Chaw Sing Ho

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Electrically-functional optical target
- Patent number 10,336,069
- Issue date Jul 2, 2019
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Fluid ejection devices comprising memory cells
- Patent number 10,319,728
- Issue date Jun 11, 2019
- Hewlett-Packard Development Company, L.P.
- Chaw Sing Ho
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Ink property sensing on a printhead
- Patent number 9,908,332
- Issue date Mar 6, 2018
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Memory cell that prevents charge loss
- Patent number 9,559,106
- Issue date Jan 31, 2017
- Hewlett-Packard Development Company, L.P.
- Chaw-Sing Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid ejection apparatuses including a substrate with a bulk layer...
- Patent number 9,457,571
- Issue date Oct 4, 2016
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Device including active floating gate region area that is smaller t...
- Patent number 9,252,149
- Issue date Feb 2, 2016
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- G11 - INFORMATION STORAGE
Information Patent Grant
Apparatuses including a plate having a recess and a corresponding p...
- Patent number 9,199,460
- Issue date Dec 1, 2015
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Structure and process for a capacitor and other devices
- Patent number 6,902,981
- Issue date Jun 7, 2005
- Chartered Semiconductor Manufacturing Ltd.
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MIM and metal resistor formation at CU beol using only one extra mask
- Patent number 6,730,573
- Issue date May 4, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a metal-insulator-metal (MIM) capacitor and metal...
- Patent number 6,709,918
- Issue date Mar 23, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to fabricate MIM capacitor using damascene process
- Patent number 6,645,810
- Issue date Nov 11, 2003
- Chartered Semiconductors Manufacturing Limited
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-integrated vertical MIM capacitor in the dual damascene process
- Patent number 6,624,040
- Issue date Sep 23, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to fabricate MIM capacitor with a curvillnear surface using...
- Patent number 6,548,367
- Issue date Apr 15, 2003
- Chartered Semiconductor Manufacturing Limited
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene MIM capacitor with a curvilinear surface structure
- Patent number 6,528,838
- Issue date Mar 4, 2003
- Chartered Semiconductors Manufacturing Limited
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to fabricate dual-metal CMOS transistors for sub-0.1 &#x03BC...
- Patent number 6,410,376
- Issue date Jun 25, 2002
- Chartered Semiconductor Manufacturing Ltd.
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating void-free epitaxial-CoSi2 with ultra-shallow...
- Patent number 6,410,429
- Issue date Jun 25, 2002
- Chartered Semiconductor Manufacturing Inc.
- Chaw Sing Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form uniform silicide features
- Patent number 6,281,117
- Issue date Aug 28, 2001
- Chartered Semiconductor Manufacturing Ltd.
- Lap Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to fabricate a double-polysilicon gate structure for a sub-q...
- Patent number 6,180,501
- Issue date Jan 30, 2001
- Chartered Semiconductor Manufacturing Ltd.
- Kin-Leong Pey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed laser salicidation for fabrication of ultra-thin silicides i...
- Patent number 6,156,654
- Issue date Dec 5, 2000
- Chartered Semiconductor Manufacturing Ltd.
- Chaw Sing Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cmos gate architecture for integration of salicide process in sub 0...
- Patent number 6,010,954
- Issue date Jan 4, 2000
- Chartered Semiconductor Manufacturing, Ltd.
- Chaw Sing Ho
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ADDITIVE MANUFACTURING OF OBJECT USING OBJECT MATERIAL, O...
- Publication number 20210394446
- Publication date Dec 23, 2021
- SECUR3DP+ PTE. LTD.
- Tuan Anh Tran
- B22 - CASTING POWDER METALLURGY
Information Patent Application
ELECTRICALLY-FUNCTIONAL OPTICAL TARGET
- Publication number 20180222188
- Publication date Aug 9, 2018
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PRINTHEADS WITH EPROM CELLS HAVING ETCHED MULTI-METAL FLOATING GATES
- Publication number 20180022103
- Publication date Jan 25, 2018
- Hewlett-Packard Development Company, L.P.
- Ning GE
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
FLUID EJECTION DEVICES COMPRISING MEMORY CELLS
- Publication number 20170092653
- Publication date Mar 30, 2017
- Hewlett-Packard Development Company, L.P.
- Chaw Sing Ho
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
INK PROPERTY SENSING ON A PRINTHEAD
- Publication number 20160339696
- Publication date Nov 24, 2016
- Hewlett-Packard Development Company, L.P.
- Ning GE
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
V-SHAPE RESISTIVE MEMORY ELEMENT
- Publication number 20160315256
- Publication date Oct 27, 2016
- HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP
- Ning Ge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluid Ejection Apparatuses Including a Substrate with a Bulk Layer...
- Publication number 20160129690
- Publication date May 12, 2016
- Hewlett-Packard Development Company, L.P.
- Ning GE
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
MEMORY CELL THAT PREVENTS CHARGE LOSS
- Publication number 20150123186
- Publication date May 7, 2015
- Hewlett-Packard Development Company, L.P.
- Chaw-Sing Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES INCLUDING A PLATE HAVING A RECESS AND A CORRESPONDING P...
- Publication number 20150001321
- Publication date Jan 1, 2015
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVICE INCLUDING ACTIVE FLOATING GATE REGION AREA THAT IS SMALLER T...
- Publication number 20140374812
- Publication date Dec 25, 2014
- Hewlett-Packard Development Company, L.P.
- Ning Ge
- G11 - INFORMATION STORAGE
Information Patent Application
MODULAR & SCALABLE INTRA-METAL CAPACITORS
- Publication number 20100038752
- Publication date Feb 18, 2010
- CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
- Chit Hwei NG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIM AND METAL RESISTOR FORMATION AT CU BEOL USING ONLY ONE EXTRA MASK
- Publication number 20040087098
- Publication date May 6, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure and process for a capacitor and other devices
- Publication number 20040072406
- Publication date Apr 15, 2004
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to fabricate NIM capacitor using damascene process
- Publication number 20030092259
- Publication date May 15, 2003
- CHARTERED SEMICONDUCTORS MANUFACTURED LIMITED
- Chit Hwei Ng
- H01 - BASIC ELECTRIC ELEMENTS

