Carl P. Babcock

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,657,864
- Issue date Feb 2, 2010
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for designing an integrated circuit device
- Patent number 7,543,256
- Issue date Jun 2, 2009
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction (OPC) technique to compensate for flare
- Patent number 7,422,829
- Issue date Sep 9, 2008
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing an integrated circuit layout by taking into consideratio...
- Patent number 7,313,769
- Issue date Dec 25, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for automatic generation of optical proximity cor...
- Patent number 7,281,222
- Issue date Oct 9, 2007
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,269,804
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for metrology recipe generation and review and an...
- Patent number 7,207,017
- Issue date Apr 17, 2007
- Advanced Micro Devices, Inc.
- Cyrus Tabery
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for design rule creation and selection
- Patent number 7,194,725
- Issue date Mar 20, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Immersion lithographic process using a conforming immersion medium
- Patent number 7,125,652
- Issue date Oct 24, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of developing optimized optical proximity correction (OPC) f...
- Patent number 7,080,349
- Issue date Jul 18, 2006
- Advanced Micro Devices, Inc.
- Carl Babcock
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Shallow trench isolation using antireflection layer
- Patent number 7,061,075
- Issue date Jun 13, 2006
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for a lithographic lens
- Patent number 6,906,777
- Issue date Jun 14, 2005
- Advanced Micro Devices, Inc.
- Jongwook Kye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using phase-shifting mask
- Patent number 6,902,851
- Issue date Jun 7, 2005
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shallow trench isolation using antireflection layer
- Patent number 6,821,883
- Issue date Nov 23, 2004
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Growth of photoresist layer in photolithographic process
- Patent number 6,682,988
- Issue date Jan 27, 2004
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for developing a photoresist layer with reduced p...
- Patent number 6,660,459
- Issue date Dec 9, 2003
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming shallow trench isolation using antireflection layer
- Patent number 6,645,868
- Issue date Nov 11, 2003
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing feature dimension using self-assembled monolayer
- Patent number 6,630,404
- Issue date Oct 7, 2003
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra narrow lines for field effect transistors
- Patent number 6,576,536
- Issue date Jun 10, 2003
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve accuracy of model-based optical proximity correction
- Patent number 6,544,699
- Issue date Apr 8, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Binary and attenuating phase-shifting masks for multiple wavelengths
- Patent number 6,500,587
- Issue date Dec 31, 2002
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for and method of using bacteria to aid in contact hole prin...
- Patent number 6,475,811
- Issue date Nov 5, 2002
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for determining overlay error
- Patent number 6,423,555
- Issue date Jul 23, 2002
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making ultra small vias for integrated circuits
- Patent number 6,358,843
- Issue date Mar 19, 2002
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simplified method of patterning field dielectric regions in a semic...
- Patent number 6,335,235
- Issue date Jan 1, 2002
- Advanced Micro Devices, Inc.
- Jayendra D. Bhakta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation using antireflection layer
- Patent number 6,255,717
- Issue date Jul 3, 2001
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...
- Publication number 20070209030
- Publication date Sep 6, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for integrated circuit device design and manufact...
- Publication number 20050229125
- Publication date Oct 13, 2005
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithographic process using a conforming immersion medium
- Publication number 20050122497
- Publication date Jun 9, 2005
- Christopher F. Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for developing a photoresist layer with reduced p...
- Publication number 20020132184
- Publication date Sep 19, 2002
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED METHOD OF PATTERNING FIELD DIELECTRIC REGIONS IN A SEMIC...
- Publication number 20020009845
- Publication date Jan 24, 2002
- JAYENDRA D. BHAKTA
- H01 - BASIC ELECTRIC ELEMENTS

Carl P. Babcock

Person

Patents Grantslast 30 patents

System and method for integrated circuit device design and manufact...

System and method for designing an integrated circuit device

Optical proximity correction (OPC) technique to compensate for flare

Optimizing an integrated circuit layout by taking into consideratio...

System and method for automatic generation of optical proximity cor...

System and method for integrated circuit device design and manufact...

Method and system for metrology recipe generation and review and an...

System and method for design rule creation and selection

Immersion lithographic process using a conforming immersion medium

Method of developing optimized optical proximity correction (OPC) f...

Shallow trench isolation using antireflection layer

Pellicle for a lithographic lens

Method for using phase-shifting mask

Shallow trench isolation using antireflection layer

Growth of photoresist layer in photolithographic process

System and method for developing a photoresist layer with reduced p...

Method of forming shallow trench isolation using antireflection layer

Reducing feature dimension using self-assembled monolayer

Ultra narrow lines for field effect transistors

Method to improve accuracy of model-based optical proximity correction

Binary and attenuating phase-shifting masks for multiple wavelengths

System for and method of using bacteria to aid in contact hole prin...

System for determining overlay error

Method of making ultra small vias for integrated circuits

Simplified method of patterning field dielectric regions in a semic...

Shallow trench isolation using antireflection layer

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...

System and method for integrated circuit device design and manufact...

Immersion lithographic process using a conforming immersion medium

System and method for developing a photoresist layer with reduced p...

SIMPLIFIED METHOD OF PATTERNING FIELD DIELECTRIC REGIONS IN A SEMIC...