Bruce Dale Ulrich

Person

Beaverton, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semi-transparent film grayscale mask
- Patent number 8,685,596
- Issue date Apr 1, 2014
- Sharp Laboratories of America, Inc.
- Wei Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming an iridium oxide (IrOx) nanowire neural sensor a...
- Patent number 7,905,013
- Issue date Mar 15, 2011
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Error diffusion-derived sub-resolutional grayscale reticle
- Patent number 7,897,302
- Issue date Mar 1, 2011
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-resolutional grayscale reticle
- Patent number 7,887,980
- Issue date Feb 15, 2011
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating grayscale mask using smart cut® wafer bonding...
- Patent number 7,838,174
- Issue date Nov 23, 2010
- Sharp Laboratories of America, Inc.
- Wei Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanorod sensor with single-plane electrodes
- Patent number 7,759,150
- Issue date Jul 20, 2010
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Method of etching a TE/PCMO stack using an etch stop layer
- Patent number 7,727,897
- Issue date Jun 1, 2010
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a grayscale mask using a wafer bonding process
- Patent number 7,682,761
- Issue date Mar 23, 2010
- Sharp Laboratories of America, Inc.
- Wei Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a grayscale reticle using step-over lithography fo...
- Patent number 7,678,512
- Issue date Mar 16, 2010
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
MOCVD PGO thin films deposited on indium oxide for feram applications
- Patent number 7,531,207
- Issue date May 12, 2009
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Grayscale reticle for precise control of photoresist exposure
- Patent number 7,439,187
- Issue date Oct 21, 2008
- Sharp Laboratories of America
- Yoshi Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective etching processes of SiO2 , Ti and In2 O3 thin films for...
- Patent number 7,364,665
- Issue date Apr 29, 2008
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etching processes of silicon nitride and indium oxide thi...
- Patent number 7,338,907
- Issue date Mar 4, 2008
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration processes for fabricating a conductive metal oxide gate...
- Patent number 7,329,548
- Issue date Feb 12, 2008
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a microlens array having a high fill factor
- Patent number 7,297,473
- Issue date Nov 20, 2007
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G02 - OPTICS
Information Patent Grant
Ultra-shallow metal oxide surface channel MOS transistor
- Patent number 7,256,465
- Issue date Aug 14, 2007
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Step-over lithography to produce parabolic photoresist profiles for...
- Patent number 7,190,526
- Issue date Mar 13, 2007
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
One mask Pt/PCMO/Pt stack etching process for RRAM applications
- Patent number 7,169,637
- Issue date Jan 30, 2007
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining pattern misalignment over a substrate
- Patent number 7,160,656
- Issue date Jan 9, 2007
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G01 - MEASURING TESTING
Information Patent Grant
MOCVD selective deposition of C-axis oriented PB5GE3O11 thin films...
- Patent number 7,157,111
- Issue date Jan 2, 2007
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etching processes for In2O3 thin films in FeRAM device ap...
- Patent number 7,053,001
- Issue date May 30, 2006
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pt/PGO etching process for FeRAM applications
- Patent number 7,041,511
- Issue date May 9, 2006
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an X/Y alignment vernier
- Patent number 7,008,756
- Issue date Mar 7, 2006
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G01 - MEASURING TESTING
Information Patent Grant
Method of etching a SiN/Ir/TaN or SiN/Ir/Ti stack using an aluminum...
- Patent number 6,951,825
- Issue date Oct 4, 2005
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X/Y alignment vernier formed on a substrate
- Patent number 6,864,589
- Issue date Mar 8, 2005
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G01 - MEASURING TESTING
Information Patent Grant
Selectively deposited PGO thin film and method for forming same
- Patent number 6,825,519
- Issue date Nov 30, 2004
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MOCVD selective deposition of c-axis oriented Pb5Ge3O11 thin films...
- Patent number 6,794,198
- Issue date Sep 21, 2004
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned shallow trench isolation process having improved polys...
- Patent number 6,716,691
- Issue date Apr 6, 2004
- Sharp Laboratories of America, Inc.
- David R. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MFMOS capacitors with high dielectric constant materials
- Patent number 6,716,645
- Issue date Apr 6, 2004
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making self-aligned shallow trench isolation
- Patent number 6,627,510
- Issue date Sep 30, 2003
- Sharp Laboratories of America, Inc.
- David R. Evans
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Error Diffusion-Derived Sub-Resolutional Grayscale Reticle
- Publication number 20100040959
- Publication date Feb 18, 2010
- Bruce D. Ulrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sub-Resolutional Grayscale Reticle
- Publication number 20100040958
- Publication date Feb 18, 2010