Chaw Sing Ho

Person

Patents Grantslast 30 patents

Electrically-functional optical target

Fluid ejection devices comprising memory cells

Ink property sensing on a printhead

Memory cell that prevents charge loss

Fluid ejection apparatuses including a substrate with a bulk layer...

Device including active floating gate region area that is smaller t...

Apparatuses including a plate having a recess and a corresponding p...

Structure and process for a capacitor and other devices

MIM and metal resistor formation at CU beol using only one extra mask

Method for making a metal-insulator-metal (MIM) capacitor and metal...

Method to fabricate MIM capacitor using damascene process

Self-integrated vertical MIM capacitor in the dual damascene process

Method to fabricate MIM capacitor with a curvillnear surface using...

Damascene MIM capacitor with a curvilinear surface structure

Method to fabricate dual-metal CMOS transistors for sub-0.1 &#x03BC...

Method for fabricating void-free epitaxial-CoSi2 with ultra-shallow...

Method to form uniform silicide features

Method to fabricate a double-polysilicon gate structure for a sub-q...

Pulsed laser salicidation for fabrication of ultra-thin silicides i...

Cmos gate architecture for integration of salicide process in sub 0...

Patents Applicationslast 30 patents

METHOD OF ADDITIVE MANUFACTURING OF OBJECT USING OBJECT MATERIAL, O...

ELECTRICALLY-FUNCTIONAL OPTICAL TARGET

PRINTHEADS WITH EPROM CELLS HAVING ETCHED MULTI-METAL FLOATING GATES

FLUID EJECTION DEVICES COMPRISING MEMORY CELLS

INK PROPERTY SENSING ON A PRINTHEAD

V-SHAPE RESISTIVE MEMORY ELEMENT

Fluid Ejection Apparatuses Including a Substrate with a Bulk Layer...

MEMORY CELL THAT PREVENTS CHARGE LOSS

APPARATUSES INCLUDING A PLATE HAVING A RECESS AND A CORRESPONDING P...

DEVICE INCLUDING ACTIVE FLOATING GATE REGION AREA THAT IS SMALLER T...

MODULAR & SCALABLE INTRA-METAL CAPACITORS

MIM AND METAL RESISTOR FORMATION AT CU BEOL USING ONLY ONE EXTRA MASK

Structure and process for a capacitor and other devices

Method to fabricate NIM capacitor using damascene process