Dan Katz

Person

Agoura Hills, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support assembly
- Patent number 10,257,887
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate support assembly having rapid temperature control
- Patent number 9,883,549
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with rapid temperature gradient control
- Patent number 9,275,887
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Cathode with inner and outer electrodes at different heights
- Patent number 8,607,731
- Issue date Dec 17, 2013
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor with independe...
- Patent number 8,383,002
- Issue date Feb 26, 2013
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with center-fed multiple zone gas distribution for i...
- Patent number 8,236,133
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to control uniformity using tri-zone showerhead
- Patent number 8,066,895
- Issue date Nov 29, 2011
- Applied Materials, Inc.
- Rodolfo P. Belen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate profile control through effective frequency of dual HF/VHF sou...
- Patent number 8,017,526
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor with independe...
- Patent number 7,879,250
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode liner with wafer edge gas injection in a plasma reactor cha...
- Patent number 7,832,354
- Issue date Nov 16, 2010
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process using combined capacitively and inductively coupled plasma...
- Patent number 7,780,864
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual plasma source process using a variable frequency capacitively...
- Patent number 7,727,413
- Issue date Jun 1, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process for inductively coupling power through a gas distrib...
- Patent number 7,674,394
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Patent number 7,645,357
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 7,436,645
- Issue date Oct 14, 2008
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with independent capacitive and toroidal p...
- Patent number 7,264,688
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 7,186,943
- Issue date Mar 6, 2007
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 7,132,618
- Issue date Nov 7, 2006
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma with...
- Patent number 7,030,335
- Issue date Apr 18, 2006
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Merie plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 6,894,245
- Issue date May 17, 2005
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate electrode for a plasma receptor
- Patent number 6,677,712
- Issue date Jan 13, 2004
- Applied Materials Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber having multiple gas distributors and method
- Patent number 6,676,760
- Issue date Jan 13, 2004
- Appiled Materials, Inc.
- Arnold V. Kholodenko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution plate electrode for a plasma reactor
- Patent number 6,586,886
- Issue date Jul 1, 2003
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced inductively coupled plasma reactor with magne...
- Patent number 6,471,822
- Issue date Oct 29, 2002
- Applied Materials, Inc.
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a helicon wave high density plasma source
- Patent number 6,189,484
- Issue date Feb 20, 2001
- Applied Materials Inc.
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20180103508
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY HAVING RAPID TEMPERATURE CONTROL
- Publication number 20160135252
- Publication date May 12, 2016
- Applied Materials, Inc.
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH INDEPENDE...
- Publication number 20110068082
- Publication date Mar 24, 2011
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE WITH INNER AND OUTER ELECTRODES AT DIFFERENT HEIGHTS
- Publication number 20090314433
- Publication date Dec 24, 2009
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...
- Publication number 20090275206
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR I...
- Publication number 20090272492
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER
- Publication number 20090236447
- Publication date Sep 24, 2009
- Applied Materials, Inc.
- THEODOROS PANAGOPOULOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD
- Publication number 20090218317
- Publication date Sep 3, 2009
- RODOLFO P. BELEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of controlling CD bias and CD microloading by changing the c...
- Publication number 20090156011
- Publication date Jun 18, 2009
- Rodolfo P. Belen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate profile control through effective frequency of dual HF/VHF sou...
- Publication number 20090142930
- Publication date Jun 4, 2009
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cathode liner with wafer edge gas injection in a plasma reactor cha...
- Publication number 20090056629
- Publication date Mar 5, 2009
- APPLIED MATERIALS, INC.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor with independe...
- Publication number 20090057269
- Publication date Mar 5, 2009
- APPLIED MATERIALS, INC.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD G...
- Publication number 20080236490
- Publication date Oct 2, 2008
- ALEXANDER PATERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION
- Publication number 20080230008
- Publication date Sep 25, 2008
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...
- Publication number 20080206483
- Publication date Aug 28, 2008
- ALEXANDER PATERSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of processing a workpiece using a mid-chamber gas distributi...
- Publication number 20080193673
- Publication date Aug 14, 2008
- APPLIED MATERIALS, INC.
- Alexander M. Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mid-chamber gas distribution plate, tuned plasma flow control grid...
- Publication number 20080178805
- Publication date Jul 31, 2008
- APPLIED MATERIALS, INC.
- Alexander M. Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch process for controlling line edge roughness
- Publication number 20080149592
- Publication date Jun 26, 2008
- Rodolfo P. Belen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL
- Publication number 20080017104
- Publication date Jan 24, 2008
- APPLIED MATERIALS, INC.
- Alexander Matyushkin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245961
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with a toroidal plasma source and a VHF ca...
- Publication number 20070246161
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070246443
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070247074
- Publication date Oct 25, 2007
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245959
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070245960
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with independent capacitive and inductive...
- Publication number 20070246163
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Publication number 20070247073
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with an inductive plasma source and a VHF...
- Publication number 20070246162
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245958
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
- Publication number 20070139856
- Publication date Jun 21, 2007
- APPLIED MATERIALS, INC.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Substrate support assembly

Substrate support assembly having rapid temperature control

Substrate processing with rapid temperature gradient control

Cathode with inner and outer electrodes at different heights

Method of processing a workpiece in a plasma reactor with independe...

Plasma reactor with center-fed multiple zone gas distribution for i...

Method to control uniformity using tri-zone showerhead

Gate profile control through effective frequency of dual HF/VHF sou...

Method of processing a workpiece in a plasma reactor with independe...

Cathode liner with wafer edge gas injection in a plasma reactor cha...

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Plasma process for inductively coupling power through a gas distrib...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Method and apparatus for controlling temperature of a substrate

Plasma reactor apparatus with independent capacitive and toroidal p...

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

Plasma reactor with overhead RF electrode tuned to the plasma with...

Merie plasma reactor with overhead RF electrode tuned to the plasma...

Gas distribution plate electrode for a plasma receptor

Process chamber having multiple gas distributors and method

Gas distribution plate electrode for a plasma reactor

Magnetically enhanced inductively coupled plasma reactor with magne...

Plasma reactor having a helicon wave high density plasma source

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT ASSEMBLY

SUBSTRATE SUPPORT ASSEMBLY HAVING RAPID TEMPERATURE CONTROL

METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH INDEPENDE...

CATHODE WITH INNER AND OUTER ELECTRODES AT DIFFERENT HEIGHTS

PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...

PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR I...

METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER

METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD

Method of controlling CD bias and CD microloading by changing the c...

Gate profile control through effective frequency of dual HF/VHF sou...

Cathode liner with wafer edge gas injection in a plasma reactor cha...

Method of processing a workpiece in a plasma reactor with independe...

PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD G...

PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION

PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...

Method of processing a workpiece using a mid-chamber gas distributi...

Mid-chamber gas distribution plate, tuned plasma flow control grid...

Plasma etch process for controlling line edge roughness

SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL

Dual plasma source process using a variable frequency capacitively...

Plasma reactor apparatus with a toroidal plasma source and a VHF ca...

Process using combined capacitively and inductively coupled plasma...

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Process using combined capacitively and inductively coupled plasma...

Plasma reactor apparatus with independent capacitive and inductive...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Plasma reactor apparatus with an inductive plasma source and a VHF...

Dual plasma source process using a variable frequency capacitively...

METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE