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Cissy Leung
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Union City, CA, US
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last 30 patents
Information
Patent Grant
Gate electrode connection structure by in situ chemical vapor depos...
Patent number
6,251,190
Issue date
Jun 26, 2001
Applied Materials, Inc.
Alfred Mak
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Low resistivity W using B2H6 nucleation step
Patent number
6,206,967
Issue date
Mar 27, 2001
Applied Materials, Inc.
Alfred Mak
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposi...
Patent number
6,167,834
Issue date
Jan 2, 2001
Applied Materials, Inc.
David Nin-Kou Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming gate electrode connection structure by in situ ch...
Patent number
6,162,715
Issue date
Dec 19, 2000
Applied Materials, Inc.
Alfred Mak
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Low resistivity W using B.sub.2 H.sub.6 nucleation step
Patent number
6,099,904
Issue date
Aug 8, 2000
Applied Materials, Inc.
Alfred Mak
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for PECVD of silicon oxide using TEOS decomposition
Patent number
RE36623
Issue date
Mar 21, 2000
Applied Materials, Inc.
David Nin-Kou Wang
427 - Coating processes
Information
Patent Grant
Method for protecting against deposition on a selected region of a...
Patent number
5,871,811
Issue date
Feb 16, 1999
Applied Materials, Inc.
David Nin-Kou Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma-inert cover and plasma cleaning process and apparatus employ...
Patent number
5,810,936
Issue date
Sep 22, 1998
Applied Materials, Inc.
Cissy S. Leung
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Apparatus for preventing deposition gases from contacting a selecte...
Patent number
5,755,886
Issue date
May 26, 1998
Applied Materials, Inc.
David Nin-Kou Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma-inert cover and plasma cleaning process
Patent number
5,705,080
Issue date
Jan 6, 1998
Applied Materials, Inc.
Cissy S. Leung
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Controlling edge deposition on semiconductor substrates
Patent number
5,556,476
Issue date
Sep 17, 1996
Applied Materials, Inc.
Lawrence C. Lei
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Reducing backside deposition in a substrate processing apparatus th...
Patent number
5,476,548
Issue date
Dec 19, 1995
Applied Materials, Inc.
Lawrence C. Lei
C30 - CRYSTAL GROWTH
Information
Patent Grant
Bottom purge manifold for CVD tungsten process
Patent number
5,468,298
Issue date
Nov 21, 1995
Applied Materials, Inc.
Lawrence C. Lei
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus
Patent number
5,449,410
Issue date
Sep 12, 1995
Applied Materials, Inc.
Mei Chang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma-enhanced CVD process using TEOS for depositing silicon oxide
Patent number
5,362,526
Issue date
Nov 8, 1994
Applied Materials, Inc.
David N. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Thermal chemical vapor deposition of silicon dioxide and in-situ mu...
Patent number
5,354,715
Issue date
Oct 11, 1994
Applied Materials, Inc.
David N-K. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Lift fingers for substrate processing apparatus
Patent number
5,332,443
Issue date
Jul 26, 1994
Applied Materials, Inc.
Sandy M.-S. Chew
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Apparatus for removing deposits from backside and end edge of semic...
Patent number
5,213,650
Issue date
May 25, 1993
Applied Materials, Inc.
David N. Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for treating aluminum surfaces in a vacuum apparatus
Patent number
5,201,990
Issue date
Apr 13, 1993
Applied Materials, Inc.
Mei Chang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for removing deposits from backside and end edge of semicon...
Patent number
5,075,256
Issue date
Dec 24, 1991
Applied Materials, Inc.
David N. Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for CVD deposition of tungsten layer on semiconductor wafer
Patent number
5,028,565
Issue date
Jul 2, 1991
Applied Materials, Inc.
Mei Chang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposi...
Patent number
5,000,113
Issue date
Mar 19, 1991
Applied Materials, Inc.
David N. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Reactor chamber self-cleaning process
Patent number
4,960,488
Issue date
Oct 2, 1990
Applied Materials, Inc.
Kam S. Law
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for PECVD of silicon oxide using TEOS decomposition
Patent number
4,892,753
Issue date
Jan 9, 1990
Applied Materials, Inc.
David N. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
CVD of silicon oxide using TEOS decomposition and in-situ planariza...
Patent number
4,872,947
Issue date
Oct 10, 1989
Applied Materials, Inc.
David N. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...