Colin J. Brodsky

Person

Salt Point, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
High-K and metal filled trench-type EDRAM capacitor with electrode...
- Patent number 9,059,194
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Test method for determining reticle transmission stability
- Patent number 8,582,078
- Issue date Nov 12, 2013
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
Structure resulting from chemical shrink process over BARC (bottom...
- Patent number 8,491,984
- Issue date Jul 23, 2013
- International Business Machines Corporation
- Todd Christopher Bailey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Optical inspection methods
- Patent number 8,168,451
- Issue date May 1, 2012
- International Business Machines Corporation
- Colin J. Brodsky
- G01 - MEASURING TESTING
Information Patent Grant
Method for performing chemical shrink process over BARC (bottom ant...
- Patent number 8,110,496
- Issue date Feb 7, 2012
- International Business Machines Corporation
- Todd Christopher Bailey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate planarization with imprint materials and processes
- Patent number 8,084,185
- Issue date Dec 27, 2011
- International Business Machines Corporation
- Sean D. Burns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test method for determining reticle transmission stability
- Patent number 8,023,102
- Issue date Sep 20, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Grant
System and method for detection and prevention of influx of airborn...
- Patent number 7,917,309
- Issue date Mar 29, 2011
- International Business Machines Corporation
- Colin Brodsky
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Tapered edge bead removal process for immersion lithography
- Patent number 7,824,846
- Issue date Nov 2, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,816,069
- Issue date Oct 19, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composite structures to prevent pattern collapse
- Patent number 7,799,503
- Issue date Sep 21, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Utilizing inverse reactive ion etching lag in double patterning con...
- Patent number 7,786,017
- Issue date Aug 31, 2010
- International Business Machines Corporation
- Bradley J. Morgenfeld
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical inspection methods
- Patent number 7,645,621
- Issue date Jan 12, 2010
- International Business Machines Corporation
- Colin Brodsky
- G01 - MEASURING TESTING
Information Patent Grant
Method of preventing pinhole defects through co-polymerization
- Patent number 7,632,631
- Issue date Dec 15, 2009
- International Business Machines Corporation
- Steven A. Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,588,879
- Issue date Sep 15, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming film stack having under layer for preventing pinh...
- Patent number 7,541,065
- Issue date Jun 2, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for post lithographic critical dimension shrinking using the...
- Patent number 7,494,919
- Issue date Feb 24, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and algorithm for the control of critical dimensions in a th...
- Patent number 7,493,186
- Issue date Feb 17, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack having under layer for preventing pinhole defects
- Patent number 7,473,461
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of inspecting integrated circuits during fabrication
- Patent number 7,454,302
- Issue date Nov 18, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for post lithographic critical dimension shrinking using pos...
- Patent number 7,390,616
- Issue date Jun 24, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topography compensated film application methods
- Patent number 7,354,779
- Issue date Apr 8, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting integrated circuits during fabrication
- Patent number 7,310,585
- Issue date Dec 18, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for performing chemical shrink process over BARC (bottom ant...
- Patent number 7,288,478
- Issue date Oct 30, 2007
- International Business Machines Corporation
- Todd Christopher Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack having under layer for preventing pinhole defects
- Patent number 7,267,863
- Issue date Sep 11, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Density-aware dynamic leveling in scanning exposure systems
- Patent number 7,239,371
- Issue date Jul 3, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to reduce photoresist pattern collapse by controlled surface...
- Patent number 7,229,936
- Issue date Jun 12, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
After deposition method of thinning film to reduce pinhole defects
- Patent number 7,132,316
- Issue date Nov 7, 2006
- International Business Machines Corporation
- Wai-Kin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for performing chemical shrink process over BARC (bottom ant...
- Patent number 7,083,898
- Issue date Aug 1, 2006
- International Business Machines Corporation
- Todd C. Bailey
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH-K AND METAL FILLED TRENCH-TYPE EDRAM CAPACITOR WITH ELECTRODE...
- Publication number 20150102463
- Publication date Apr 16, 2015
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-K and Metal Filled Trench-Type EDRAM Capacitor with Electrode...
- Publication number 20140191366
