
- John Ghekiere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Workpiece support for use in a process vessel and system for treati...
- Publication number 20070000527
- Publication date Jan 4, 2007
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning with electrically charged aerosols
- Publication number 20060118132
- Publication date Jun 8, 2006
- Eric J. Bergman
- B08 - CLEANING
Information Patent Application
Methods and apparatus for rinsing and drying
- Publication number 20060070638
- Publication date Apr 6, 2006
- Brian K. Aegerter
- B08 - CLEANING
Information Patent Application
Processes for removing residue from a workpiece
- Publication number 20050233589
- Publication date Oct 20, 2005
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective processing of microelectronic workpiece surfaces
- Publication number 20050217707
- Publication date Oct 6, 2005
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing a workpiece with ozone and a halogenated additive
- Publication number 20050034745
- Publication date Feb 17, 2005
- Semitool, Inc.
- Eric J. Bergman
- B08 - CLEANING
Information Patent Application
Method for processing a semiconductor wafer
- Publication number 20050032391
- Publication date Feb 10, 2005
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Application
Selective treatment of the surface of a microelectronic workpiece
- Publication number 20050020001
- Publication date Jan 27, 2005
- Brian Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single workpiece processing system
- Publication number 20040112738
- Publication date Jun 17, 2004
- Raymon F. Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective treatment of microelectronic workpiece surfaces
- Publication number 20040035448
- Publication date Feb 26, 2004
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective treatment of microelectronic workpiece surfaces
- Publication number 20040023494
- Publication date Feb 5, 2004
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sonic immersion process system and methods
- Publication number 20030056814
- Publication date Mar 27, 2003
- Semitool, Inc.
- Jon Kuntz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for processing microelectronic workpieces usi...
- Publication number 20030020928
- Publication date Jan 30, 2003
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reactor for processing a semiconductor wafer
- Publication number 20020189652
- Publication date Dec 19, 2002
- Semitool, Inc.
- Steven L. Peace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reactor for processing a semiconductor wafer
- Publication number 20020185163
- Publication date Dec 12, 2002
- Semitool, Inc.
- Steven L. Peace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective treatment of the surface of a microelectronic workpiece
- Publication number 20020168863
- Publication date Nov 14, 2002
- Semitool, Inc.
- Brian Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective treatment of the surface of a microelectronic workpiece
- Publication number 20020144973
- Publication date Oct 10, 2002
- Semitool, Inc.
- Brian Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Brian Aegerter

Person

Patents Grantslast 30 patents

Systems and methods for wetting substrates

Methods and apparatus for rinsing and drying

Selective treatment of microelectric workpiece surfaces

Sonic energy process chamber

Methods and apparatus for processing microelectronic workpieces usi...

Single workpiece processing system

Reactor for processing a semiconductor wafer

Sonic immersion process system and methods

Reactor for processing a semiconductor wafer

Selective treatment of microelectronic workpiece surfaces

Reactor for processing a semiconductor wafer

Reactor for processing a semiconductor wafer

Selective treatment of the surface of a microelectronic workpiece

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR WETTING SUBSTRATES

SONIC AND CHEMICAL WAFER PROCESSOR

METHODS AND APPARATUS FOR CLEANING EDGES OF A SUBSTRATE

Workpiece support for use in a process vessel and system for treati...

Cleaning with electrically charged aerosols

Methods and apparatus for rinsing and drying

Processes for removing residue from a workpiece

Selective processing of microelectronic workpiece surfaces

Processing a workpiece with ozone and a halogenated additive

Method for processing a semiconductor wafer

Selective treatment of the surface of a microelectronic workpiece

Single workpiece processing system

Selective treatment of microelectronic workpiece surfaces

Selective treatment of microelectronic workpiece surfaces

Sonic immersion process system and methods

Methods and apparatus for processing microelectronic workpieces usi...

Reactor for processing a semiconductor wafer

Reactor for processing a semiconductor wafer

Selective treatment of the surface of a microelectronic workpiece

Selective treatment of the surface of a microelectronic workpiece