Cornelius A. van der Jeugd

Person

Heverlee, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for delivering hydrogen peroxide to a semiconduct...
- Patent number 10,343,907
- Issue date Jul 9, 2019
- ASM IP Holding B.V.
- Bert Jongbloed
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Process for forming silicon-filled openings with a reduced occurren...
- Patent number 9,837,271
- Issue date Dec 5, 2017
- ASM IP Holding B.V.
- Steven R. A. Van Aerde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclic aluminum nitride deposition in a batch reactor
- Patent number 9,552,979
- Issue date Jan 24, 2017
- ASM IP Holding B.V.
- Werner Knaepen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming silicon-filled openings with a reduced occurren...
- Patent number 9,443,730
- Issue date Sep 13, 2016
- ASM IP Holding B.V.
- Steven R. A. Van Aerde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive curing process for semiconductor substrates
- Patent number 9,431,238
- Issue date Aug 30, 2016
- ASM IP Holding B.V.
- Bert Jongbloed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming films in semiconductor devices with solid state...
- Patent number 7,691,750
- Issue date Apr 6, 2010
- ASM International N.V.
- Ernest H. A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a silicon dioxide layer
- Patent number 7,645,486
- Issue date Jan 12, 2010
- S.O.I. Tec Silicon on Insulator Technologies
- Konstantin Bourdelle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma activated nitridation
- Patent number 7,629,270
- Issue date Dec 8, 2009
- ASM America, Inc.
- Johan Swerts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature silicon compound deposition
- Patent number 7,294,582
- Issue date Nov 13, 2007
- ASM International, NV.
- Ruben Haverkort
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming silicide films in semiconductor devices
- Patent number 7,153,772
- Issue date Dec 26, 2006
- ASM International N.V.
- Ernst H. A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REACTIVE CURING PROCESS FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20170011910
- Publication date Jan 12, 2017
- ASM IP HOLDING B.V.
- Bert Jongbloed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING OXIDE LAYER BY OXIDIZING SEMICONDUCTOR SUBSTRATE...
- Publication number 20160240373
- Publication date Aug 18, 2016
- ASM IP HOLDING B.V.
- Fu Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURREN...
- Publication number 20160141176
- Publication date May 19, 2016
- ASM IP HOLDING B.V.
- Steven R.A. Van Aerde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURREN...
- Publication number 20160020093
- Publication date Jan 21, 2016
- ASM IP HOLDING B.V.
- Steven R.A. Van Aerde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURREN...
- Publication number 20160020094
- Publication date Jan 21, 2016
- ASM IP HOLDING B.V.
- Steven R.A. Van Aerde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTIVE CURING PROCESS FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20150357184
- Publication date Dec 10, 2015
- ASM IP HOLDING B.V.
- Bert Jongbloed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DELIVERING HYDROGEN PEROXIDE TO A SEMICONDUCT...
- Publication number 20150279693
- Publication date Oct 1, 2015
- ASM IP HOLDING B.V.
- Bert JONGBLOED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC ALUMINUM NITRIDE DEPOSITION IN A BATCH REACTOR
- Publication number 20140357090
- Publication date Dec 4, 2014
- Werner Knaepen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SILICON DIOXIDE LAYER
- Publication number 20070134887
- Publication date Jun 14, 2007
- Konstantin Bourdelle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of forming films in semiconductor devices with solid state...
- Publication number 20070059932
- Publication date Mar 15, 2007
- Ernst H.A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Remote plasma activated nitridation
- Publication number 20060110943
- Publication date May 25, 2006
- Johan Swerts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low temperature silicon compound deposition
- Publication number 20060088985
- Publication date Apr 27, 2006
- Ruben Haverkort
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of forming silicide films in semiconductor devices
- Publication number 20050017310
- Publication date Jan 27, 2005
- Ernst H.A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS

Cornelius A. van der Jeugd

Person

Patents Grantslast 30 patents

Method and system for delivering hydrogen peroxide to a semiconduct...

Process for forming silicon-filled openings with a reduced occurren...

Cyclic aluminum nitride deposition in a batch reactor

Process for forming silicon-filled openings with a reduced occurren...

Reactive curing process for semiconductor substrates

Methods of forming films in semiconductor devices with solid state...

Method of manufacturing a silicon dioxide layer

Remote plasma activated nitridation

Low temperature silicon compound deposition

Methods of forming silicide films in semiconductor devices

Patents Applicationslast 30 patents

REACTIVE CURING PROCESS FOR SEMICONDUCTOR SUBSTRATES

METHOD FOR FORMING OXIDE LAYER BY OXIDIZING SEMICONDUCTOR SUBSTRATE...

PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURREN...

PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURREN...

PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURREN...

REACTIVE CURING PROCESS FOR SEMICONDUCTOR SUBSTRATES

METHOD AND SYSTEM FOR DELIVERING HYDROGEN PEROXIDE TO A SEMICONDUCT...

CYCLIC ALUMINUM NITRIDE DEPOSITION IN A BATCH REACTOR

METHOD OF MANUFACTURING A SILICON DIOXIDE LAYER

Methods of forming films in semiconductor devices with solid state...

Remote plasma activated nitridation

Low temperature silicon compound deposition

Methods of forming silicide films in semiconductor devices