- Publication date Jul 10, 2014
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM...
- Publication number 20120076982
- Publication date Mar 29, 2012
- International Business Machines Corporation
- Todd Christopher Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY
- Publication number 20110205509
- Publication date Aug 25, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PLANARIZATION WITH IMPRINT MATERIALS AND PROCESSES
- Publication number 20100173247
- Publication date Jul 8, 2010
- International Business Machines Corporation
- Sean D. Burns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INSPECTION METHODS
- Publication number 20100112730
- Publication date May 6, 2010
- International Business Machines Corporation
- Colin Brodsky
- G01 - MEASURING TESTING
Information Patent Application
TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY
- Publication number 20090262317
- Publication date Oct 22, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR DETECTION AND PREVENTION OF INFLUX OF AIRBORN...
- Publication number 20090150090
- Publication date Jun 11, 2009
- International Business Machines Corporation
- Colin Brodsky
- B60 - VEHICLES IN GENERAL
Information Patent Application
OPTICAL INSPECTION METHODS
- Publication number 20090097017
- Publication date Apr 16, 2009
- International Business Machines Corporation
- Colin Brodsky
- G01 - MEASURING TESTING
Information Patent Application
TAPERED EDGE BEAD REMOVAL PROCESS FOR IMMERSION LITHOGRAPHY
- Publication number 20090075217
- Publication date Mar 19, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITE STRUCTURES TO PREVENT PATTERN COLLAPSE
- Publication number 20080286683
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded Spin-on Organic Antireflective Coating for Photolithography
- Publication number 20080213707
- Publication date Sep 4, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND ALGORITHM FOR THE CONTROL OF CRITICAL DIMENSIONS IN A TH...
- Publication number 20080154420
- Publication date Jun 26, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF INSPECTING INTEGRATED CIRCUITS DURING FABRICATION
- Publication number 20080033675
- Publication date Feb 7, 2008
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PERFORMING CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANT...
- Publication number 20080020198
- Publication date Jan 24, 2008
- Todd Christopher Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Graded spin-on organic antireflective coating for photolithography
- Publication number 20080008955
- Publication date Jan 10, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film stack having under layer for preventing pinhole defects
- Publication number 20070259162
- Publication date Nov 8, 2007
- Colin J. Brodsky
- B32 - LAYERED PRODUCTS
Information Patent Application
TOPOGRAPHY COMPENSATED FILM APPLICATION METHODS
- Publication number 20070249070
- Publication date Oct 25, 2007
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming film stack having under layer for preventing pinh...
- Publication number 20070243333
- Publication date Oct 18, 2007
- Colin J. Brodsky
- B32 - LAYERED PRODUCTS
Information Patent Application
METHODS OF PREVENTING DEFECTS IN ANTIREFLECTIVE COATINGS
- Publication number 20070178404
- Publication date Aug 2, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DENSITY-AWARE DYNAMIC LEVELING IN SCANNING EXPOSURE SYSTEMS
- Publication number 20070085991
- Publication date Apr 19, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
After deposition method of thinning film to reduce pinhole defects
- Publication number 20070037325
- Publication date Feb 15, 2007
- Wai-Kin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PERFORMING CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANT...
- Publication number 20070010091
- Publication date Jan 11, 2007
- International Business Machines Corporation
- Todd Christopher Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of inspecting integrated circuits during fabrication
- Publication number 20060258024
- Publication date Nov 16, 2006
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED SUB-FIELD BLADING FOR LEVELING OPTIMIZATION IN LITHOGRAPH...
- Publication number 20060160037
- Publication date Jul 20, 2006
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Post Lithographic Critical Dimension Shrinking Using The...
- Publication number 20060154412
- Publication date Jul 13, 2006
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR POST LITHOGRAPHIC CRITICAL DIMENSION SHRINKING USING POS...
- Publication number 20060154182
- Publication date Jul 13, 2006
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
After deposition method of thinning film to reduce pinhole defects
- Publication number 20060148265
- Publication date Jul 6, 2006
- International Business Machines Corporation
- Wai-Kin Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preventing pinhole defects through co-polymerization
- Publication number 20060147849
- Publication date Jul 6, 2006
- INTERNATIONAL BUSINESS MACHINES CORPORATION
- Steven A. Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film stack having under layer for preventing pinhole defects
- Publication number 20060003153
- Publication date Jan 5, 2006
- International Business Machines Corporation
- Colin J. Brodsky
- B32 - LAYERED PRODUCTS

Colin J. Brodsky

Person

Patents Grantslast 30 patents

High-K and metal filled trench-type EDRAM capacitor with electrode...

