Claims
- 1. A photosenstive resist composition comprising (i) a photosensitive base generator, (ii) a polymer and (iii) a base labile compound having a base cleavable substituent which is bonded to the base labile compound through a base-cleavable carbon-carbon, bond.
- 2. The composition of claim 1 wherein the base cleavable substituent is a carboxy group.
- 3. The composition of claim 2 wherein the base labile compound is bonded to the polymer.
- 4. The composition of claim 3 wherein the base generator is a benzyl carbamate.
- 5. A photosensitive resist composition comprising a photosensitive base generator and a polymer having pendant base labile substituents with base cleavable groups which are bonded to the base labile substituents through base cleavable carbon-carbon, bonds.
- 6. The composition of claim 5 wherein the polymer is poly(cyanocarboxyalkylstyrene).
- 7. The composition of claim 6 wherein the base generator is benzyl carbamate.
Parent Case Info
This is a continuation-in-part of application Ser. No. 07/981,033 filed on Nov. 24, 1992, now abandoned.
US Referenced Citations (14)
Foreign Referenced Citations (1)
Number |
Date |
Country |
0425142A2 |
Oct 1990 |
EPX |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
981033 |
Nov 1992 |
|