- Bruce D. Ulrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMI-TRANSPARENT FILM GRAYSCALE MASK
- Publication number 20090142673
- Publication date Jun 4, 2009
- Wei Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IrOx nanowire protein sensor
- Publication number 20090017197
- Publication date Jan 15, 2009
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- G01 - MEASURING TESTING
Information Patent Application
IrOx nanowire neural sensor
- Publication number 20080299381
- Publication date Dec 4, 2008
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Nanorod sensor with single-plane electrodes
- Publication number 20080290431
- Publication date Nov 27, 2008
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- G01 - MEASURING TESTING
Information Patent Application
Method of fabricating a grayscale mask using a wafer bonding process
- Publication number 20080197107
- Publication date Aug 21, 2008
- Sharp Laboratories of America, Inc.
- Wei Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of making a grayscale reticle using step-over lithography fo...
- Publication number 20080176148
- Publication date Jul 24, 2008
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of fabricating grayscale mask using smart cut® wafer bonding...
- Publication number 20080176392
- Publication date Jul 24, 2008
- Sharp Laboratories of America, Inc.
- Wei Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon nanostructures and fabrication thereof
- Publication number 20080166878
- Publication date Jul 10, 2008
- Sharp Laboratories of America, Inc.
- Tingkai Li
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Grayscale reticle for precise control of photoresist exposure
- Publication number 20080102641
- Publication date May 1, 2008
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATION PROCESSES FOR FABRICATING A CONDUCTIVE METAL OXIDE GATE...
- Publication number 20080003697
- Publication date Jan 3, 2008
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for densifying sol-gel films to form microlens structures
- Publication number 20070259127
- Publication date Nov 8, 2007
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G02 - OPTICS
Information Patent Application
Method of forming a microlens array having a high fill factor
- Publication number 20070105056
- Publication date May 10, 2007
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G02 - OPTICS
Information Patent Application
Method of etching a TE/PCMO stack using an etch stop layer
- Publication number 20070049029
- Publication date Mar 1, 2007
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for determining pattern misalignment over a substrate
- Publication number 20060121374
- Publication date Jun 8, 2006
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G01 - MEASURING TESTING
Information Patent Application
Selective etching processes of SiO2, Ti and In2O3 thin films for Fe...
- Publication number 20060091107
- Publication date May 4, 2006
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective etching processes of silicon nitride and indium oxide thi...
- Publication number 20060073706
- Publication date Apr 6, 2006
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Directly patternable microlens
- Publication number 20060046204
- Publication date Mar 2, 2006
- Sharp Laboratories of America, Inc.
- Yoshi Ono
- G02 - OPTICS
Information Patent Application
Pt/PGO etching process for FeRAM applications
- Publication number 20060040413
- Publication date Feb 23, 2006
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lens formation by pattern transfer of a photoresist profile
- Publication number 20060029890
- Publication date Feb 9, 2006
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G02 - OPTICS
Information Patent Application
One mask Pt/PCMO/Pt stack etching process for RRAM applications
- Publication number 20060003489
- Publication date Jan 5, 2006
- Sharp Laboratories of America, Inc.
- Fengyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOCVD PGO thin films deposited on indium oxide for feram applications
- Publication number 20050178656
- Publication date Aug 18, 2005
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultra-shallow metal oxide surface channel MOS transistor
- Publication number 20050156254
- Publication date Jul 21, 2005
- Sharp Laboratories of America Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X/Y alignment vernier and method of fabricating same
- Publication number 20050084780
- Publication date Apr 21, 2005
- Sharp Laboratories of America, Inc.
- Bruce D. Ulrich
- G01 - MEASURING TESTING
Information Patent Application
MOCVD selective deposition of C-axis oriented PB5GE3O11 thin films...
- Publication number 20050069643
- Publication date Mar 31, 2005
- Sharp Laboratories of America, Inc.
- Tingkai Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective etching processes for In2O3 thin films in FeRAM device ap...
- Publication number 20050070114
- Publication date Mar 31, 2005
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selectively deposited PGO thin film method for forming same
- Publication number 20040188743
- Publication date Sep 30, 2004
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching a SiN/Ir/TaN or SiN/Ir/Ti stack using an aluminum...
- Publication number 20040185669
- Publication date Sep 23, 2004
- Sharp Laboratories of America, Inc.
- Tingkai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING SELF-ALIGNED SHALLOW TRENCH ISOLATION
- Publication number 20030186503
- Publication date Oct 2, 2003
- David R. Evans
- H01 - BASIC ELECTRIC ELEMENTS