Test method for determining reticle transmission stability

Structure resulting from chemical shrink process over BARC (bottom...

Optical inspection methods

Method for performing chemical shrink process over BARC (bottom ant...

Substrate planarization with imprint materials and processes

Test method for determining reticle transmission stability

System and method for detection and prevention of influx of airborn...

Tapered edge bead removal process for immersion lithography

Graded spin-on organic antireflective coating for photolithography

Composite structures to prevent pattern collapse

Utilizing inverse reactive ion etching lag in double patterning con...

Optical inspection methods

Method of preventing pinhole defects through co-polymerization

Graded spin-on organic antireflective coating for photolithography

Method of forming film stack having under layer for preventing pinh...

Method for post lithographic critical dimension shrinking using the...

Method and algorithm for the control of critical dimensions in a th...

Film stack having under layer for preventing pinhole defects

Method of inspecting integrated circuits during fabrication

Method for post lithographic critical dimension shrinking using pos...

Topography compensated film application methods

Method of inspecting integrated circuits during fabrication

Method for performing chemical shrink process over BARC (bottom ant...

Film stack having under layer for preventing pinhole defects

Density-aware dynamic leveling in scanning exposure systems

Method to reduce photoresist pattern collapse by controlled surface...

After deposition method of thinning film to reduce pinhole defects

Method for performing chemical shrink process over BARC (bottom ant...

Patents Applicationslast 30 patents

HIGH-K AND METAL FILLED TRENCH-TYPE EDRAM CAPACITOR WITH ELECTRODE...

High-K and Metal Filled Trench-Type EDRAM Capacitor with Electrode...

STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM...

TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY

SUBSTRATE PLANARIZATION WITH IMPRINT MATERIALS AND PROCESSES

OPTICAL INSPECTION METHODS

TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY

SYSTEM AND METHOD FOR DETECTION AND PREVENTION OF INFLUX OF AIRBORN...

OPTICAL INSPECTION METHODS

TAPERED EDGE BEAD REMOVAL PROCESS FOR IMMERSION LITHOGRAPHY

COMPOSITE STRUCTURES TO PREVENT PATTERN COLLAPSE

Graded Spin-on Organic Antireflective Coating for Photolithography

METHOD AND ALGORITHM FOR THE CONTROL OF CRITICAL DIMENSIONS IN A TH...

METHOD OF INSPECTING INTEGRATED CIRCUITS DURING FABRICATION

METHOD FOR PERFORMING CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANT...

Graded spin-on organic antireflective coating for photolithography

Film stack having under layer for preventing pinhole defects

TOPOGRAPHY COMPENSATED FILM APPLICATION METHODS

Method of forming film stack having under layer for preventing pinh...

METHODS OF PREVENTING DEFECTS IN ANTIREFLECTIVE COATINGS

DENSITY-AWARE DYNAMIC LEVELING IN SCANNING EXPOSURE SYSTEMS

After deposition method of thinning film to reduce pinhole defects

METHOD FOR PERFORMING CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANT...

Method of inspecting integrated circuits during fabrication

AUTOMATED SUB-FIELD BLADING FOR LEVELING OPTIMIZATION IN LITHOGRAPH...

Method for Post Lithographic Critical Dimension Shrinking Using The...

METHOD FOR POST LITHOGRAPHIC CRITICAL DIMENSION SHRINKING USING POS...

After deposition method of thinning film to reduce pinhole defects

Method of preventing pinhole defects through co-polymerization

Film stack having under layer for preventing pinhole defects