“Aqueous-based Photoresist Drying using Supercritical Carbon Dioxide to Prevent Pattern Collapse” by Goldfarb, et al., 2000 American Vacuum Society, J. Vac. Sci. Technolog. B 18(6), Nov./Dec. 2000. |
“Comparison of Resist Collapse Properties for Deep Ultraviolet and 193 nm Resist Platforms” by Cao, et al. 2000 American Vacuum Society, J. Vac. Sci. Technol. B 18(6), Nov./Dec. 2000. |
“Sub-0.1 μ m Patterning with High Aspect Ratio of 5 Achieved by Preventing Pattern Collapse” by Yamashita Jpn. J. Appl. Phys. vol. 35 (1996) pp. 2385-2386, Part 1, No. 4A, Apr. 1996. |
“X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist” by Oizumi, et al., Jpn. J. Appl. Phys. vol. 34 (1995) pp. 6734-6737, Part 1, No. 12B, Dec. 1995. |
“Prevention of Resist Pattern Collapse by Flood Exposure During Rinse Process” by Tanaka, et al., Jpn. J. Appl. Phys. vol. 33 (1994) pp. L1803-L1805, Part 2, No. 12B, Dec. 15, 1994. |
“Sub-100 nm Focused Ion Beam Lithography Using Ladder Silicone Spin-on Glass” by Suzuki, et al., 1996 American Vacuum Society, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996. |
“Freeze-Drying Process to Avoid Resist Pattern Collapse” by Tanaka, et al., Jpn. J. Appl. Phys. vol. 32 (1993) pp. 5813-5814, Part 1, No. 12A, Dec. 1993. |
“Mechanism of Resist Pattern Collapse During Development Process” by Tanaka, et al., Jpn. J. Appl. Phys. vol. 32 (1993) pp. 6059-6064, Part 1, No. 12B, Dec. 1993. |
“Mechanism of Resist Pattern Collapse” by Tanaka, et al., J. Electrochem Soc., vol. 140, No. 7, Jul. 1993. |
“Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography” by Deguchi, et al., Jpn. J. Appl. Phys. vol. 31 (1992) pp. 2954-2958, Part 1, No. 9A, Sep. 1992. |
“Collapse Behavior of KrF Resist Line Pattern Analyzed with Atomic Force Microscope Tip”, by Kawai, Jpn. J. Appl. Phys. vol. 39 (2000) pp. 7044-7048 Part 1, No. 12B, Dec. 2000. |
“Analysis of Resist Pattern Collapse and Optimization of DUV Process for Patterning sub-0.20 μ m Gate Line” by Yu, et al., SPIE vol. 3333, pp. 880-889. |
“Pattern Collapse in the Top Surface Imaging Process After Dry Development” by Mori, et al., 1998 American Vacuum Society, J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998. |