Daisuke Makino

Person

Mito, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Process for producing polyamide acid having siloxane bonds and poly...
- Patent number 4,847,358
- Issue date Jul 11, 1989
- Hitachi Chemical Company, Ltd.
- Mitsumasa Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Semiconductor device and process for producing the same
- Patent number 4,803,543
- Issue date Feb 7, 1989
- Hitachi, Ltd.
- Hideo Inayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing a pattern with negative-type photosensitive c...
- Patent number 4,801,519
- Issue date Jan 31, 1989
- Hitachi Chemical Company Ltd.
- Shigeru Koibuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide precursor resin composition and semiconductor device usin...
- Patent number 4,758,476
- Issue date Jul 19, 1988
- Hitachi Chemical Company, Ltd.
- Hiroyoshi Sekine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin encapsulated semiconductor device
- Patent number 4,758,875
- Issue date Jul 19, 1988
- Hitachi, Ltd.
- Koji Fujisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid crystal orientation controlling film and liquid crystal devi...
- Patent number 4,735,492
- Issue date Apr 5, 1988
- Hitachi Chemical Company, Ltd.
- Hiroyoshi Sekine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing fine patterns
- Patent number 4,722,883
- Issue date Feb 2, 1988
- Hitachi, Ltd.
- Shigeru Koibuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition with 4-azido-2'-methoxychalcone
- Patent number 4,698,291
- Issue date Oct 6, 1987
- Hitachi Chemical Co., Ltd.
- Shigeru Koibuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for protective coating material
- Patent number 4,645,688
- Issue date Feb 24, 1987
- Hitachi Chemical Company, Ltd.
- Daisuke Makino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and method for forming fine patter...
- Patent number 4,554,237
- Issue date Nov 19, 1985
- Hitach, Ltd.
- Fumio Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam or X-ray reactive image-formable resinous composition
- Patent number 4,513,077
- Issue date Apr 23, 1985
- Hitachi Chemical Company, Ltd.
- Asao Isobe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for protective coating material
- Patent number 4,511,705
- Issue date Apr 16, 1985
- Hitachi Chemical Company, Ltd.
- Daisuke Makino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compositions of materials for forming protective film in semiconduc...
- Patent number 4,497,922
- Issue date Feb 5, 1985
- Hitachi Chemical Company, Ltd.
- Hidetaka Sato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Semiconductor memories with .alpha. shield
- Patent number 4,494,217
- Issue date Jan 15, 1985
- Hitachi, Ltd.
- Hiroshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preparing polyamide acid for processing of semiconductors
- Patent number 4,485,234
- Issue date Nov 27, 1984
- Hitachi Chemical Company, Ltd.
- Daisuke Makino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of preparing polyamide acid for processing of semiconductors
- Patent number 4,447,596
- Issue date May 8, 1984
- Hitachi Chemical Company, Ltd.
- Daisuke Makino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing polyimide-amide-carboxylic acid
- Patent number 4,338,427
- Issue date Jul 6, 1982
- Hitachi Chemical Company Ltd.
- Iwao Maekawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Intermediate, copolymer resin and production thereof
- Patent number 4,338,426
- Issue date Jul 6, 1982
- Hitachi Chemical Company, Ltd.
- Hidetaka Sato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of preparing polyamide acid type intermediates for processin...
- Patent number 4,225,702
- Issue date Sep 30, 1980
- Hitachi Chemical Company, Ltd.
- Daisuke Makino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Daisuke Makino

Person

Patents Grantslast 30 patents

Process for producing polyamide acid having siloxane bonds and poly...

Semiconductor device and process for producing the same

Process for producing a pattern with negative-type photosensitive c...

Polyimide precursor resin composition and semiconductor device usin...

Resin encapsulated semiconductor device

Liquid crystal orientation controlling film and liquid crystal devi...

Process for producing fine patterns

Photosensitive composition with 4-azido-2'-methoxychalcone

Composition for protective coating material

Photosensitive resin composition and method for forming fine patter...

Electron beam or X-ray reactive image-formable resinous composition

Composition for protective coating material

Compositions of materials for forming protective film in semiconduc...

Semiconductor memories with .alpha. shield

Method of preparing polyamide acid for processing of semiconductors

Method of preparing polyamide acid for processing of semiconductors

Process for producing polyimide-amide-carboxylic acid

Intermediate, copolymer resin and production thereof

Method of preparing polyamide acid type intermediates for processin...