Ching-Mei Hsu

Person

Stanford, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Airgap formation processes
- Patent number 11,735,467
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Ashish Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective material removal
- Patent number 11,417,534
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Ming Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Airgap formation processes
- Patent number 11,211,286
- Issue date Dec 28, 2021
- Applied Materials, Inc.
- Ashish Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,991,134
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon selective removal
- Patent number 9,881,805
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,704,723
- Issue date Jul 11, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,659,792
- Issue date May 23, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anisotropic gap etch
- Patent number 9,502,258
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,449,850
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 9,449,845
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,437,451
- Issue date Sep 6, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for selective tungsten removal
- Patent number 9,412,608
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature gas-phase carbon removal
- Patent number 9,378,969
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Ching-Mei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,184,055
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,153,442
- Issue date Oct 6, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,093,371
- Issue date Jul 28, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for selective oxidation removal
- Patent number 9,064,816
- Issue date Jun 23, 2015
- Applied Materials, Inc.
- Sang Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,023,734
- Issue date May 5, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,023,732
- Issue date May 5, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for selective tungsten removal
- Patent number 8,980,763
- Issue date Mar 17, 2015
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 8,921,234
- Issue date Dec 30, 2014
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optoelectronic semiconductor device and method of fabrication
- Patent number 8,896,077
- Issue date Nov 25, 2014
- The Board of Trustees of the Leland Stanford Junior University
- Yi Cui
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Nano-patterned electrolytes in solid oxide fuel cells
- Patent number 8,394,550
- Issue date Mar 12, 2013
- The Board of Trustees of the Leland Stanford Junior University
- Cheng-Chieh Chao
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Substrate comprising a nanometer-scale projection array
- Patent number 8,318,604
- Issue date Nov 27, 2012
- The Board of Trustees of the Leland Stanford Junior University
- Yi Cui
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
AIRGAP FORMATION PROCESSES
- Publication number 20220115263
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Ashish Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE MATERIAL REMOVAL
- Publication number 20200098586
- Publication date Mar 26, 2020
- Applied Materials, Inc.
- Ming Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIRGAP FORMATION PROCESSES
- Publication number 20190252239
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Ashish Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON SELECTIVE REMOVAL
- Publication number 20160260616
- Publication date Sep 8, 2016
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANISOTROPIC GAP ETCH
- Publication number 20160181112
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160064233
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160027673
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE GAS-PHASE CARBON REMOVAL
- Publication number 20150371864
- Publication date Dec 24, 2015
- Ching-Mei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150332930
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SELECTIVE OXIDATION REMOVAL
- Publication number 20150311089
- Publication date Oct 29, 2015
- Applied Materials, Inc.
- Sang Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-COMPONENT OXIDE ETCH
- Publication number 20150235863
- Publication date Aug 20, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150235865
- Publication date Aug 20, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL
- Publication number 20150179464
- Publication date Jun 25, 2015
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE TITANIUM NITRIDE ETCHING
- Publication number 20150118857
- Publication date Apr 30, 2015
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273481
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140262038
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273489
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273406
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273488
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140271097
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY-ETCH FOR SELECTIVE OXIDATION REMOVAL
- Publication number 20140199850
- Publication date Jul 17, 2014
- Applied Materials, Inc.
- Sang Hyuk Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE TITANIUM NITRIDE ETCHING
- Publication number 20140179111
- Publication date Jun 26, 2014
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL
- Publication number 20140154889
- Publication date Jun 5, 2014
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-COMPONENT OXIDE ETCH
- Publication number 20140080308
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Comprising a Nanometer-scale Projection Array
- Publication number 20110121431
- Publication date May 26, 2011
- The Board of Trustees of the Leland Stanford Junior University
- Yi Cui
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Optoelectronic Semiconductor Device and Method of Fabrication
- Publication number 20110095389
- Publication date Apr 28, 2011
- The Board of Trustees of the Leland Stanford Junior University
- Yi Cui
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Nano-patterned electrolytes in solid oxide fuel cells
- Publication number 20110076589
- Publication date Mar 31, 2011
- Cheng-Chieh Chao
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Nano-patterned metal electrode for solid oxide fuel cell
- Publication number 20100200537
- Publication date Aug 12, 2010
- Young Beom Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Ching-Mei Hsu

Person

Patents Grantslast 30 patents

Airgap formation processes

Selective material removal

Airgap formation processes

Processing systems and methods for halide scavenging

Silicon selective removal

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Anisotropic gap etch

Processing systems and methods for halide scavenging

Selective titanium nitride etching

Radical-component oxide etch

Dry-etch for selective tungsten removal

Low temperature gas-phase carbon removal

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Dry-etch for selective oxidation removal

Radical-component oxide etch

Processing systems and methods for halide scavenging

Dry-etch for selective tungsten removal

Selective titanium nitride etching

Optoelectronic semiconductor device and method of fabrication

Nano-patterned electrolytes in solid oxide fuel cells

Substrate comprising a nanometer-scale projection array

Patents Applicationslast 30 patents

AIRGAP FORMATION PROCESSES

SELECTIVE MATERIAL REMOVAL

AIRGAP FORMATION PROCESSES

SILICON SELECTIVE REMOVAL

ANISOTROPIC GAP ETCH

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

LOW TEMPERATURE GAS-PHASE CARBON REMOVAL

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

DRY-ETCH FOR SELECTIVE OXIDATION REMOVAL

RADICAL-COMPONENT OXIDE ETCH

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL

SELECTIVE TITANIUM NITRIDE ETCHING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

DRY-ETCH FOR SELECTIVE OXIDATION REMOVAL

SELECTIVE TITANIUM NITRIDE ETCHING

DRY-ETCH FOR SELECTIVE TUNGSTEN REMOVAL

RADICAL-COMPONENT OXIDE ETCH

Substrate Comprising a Nanometer-scale Projection Array

Optoelectronic Semiconductor Device and Method of Fabrication

Nano-patterned electrolytes in solid oxide fuel cells

Nano-patterned metal electrode for solid oxide fuel cell