Carlton G. Willson

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene
- Patent number 5,807,947
- Issue date Sep 15, 1998
- Clariant Finance (BVI) Limited
- Richard Vicari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition with photosensitive base generator
- Patent number 5,545,509
- Issue date Aug 13, 1996
- International Business Machines Corporation
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyre...
- Patent number 5,342,727
- Issue date Aug 30, 1994
- Hoechst Celanese Corp.
- Richard Vicari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry developable photoresist compositions and method for use thereof
- Patent number 5,322,765
- Issue date Jun 21, 1994
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spin on oxygen reactive ion etch barrier
- Patent number 5,270,151
- Issue date Dec 14, 1993
- International Business Machines Corporation
- Peter A. Agostino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for imaging of photoresist including treatment of the photo...
- Patent number 5,250,395
- Issue date Oct 5, 1993
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generating composition and sensitizer therefor
- Patent number 5,055,439
- Issue date Oct 8, 1991
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermally stable photoresists with high sensitivity
- Patent number 4,939,070
- Issue date Jul 3, 1990
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of creating patterned multilayer films for use in production...
- Patent number 4,908,298
- Issue date Mar 13, 1990
- International Business Machines Corporation
- George J. Hefferon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
O-quinone diazide sulfonic acid monoesters useful as sensitizers fo...
- Patent number 4,853,315
- Issue date Aug 1, 1989
- International Business Machines Corporation
- Dennis R. McKean
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top imaged resists
- Patent number 4,810,601
- Issue date Mar 7, 1989
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist compositions
- Patent number 4,800,152
- Issue date Jan 24, 1989
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for making self-aligning thin film transistors
- Patent number 4,767,723
- Issue date Aug 30, 1988
- International Business Machines Corporation
- William D. Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for enhancing the resistance of a resist image to reactive...
- Patent number 4,690,838
- Issue date Sep 1, 1987
- International Business Machines Corporation
- Hiroyuki Hiraoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive tone oxygen plasma developable photoresist
- Patent number 4,657,845
- Issue date Apr 14, 1987
- International Business Machines Corporation
- Jean M. J. Frechet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for focus correction for a lithographic tool
- Patent number 4,645,338
- Issue date Feb 24, 1987
- International Business Machines Corporation
- Anthony Juliana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High contrast, high resolution deep ultraviolet lithographic resist...
- Patent number 4,601,969
- Issue date Jul 22, 1986
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive and oxygen plasma developable resist
- Patent number 4,552,833
- Issue date Nov 12, 1985
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing negative relief images with cationic photopol...
- Patent number 4,551,418
- Issue date Nov 5, 1985
- International Business Machines Corporation
- Anders Hult
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deep ultra-violet lithographic resists with diazohomotetramic acid...
- Patent number 4,522,911
- Issue date Jun 11, 1985
- International Business Machines Corporation
- Nicholas J. Clecak
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive- and negative-working resist compositions with acid genera...
- Patent number 4,491,628
- Issue date Jan 1, 1985
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for making an imaged oxygen-reactive ion etch barrier
- Patent number 4,464,460
- Issue date Aug 7, 1984
- International Business Machines Corporation
- Hiroyuki Hiraoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution optical lithography method and apparatus having exc...
- Patent number 4,458,994
- Issue date Jul 10, 1984
- International Business Machines Corporation
- Kantilal Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions
- Patent number 4,397,937
- Issue date Aug 9, 1983
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Terpolymer resist compositions
- Patent number 4,398,001
- Issue date Aug 9, 1983
- International Business Machines Corporation
- Ying Y. Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic resist composition for a lift-off process
- Patent number 4,284,706
- Issue date Aug 18, 1981
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Carlton G. Willson

Person

Patents Grantslast 30 patents

Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene

Photoresist composition with photosensitive base generator

Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyre...

Dry developable photoresist compositions and method for use thereof

Spin on oxygen reactive ion etch barrier

Process for imaging of photoresist including treatment of the photo...

Photoacid generating composition and sensitizer therefor

Thermally stable photoresists with high sensitivity

Method of creating patterned multilayer films for use in production...

O-quinone diazide sulfonic acid monoesters useful as sensitizers fo...

Top imaged resists

Negative resist compositions

Process for making self-aligning thin film transistors

Process for enhancing the resistance of a resist image to reactive...

Positive tone oxygen plasma developable photoresist

Optical system for focus correction for a lithographic tool

High contrast, high resolution deep ultraviolet lithographic resist...

Radiation sensitive and oxygen plasma developable resist

Process for preparing negative relief images with cationic photopol...

Deep ultra-violet lithographic resists with diazohomotetramic acid...

Positive- and negative-working resist compositions with acid genera...

Process for making an imaged oxygen-reactive ion etch barrier

High resolution optical lithography method and apparatus having exc...

Positive resist compositions

Terpolymer resist compositions

Lithographic resist composition for a lift-off process