Bruce Dale Ulrich

Person

Patents Grantslast 30 patents

Semi-transparent film grayscale mask

Method for forming an iridium oxide (IrOx) nanowire neural sensor a...

Error diffusion-derived sub-resolutional grayscale reticle

Sub-resolutional grayscale reticle

Method of fabricating grayscale mask using smart cut® wafer bonding...

Nanorod sensor with single-plane electrodes

Method of etching a TE/PCMO stack using an etch stop layer

Method of fabricating a grayscale mask using a wafer bonding process

Method of making a grayscale reticle using step-over lithography fo...

MOCVD PGO thin films deposited on indium oxide for feram applications

Grayscale reticle for precise control of photoresist exposure

Selective etching processes of SiO2 , Ti and In2 O3 thin films for...

Selective etching processes of silicon nitride and indium oxide thi...

Integration processes for fabricating a conductive metal oxide gate...

Method of forming a microlens array having a high fill factor

Ultra-shallow metal oxide surface channel MOS transistor

Step-over lithography to produce parabolic photoresist profiles for...

One mask Pt/PCMO/Pt stack etching process for RRAM applications

Method for determining pattern misalignment over a substrate

MOCVD selective deposition of C-axis oriented PB5GE3O11 thin films...

Selective etching processes for In2O3 thin films in FeRAM device ap...

Pt/PGO etching process for FeRAM applications

Method of fabricating an X/Y alignment vernier

Method of etching a SiN/Ir/TaN or SiN/Ir/Ti stack using an aluminum...

X/Y alignment vernier formed on a substrate

Selectively deposited PGO thin film and method for forming same

MOCVD selective deposition of c-axis oriented Pb5Ge3O11 thin films...

Self-aligned shallow trench isolation process having improved polys...

MFMOS capacitors with high dielectric constant materials

Method of making self-aligned shallow trench isolation

Patents Applicationslast 30 patents

Error Diffusion-Derived Sub-Resolutional Grayscale Reticle

Sub-Resolutional Grayscale Reticle

SEMI-TRANSPARENT FILM GRAYSCALE MASK

IrOx nanowire protein sensor

IrOx nanowire neural sensor

Nanorod sensor with single-plane electrodes

Method of fabricating a grayscale mask using a wafer bonding process

Method of making a grayscale reticle using step-over lithography fo...

Method of fabricating grayscale mask using smart cut® wafer bonding...

Silicon nanostructures and fabrication thereof

Grayscale reticle for precise control of photoresist exposure

INTEGRATION PROCESSES FOR FABRICATING A CONDUCTIVE METAL OXIDE GATE...

Method for densifying sol-gel films to form microlens structures

Method of forming a microlens array having a high fill factor

Method of etching a TE/PCMO stack using an etch stop layer

Method for determining pattern misalignment over a substrate

Selective etching processes of SiO2, Ti and In2O3 thin films for Fe...

Selective etching processes of silicon nitride and indium oxide thi...

Directly patternable microlens

Pt/PGO etching process for FeRAM applications

Lens formation by pattern transfer of a photoresist profile

One mask Pt/PCMO/Pt stack etching process for RRAM applications

MOCVD PGO thin films deposited on indium oxide for feram applications

Ultra-shallow metal oxide surface channel MOS transistor

X/Y alignment vernier and method of fabricating same

MOCVD selective deposition of C-axis oriented PB5GE3O11 thin films...

Selective etching processes for In2O3 thin films in FeRAM device ap...

Selectively deposited PGO thin film method for forming same

Method of etching a SiN/Ir/TaN or SiN/Ir/Ti stack using an aluminum...

METHOD OF MAKING SELF-ALIGNED SHALLOW TRENCH ISOLATION